Patents by Inventor Tae Seok BYUN

Tae Seok BYUN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • IODINE-CONTAINING METAL COMPOUND AND COMPOSITION FOR DEPOSITING THIN FILM INCLUDING THE SAME
    Publication number: 20230250114
    Abstract: Provided are an iodine-containing metal compound, a composition for depositing a metal-containing thin film including the same, and a method of manufacturing a metal-containing thin film using the same. Since the composition for depositing a thin film according to one embodiment is present in a liquid state at room temperature, it has excellent storage and handling properties, and since the composition has high reactivity, a metal thin film may be efficiently formed using the composition.
    Type: Application
    Filed: February 7, 2023
    Publication date: August 10, 2023
    Inventors: Yong Hee KWONE, Young Jae IM, Sang Yong JEON, Tae Seok BYUN, Sang Chan LEE, Sang Ick LEE
  • COMPOSITION FOR DEPOSITING ANTIMONY-CONTAINING THIN FILM AND METHOD FOR MANUFACTURING ANTIMONY-CONTAINING THIN FILM USING THE SAME
    Publication number: 20230203655
    Abstract: Provided are a composition for depositing an antimony-containing thin film including a novel antimony compound which may be useful as a precursor of an antimony-containing thin film and a method for manufacturing an antimony-containing thin film using the same.
    Type: Application
    Filed: December 27, 2022
    Publication date: June 29, 2023
    Inventors: Yong Hee KWONE, Young Jae IM, Sang Yong JEON, Tae Seok BYUN, Sang Chan LEE, Sang Ick LEE
  • NOVEL SILYLCYCLODISILAZANE COMPOUND AND METHOD FOR MANUFACTURING SILICON-CONTAINING THIN FILM USING THE SAME
    Publication number: 20220275010
    Abstract: Provided is a novel silylcyclodisilazane compound, a composition for depositing a silicon-containing thin film containing the same, and a method for manufacturing the silicon-containing thin film using the same, and since the silylcyclodisilazane compound of the present invention has high reactivity, thermal stability and high volatility, it can be used as a silicon-containing precursor, thereby manufacturing a high-quality silicon-containing thin film by various deposition methods.
    Type: Application
    Filed: August 13, 2020
    Publication date: September 1, 2022
    Inventors: Se Jin JANG, Sung Gi KIM, Jeong Joo PARK, Tae Seok BYUN, Yong Hee KWONE, Yeong Hun KIM, Haengdon LIM, Sang Yong JEON, Sang Ick LEE
  • Polymer and composition containing same
    Patent number: 10214610
    Abstract: The present invention relates to a novel multipurpose polymer and a composition containing the same. The polymer and the composition of the present invention are very useful for preparing a semiconductor device having very good mechanical and optical properties.
    Type: Grant
    Filed: August 22, 2014
    Date of Patent: February 26, 2019
    Assignees: DNF CO., LTD., SKC CO., LTD.
    Inventors: Joo Hyeon Park, Myong Woon Kim, Sang Ick Lee, Tae Seok Byun, Seung Son, Yong Hee Kwone, In Kyung Jung, Joon Sung Ryou
  • NOVEL POLYMER AND COMPOSITION CONTAINING SAME
    Publication number: 20160200853
    Abstract: The present invention relates to a novel multipurpose polymer and a composition containing the same. The polymer and the composition of the present invention are very useful for preparing a semiconductor device having very good mechanical and optical properties.
    Type: Application
    Filed: August 22, 2014
    Publication date: July 14, 2016
    Applicant: SKC CO., LTD.
    Inventors: Joo Hyeon PARK, Myong Woon KIM, Sang Ick LEE, Tae Seok BYUN, Seung SON, Yong Hee KWONE, In Kyung JUNG, Joon Sung RYOU