Patents by Inventor Tae Sug Jang

Tae Sug Jang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11970579
    Abstract: Provided are a polyamic acid resin derived from an aromatic diamine, an aromatic dianhydride, a cycloaliphatic dianhydride and an aromatic diacid dichloride, and a polyamideimide film including polyamideimide derived from an aromatic diamine, an aromatic dianhydride, a cycloaliphatic dianhydride and an aromatic diacid dichloride.
    Type: Grant
    Filed: October 22, 2020
    Date of Patent: April 30, 2024
    Assignees: SK Innovation Co., Ltd., SK Geo Centric Co., Ltd., SK ie technology Co., Ltd.
    Inventors: Hyeon Jeong Kim, Sang Yoon Park, Tae Sug Jang, Jin Hyung Park
  • Patent number: 11945925
    Abstract: Provided are a polyimide-based film having excellent visibility, a film for a cover window, and a display device including the same.
    Type: Grant
    Filed: July 2, 2020
    Date of Patent: April 2, 2024
    Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.
    Inventors: Jin Su Park, Keon Hyeok Ko, Byoung Sun Ko, Jong Nam Ahn, Tae Sug Jang
  • Patent number: 11846755
    Abstract: Provided is a hard coating film. The hard coating film includes a base layer and a hard coating layer disposed on the base layer and having a pencil hardness of 4H or higher. A surface elongation at break of the hard coating film falls within a predetermined range, as measured by a certain method. The hard coating film shows excellent durability under high-temperature/high-humidity conditions, has no microcracks formed after repeated folding, and shows excellent pencil hardness.
    Type: Grant
    Filed: February 10, 2020
    Date of Patent: December 19, 2023
    Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.
    Inventors: Jong Nam Ahn, Byoung Sun Ko, Jin Su Park, Tae Sug Jang, Keon Hyeok Ko, Ho Chul Yoon
  • Patent number: 11692108
    Abstract: Provided is a composition for forming a hard coating layer, which includes an epoxy siloxane resin, a crosslinking agent including a compound having an alicyclic epoxy group, a thermal initiator including a compound represented by a specific chemical formula, a photoinitiator, a fluorine-substituted (meth)acrylate compound, and silica nanoparticles surface-modified with a fluorine compound, and forms a hard coating layer having excellent hardness and antifouling property and suppressing curling.
    Type: Grant
    Filed: August 12, 2019
    Date of Patent: July 4, 2023
    Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.
    Inventors: Jong Nam Ahn, Byoung Sun Ko, Jin Su Park, Tae Sug Jang, Ho Chul Yoon
  • Patent number: 11693155
    Abstract: Provided is a hard coating film in which a hard coating layer having a water contact angle of 90° or less, a conductive layer, and a low refractive index layer are laminated on a substrate, the film having excellent hardness, anti-curling property, antireflection performance, antifouling performance, and antistatic performance.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: July 4, 2023
    Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.
    Inventors: Jong Nam Ahn, Tae Sug Jang, Byoung Sun Ko, Jin Su Park, Ho Chul Yoon
  • Patent number: 11693154
    Abstract: Provided is a hard coating film in which a hard coating layer having a water contact angle of 90° or less, a high refractive index layer, and a low refractive index layer are laminated on a substrate, the film having suppressed curling, and excellent hardness and antireflection performance.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: July 4, 2023
    Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.
    Inventors: Jong Nam Ahn, Tae Sug Jang, Byoung Sun Ko, Jin Su Park, Ho Chul Yoon
  • Patent number: 11168212
    Abstract: Provided is a composition for forming a hard coating layer, which includes an epoxy siloxane resin, a crosslinking agent including a compound having an alicyclic epoxy group, a thermal initiator including a compound represented by Chemical Formula 2, and a photoinitiator to decrease curls and increase hardness of the hard coating film.
    Type: Grant
    Filed: August 5, 2019
    Date of Patent: November 9, 2021
    Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.
