Patents by Inventor Tae Mark Chung

Tae Mark Chung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7790096
    Abstract: A thermal management system is provided to control the preheating and cool down of a removable build chamber in a laser sintering system. A thermal management station controls preheating of a removable build chamber to heat the chamber to a temperature at or near the operating temperature of the laser sintering system. After insertion into the laser sintering system and completion of a build the thermal management station controls the cool down of the part cake within the removable build chamber after the chamber has been removed from the laser sintering system.
    Type: Grant
    Filed: March 31, 2005
    Date of Patent: September 7, 2010
    Assignee: 3D Systems, Inc.
    Inventors: Christian M. Merot, Tae Mark Chung, Raymond J. Bishop
  • Patent number: 7521652
    Abstract: The invention is a method for controllably cooling at least a portion of a part-cake from a laser sintering system to minimize cool down time, maximize throughput, and minimize thermal gradients within the part-cake. The method generally comprises forming one or more thermal transfer channels within the part-cake. The thermal transfer channels can include ducts and cooling fins in the part-cake surrounding the formed part. The method can further comprise removing unfused powder from the ducts and introducing cooling media into the ducts. The invention also includes a part-cake having thermal transfer channels formed therein and a laser sintering apparatus comprising a part-cake containing cylinder having permanent fittings therein for receiving terminal portions of thermal transfer channels formed in the part-cake.
    Type: Grant
    Filed: December 7, 2004
    Date of Patent: April 21, 2009
    Assignee: 3D Systems, Inc.
    Inventors: Tae Mark Chung, Raymond J. Bishop, Bradley David Geving, Jon Jody Fong, Patrick Dunne
  • Publication number: 20070253459
    Abstract: Disclosed herein are systems and methods for extending one or both of the discharge electrodes in a transverse discharge gas laser chamber in which one or both the electrodes are subject to a dimensional change due to erosion. Electrode extension can be performed to increase the chamber life, increase laser performance over the life of the chamber, or both. Operationally, the inter-electrode spacing may be adjusted to maintain a specific target gap distance between the electrodes or to optimize a specific parameter of the laser output beam such as bandwidth, pulse-to-pulse energy stability, beam size, etc.
    Type: Application
    Filed: April 16, 2007
    Publication date: November 1, 2007
    Applicant: Cymer, Inc.
    Inventors: Richard Sandstrom, Tae (Mark) Chung, Richard Ujazdowski
  • Patent number: 6930278
    Abstract: An apparatus and a method of using the apparatus wherein a radiation emitter is positioned adjacent a sensor apparatus within a process chamber in a laser sinter system that emits radiation to the sensor apparatus and a calibration apparatus receives readings from the sensor apparatus to compare temperature sensings received from the sensor apparatus with set emission signals from the radiation emitter to adjust the temperature sensings to calibrate the sensor apparatus during the forming of a three-dimensional article. The calibration is done repeatedly during the build process of the three-dimensional article.
    Type: Grant
    Filed: August 13, 2004
    Date of Patent: August 16, 2005
    Assignee: 3D Systems, Inc.
    Inventors: Tae Mark Chung, Jouni P. Partanen