Patents by Inventor Tae Seob LEE

Tae Seob LEE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240137568
    Abstract: Disclosed is a method and apparatus for encoding/decoding a video. According to an embodiment, provided is a method of setting a level for each of one or more regions, including decoding a definition syntax element related to level definition and a designation syntax element related to target designation from a bitstream; defining one or more levels based on the definition syntax element; and setting a target level designated by the designation syntax element among the defined levels for a target region designated by the designation syntax element.
    Type: Application
    Filed: January 2, 2024
    Publication date: April 25, 2024
    Inventors: Jeong-yeon LIM, Jae Seob SHIN, Sun Young LEE, Se Hoon SON, Tae Young NA, Jae Il KIM
  • Publication number: 20240113304
    Abstract: Disclosed is a cathode for a lithium secondary battery, which has a coating layer formed on an edge portion of a cathode plate, a method of manufacturing the cathode, and a lithium secondary battery including the cathode. The cathode includes a cathode plate and a coating layer formed at an edge portion of the cathode plate, in which the cathode plate includes a cathode current collector provided with cathode tab and a cathode active material laminated on at least one surface of the cathode current collector, and the coating layer includes a conductive polymer layer and an insulating coating layer.
    Type: Application
    Filed: July 3, 2023
    Publication date: April 4, 2024
    Inventors: Won Joon JANG, Hyun Je KIM, Tae Seob OH, Seong Hwan LEE, Seung Taek LEE, Chan Sub LEE
  • Publication number: 20240107808
    Abstract: A light emitting display device includes: a light emitting element; a second transistor connected to a scan line; a first transistor which applies a current to the light emitting element; a capacitor connected to a gate electrode of the first transistor; and a third transistor connected to an output electrode of the first transistor and the gate electrode of the first transistor. Channels of the second transistor, the first transistor, and the third transistor are disposed in a polycrystalline semiconductor layer, and a width of a channel of the third transistor is in a range of about 1 ?m to about 2 ?m, and a length of the channel of the third transistor is in a range of about 1 ?m to about 2.5 ?m.
    Type: Application
    Filed: November 30, 2023
    Publication date: March 28, 2024
    Inventors: Keun Woo KIM, Tae Wook KANG, Han Bit KIM, Bum Mo SUNG, Do Kyeong LEE, Jae Seob LEE
  • Patent number: 11924473
    Abstract: Disclosed herein is a method for decoding a video including determining a coding unit to be decoded by block partitioning, decoding prediction syntaxes for the coding unit, the prediction syntaxes including a skip flag indicating whether the coding unit is encoded in a skip mode, after the decoding of the prediction syntaxes, decoding transform syntaxes including a transformation/quantization skip flag and a coding unit cbf, wherein the transformation/quantization skip flag indicates whether inverse transformation, inverse quantization, and at least part of in-loop filterings are skipped, and the coding unit cbf indicates whether all coefficients in a luma block and two chroma blocks constituting the coding unit are zero, and reconstructing the coding unit based on the prediction syntaxes and the transform syntaxes.
    Type: Grant
    Filed: June 2, 2022
    Date of Patent: March 5, 2024
    Assignee: SK TELECOM CO., LTD.
    Inventors: Sun Young Lee, Jeong-yeon Lim, Tae Young Na, Gyeong-taek Lee, Jae-seob Shin, Se Hoon Son, Hyo Song Kim
  • Patent number: 11573492
    Abstract: The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin including a (meth)acrylate-based resin containing a (meth)acrylate-based repeating unit in which a heterocyclic compound is substituted via a divalent functional group containing an alkylene sulfide having 1 to 20 carbon atoms.
    Type: Grant
    Filed: July 24, 2018
    Date of Patent: February 7, 2023
    Assignee: LG CHEM, LTD.
    Inventors: Hyun Min Park, Minyoung Lim, Tae Seob Lee
  • Patent number: 11531268
    Abstract: The present invention provides a positive photoresist composition having excellent storage stability, sensitivity, developing properties, plating resistance, and heat resistance. More specifically, a specific dissolution inhibitor in the form of an oligomer having the same repeating unit structure as the resin contained in the photoresist composition is applied to said composition.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: December 20, 2022
    Assignee: LG CHEM, LTD.
    Inventors: Min Young Lim, Tae Seob Lee, Ji Hye Kim
  • Publication number: 20220220308
    Abstract: The polyamide-imide block copolymer according to the present invention makes it possible to provide a polyamide-imide film having excellent thermal stability and chemical resistance and, at the same time, having excellent mechanical properties.
    Type: Application
    Filed: April 9, 2020
    Publication date: July 14, 2022
    Applicant: LG CHEM, LTD.
    Inventors: Gieun PARK, Jae Gu LIM, Yoon Bin LIM, Tae Seob LEE, Seung Joon LIM, Se Jeong KIM, Woo Han KIM
  • Patent number: 11150555
    Abstract: A non-ionic photoacid generator and a chemically amplified positive-type photoresist composition for a thick film including the non-ionic photoacid generator. The non-ionic photoacid generator may not only exhibit high solubility in a solvent of the photoresist composition, but may also exhibit chemical and thermal stability and high sensitivity. In particular, the non-ionic photoacid generator is decomposed by light to generate an acid, and at the same time, can exhibit a corrosion preventing effect on a metal substrate.
    Type: Grant
    Filed: April 3, 2018
    Date of Patent: October 19, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Min Young Lim, Tae Seob Lee, Ji Hye Kim
  • Publication number: 20210246265
    Abstract: The present disclosure relates to a poly(amide-imide) copolymer in which at least one of an imide repeating unit and an amide repeating unit is substituted with a specific functional group, and a composition and a polymer film comprising the same.