    Inventors: Jong Nam Ahn, Byoung Sun Ko, Tae Sug Jang, Jin Su Park, Ho Chul Yoon
  • Patent number: 11137524
    Abstract: Provided is a hard coating film including a polyamideimide substrate layer and a hard coating layer, each of which has a predetermined refractive index, with a difference in the refractive index between those layers being 0.05. The substrate layer has a tensile modulus of 3 to 7 GPa, at a thickness of 80 ?m, as measured according to ASTM D111. The present invention relates to a hard coating film having improved mechanical and optical properties.
    Type: Grant
    Filed: December 2, 2019
    Date of Patent: October 5, 2021
    Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.
    Inventors: Jong Nam Ahn, Keon Hyeok Ko, Byoung Sun Ko, Sang Yoon Park, Jin Su Park, Ho Chul Yoon, Tae Sug Jang
  • Publication number: 20210040267
    Abstract: Provided are a polyamic acid resin derived from an aromatic diamine, an aromatic dianhydride, a cycloaliphatic dianhydride and an aromatic diacid dichloride, and a polyamideimide film including polyamideimide derived from an aromatic diamine, an aromatic dianhydride, a cycloaliphatic dianhydride and an aromatic diacid dichloride.
    Type: Application
    Filed: October 22, 2020
    Publication date: February 11, 2021
    Inventors: Hyeon Jeong Kim, Sang Yoon Park, Tae Sug Jang, Jin Hyung Park
  • Publication number: 20210002440
    Abstract: Provided are a polyimide-based film having excellent visibility, a film for a cover window, and a display device including the same.
    Type: Application
    Filed: July 2, 2020
    Publication date: January 7, 2021
    Inventors: Jin Su Park, Keon Hyeok Ko, Byoung Sun Ko, Jong Nam Ahn, Tae Sug Jang
  • Patent number: 10815378
    Abstract: Provided are a polyamic acid resin derived from an aromatic diamine, an aromatic dianhydride, a cycloaliphatic dianhydride and an aromatic diacid dichloride, and a polyamideimide film including polyamideimide derived from an aromatic diamine, an aromatic dianhydride, a cycloaliphatic dianhydride and an aromatic diacid dichloride.
    Type: Grant
    Filed: September 11, 2018
    Date of Patent: October 27, 2020
    Assignees: SK Innovation Co., Ltd., SK Global Chemical Co., Ltd., SK IE Technology Co., Ltd.
    Inventors: Hyeon Jeong Kim, Sang Yoon Park, Tae Sug Jang, Jin Hyung Park
  • Publication number: 20200257023
    Abstract: Provided is a hard coating film. The hard coating film includes a base layer and a hard coating layer disposed on the base layer and having a pencil hardness of 4H or higher. A surface elongation at break of the hard coating film falls within a predetermined range, as measured by a certain method. The hard coating film shows excellent durability under high-temperature/high-humidity conditions, has no microcracks formed after repeated folding, and shows excellent pencil hardness.
    Type: Application
    Filed: February 10, 2020
    Publication date: August 13, 2020
    Inventors: Jong Nam Ahn, Byoung Sun Ko, Jin Su Park, Tae Sug Jang, Keon Hyeok Ko, Ho Chul Yoon
  • Publication number: 20200174161
    Abstract: Provided is a hard coating film including a polyamideimide substrate layer and a hard coating layer, each of which has a predetermined refractive index, with a difference in the refractive index between those layers being 0.05. The substrate layer has a tensile modulus of 3 to 7 GPa, at a thickness of 80 ?m, as measured according to ASTM D111. The present invention relates to a hard coating film having improved mechanical and optical properties.
    Type: Application
    Filed: December 2, 2019
    Publication date: June 4, 2020
    Inventors: Jong Nam Ahn, Keon Hyeok Ko, Byoung Sun Ko, Sang Yoon Park, Jin Su Park, Ho Chul Yoon, Tae Sug Jang
  • Publication number: 20200062991
    Abstract: Provided is a composition for forming a hard coating layer, which includes an epoxy siloxane resin, a crosslinking agent including a compound having an alicyclic epoxy group, a thermal initiator including a compound represented by a specific chemical formula, a photoinitiator, a fluorine-substituted (meth)acrylate compound, and silica nanoparticles surface-modified with a fluorine compound, and forms a hard coating layer having excellent hardness and antifouling property and suppressing curling.