    Type: Application
    Filed: January 9, 2020
    Publication date: August 12, 2021
    Applicant: LG CHEM, LTD.
    Inventors: Tae Seob LEE, Yoon Bin LIM, Jae Gu LIM, Seung Joon LIM, Se Jeong KIM, Woo Han KIM, Gieun PARK
  • Patent number: 11003077
    Abstract: The present invention relates to a positive photoresist composition including an acrylic resin including a repeat unit of a specific structure, and a photosensitive acid-generating compound, a photoresist pattern using the same, and a method for manufacturing a pattern.
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: May 11, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Min Young Lim, Tae Seob Lee, Ji Hye Kim
  • Patent number: 10990007
    Abstract: The present invention relates to a photoacid generator, and a chemically amplified photoresist composition for a thick film including the same, wherein the photoacid generator has excellent solubility and sensitivity, and also has an anti-corrosion effect, in addition to the effect as a photoacid generator. Thus, a chemically amplified photoresist composition for a thick film including the photoacid generator reduces scum and/or footing at the exposed part after development. The photoacid generator represented by the following Chemical Formula 1: In Chemical Formula 1, the definition of each substituents is the same as the detail description of the specification.
    Type: Grant
    Filed: August 24, 2018
    Date of Patent: April 27, 2021
    Assignee: LG CHEM, LTD.
    Inventors: Min Young Lim, Tae Seob Lee, Hyun Min Park
  • Publication number: 20210011379
    Abstract: The present invention provides a positive photoresist composition having excellent storage stability, sensitivity, developing properties, plating resistance, and heat resistance. More specifically, a specific dissolution inhibitor in the form of an oligomer having the same repeating unit structure as the resin contained in the photoresist composition is applied to said composition.
    Type: Application
    Filed: July 25, 2018
    Publication date: January 14, 2021
    Applicant: LG CHEM, LTD.
    Inventors: Min Young LIM, Tae Seob LEE, Ji Hye KIM
  • Publication number: 20200218153
    Abstract: The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin including a (meth)acrylate-based resin containing a (meth)acrylate-based repeating unit in which a heterocyclic compound is substituted via a divalent functional group containing an alkylene sulfide having 1 to 20 carbon atoms.
    Type: Application
    Filed: July 24, 2018
    Publication date: July 9, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Hyun Min PARK, Minyoung LIM, Tae Seob LEE
  • Patent number: 10651401
    Abstract: The present invention relates to a method for preparing a perovskite compound usable as a light absorber of a solar cell, and provides a method for preparing a light absorber of a solar cell in which the crystallinity of a perovskite compound is increased, resulting in an increase in the stability and efficiency of the solar cell.
    Type: Grant
    Filed: October 27, 2016
    Date of Patent: May 12, 2020
    Assignee: LG CHEM, LTD.
    Inventors: Ji Hye Kim, Sung-Ho Chun, Jung Ha Park, Chan Yeup Chung, Tae Seob Lee
  • Publication number: 20200033724
    Abstract: A non-ionic photoacid generator and a chemically amplified positive-type photoresist composition for a thick film including the non-ionic photoacid generator. The non-ionic photoacid generator may not only exhibit high solubility in a solvent of the photoresist composition, but may also exhibit chemical and thermal stability and high sensitivity. In particular, the non-ionic photoacid generator is decomposed by light to generate an acid, and at the same time, can exhibit a corrosion preventing effect on a metal substrate.
    Type: Application
    Filed: April 3, 2018
    Publication date: January 30, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Min Young LIM, Tae Seob LEE, Ji Hye KIM
  • Publication number: 20200033725
    Abstract: The present invention relates to a photoacid generator, and a chemically amplified photoresist composition for a thick film including the same, wherein the photoacid generator has excellent solubility and sensitivity, and also has an anti-corrosion effect, in addition to the effect as a photoacid generator. Thus, a chemically amplified photoresist composition for a thick film including the photoacid generator reduces scum and/or footing at the exposed part after development. The photoacid generator represented by the following Chemical Formula 1: In Chemical Formula 1, the definition of each substituents is the same as the detail description of the specification.
    Type: Application
    Filed: August 24, 2018
    Publication date: January 30, 2020
    Applicant: LG CHEM, LTD.
    Inventors: Min Young LIM, Tae Seob LEE, Hyun Min PARK
  • Publication number: 20190146338
    Abstract: The present invention relates to a positive photoresist composition including an acrylic resin including a repeat unit of a specific structure, and a photosensitive acid-generating compound, a photoresist pattern using the same, and a method for manufacturing a pattern.
    Type: Application
    Filed: March 16, 2018
    Publication date: May 16, 2019
    Applicant: LG CHEM, LTD.
    Inventors: Min Young LIM, Tae Seob LEE, Ji Hye KIM
  • Publication number: 20180226590
    Abstract: The present invention relates to a method for preparing a perovskite compound usable as a light absorber of a solar cell, and provides a method for preparing a light absorber of a solar cell in which the crystallinity of a perovskite compound is increased, resulting in an increase in the stability and efficiency of the solar cell.
    Type: Application
    Filed: October 27, 2016
    Publication date: August 9, 2018
    Applicant: LG CHEM, LTD.
    Inventors: Ji Hye KIM, Sung-Ho CHUN, Jung Ha PARK, Chan Yeup CHUNG, Tae Seob LEE