    Type: Application
    Filed: August 12, 2019
    Publication date: February 27, 2020
    Inventors: Jong Nam Ahn, Byoung Sun Ko, Jin Su Park, Tae Sug Jang, Ho Chul Yoon
  • Publication number: 20200064519
    Abstract: Provided is a hard coating film in which a hard coating layer having a water contact angle of 90° or less, a conductive layer, and a low refractive index layer are laminated on a substrate, the film having excellent hardness, anti-curling property, antireflection performance, antifouling performance, and antistatic performance.
    Type: Application
    Filed: August 22, 2019
    Publication date: February 27, 2020
    Inventors: Jong Nam Ahn, Tae Sug Jang, Byoung Sun Ko, Jin Su Park, Ho Chul Yoon
  • Publication number: 20200064518
    Abstract: Provided is a hard coating film in which a hard coating layer having a water contact angle of 90° or less, a high refractive index layer, and a low refractive index layer are laminated on a substrate, the film having suppressed curling, and excellent hardness and antireflection performance.
    Type: Application
    Filed: August 22, 2019
    Publication date: February 27, 2020
    Inventors: Jong Nam Ahn, Tae Sug Jang, Byoung Sun Ko, Jin Su Park, Ho Chul Yoon
  • Publication number: 20200056056
    Abstract: Provided is an antifouling hard coating film including a cured layer of a composition for forming a hard coating layer including an epoxy siloxane resin, disposed on a substrate, and an antifouling layer including a fluorine-substituted silsesquioxane resin, disposed on the cured layer, the antifouling hard coating film having excellent interlayer bonding force, hardness, and antifouling property, and suppressed curling.
    Type: Application
    Filed: August 13, 2019
    Publication date: February 20, 2020
    Inventors: Jong Nam Ahn, Byoung Sun Ko, Jin Su Park, Tae Sug Jang, Ho Chul Yoon
  • Publication number: 20200048462
    Abstract: Provided is a composition for forming a hard coating layer, which includes an epoxy siloxane resin, a crosslinking agent including a compound having an alicyclic epoxy group, a thermal initiator including a compound represented by Chemical Formula 2, and a photoinitiator to decrease curls and increase hardness of the hard coating film.
    Type: Application
    Filed: August 5, 2019
    Publication date: February 13, 2020
    Inventors: Jong Nam Ahn, Byoung Sun Ko, Tae Sug Jang, Jin Su Park, Ho Chul Yoon
  • Patent number: 10370496
    Abstract: Provided are a polyamic acid resin, a polyamideimide film, and a method for preparing the same. More specifically, provided are a polyamic acid resin derived from a combination of specific components, and a polyamideimide film capable of implementing high modulus and excellent optical properties.
    Type: Grant
    Filed: August 4, 2017
    Date of Patent: August 6, 2019
    Assignee: SK INNOVATION CO., LTD.
    Inventors: Sang Yoon Park, Hyeon Jeong Kim, Tae Sug Jang, Jin Hyung Park
  • Patent number: 10370495
    Abstract: Provided are a polyamic acid resin, a polyamideimide film, and a method for preparing the same. More specifically, provided are a polyamic acid resin derived from a combination of specific components, a polyamideimide film capable of implementing high modulus and excellent optical properties while implementing excellent mechanical properties, heat properties, and electrical properties, and a method for preparing the same.
    Type: Grant
    Filed: August 4, 2017
    Date of Patent: August 6, 2019
    Assignee: SK INNOVATION CO., LTD.
    Inventors: Sang Yoon Park, Hyeon Jeong Kim, Tae Sug Jang, Jin Hyung Park