Abstract: The present invention relates to a coating composition for an in-vivo implantable prosthesis including a photoinitiator, a crosslinking agent, and a phosphorylcholine (pc) monomer having an acrylate group, a method of coating an in-vivo implantable prosthesis using the coating composition, and a cosmetic prosthesis coated with the crosslinked polyphosphorylcholine. An in-vivo implantable prosthesis coated with crosslinked polyphosphorylcholine may be manufactured by a simple method of applying a coating composition including a photoinitiator, a crosslinking agent, and a phosphorylcholine (pc) monomer having an acrylate group according to the present invention, and then irradiating uv rays. The crosslinked polyphosphorylcholine coating may provide hydrophilicity for the surface and may also remarkably reduce adsorption of proteins and fibroblasts, which may cause side effects such as capsular contracture.

Abstract: Provided is a pump backstream prevention structure for semiconductor fabrication equipment, including a sensor, an isolation air supply pipe, and a control unit. A time delay from a point in time at which the dry pump starts to malfunction to a point in time at which the isolation valve is closed is reduced, compared to a method of closing the isolation valve by a controller of the semiconductor fabrication equipment. Accordingly, a backstream in which particles move from the pumping pipe to the process chamber before the closing of the isolation valve is prevented.

Abstract: Disclosed is a fume removal apparatus for a semiconductor manufacturing chamber. The disclosed fume removal apparatus for a semiconductor manufacturing chamber comprises: a fume exhaust pipe; a fume exhaust pipe opening-and-closing valve; a vacuum pump; and a control member, wherein the control member opens the fume exhaust pipe by opening the fume exhaust pipe opening-and-closing valve and forms a vacuum inside the fume exhaust pipe by operating the vacuum pump, so that fumes within the semiconductor manufacturing chamber can flow in along the fume exhaust pipe and be discharged to the outside. The disclosed fume removal apparatus for a semiconductor manufacturing chamber enables fumes to be rapidly, conveniently, and reliably removed from the semiconductor manufacturing chamber, and thus has an advantage of enabling a worker who should approach the inside of the semiconductor manufacturing chamber to safely perform work without coming into contact with the fumes.

Abstract: Disclosed is a fume removal apparatus for a semiconductor manufacturing chamber. The disclosed fume removal apparatus for a semiconductor manufacturing chamber comprises: a fume exhaust pipe; a fume exhaust pipe opening-and-closing valve; a vacuum pump; and a control member, wherein the control member opens the fume exhaust pipe by opening the fume exhaust pipe opening-and-closing valve and forms a vacuum inside the fume exhaust pipe by operating the vacuum pump, so that fumes within the semiconductor manufacturing chamber can flow in along the fume exhaust pipe and be discharged to the outside. The disclosed fume removal apparatus for a semiconductor manufacturing chamber enables fumes to be rapidly, conveniently, and reliably removed from the semiconductor manufacturing chamber, and thus has an advantage of enabling a worker who should approach the inside of the semiconductor manufacturing chamber to safely perform work without coming into contact with the fumes.

Abstract: A microwave oven includes: a cabinet forming the exterior; a base plate coupled to the cabinet and forming a bottom surface; a rear plate coupled to the cabinet and forming a rear surface; a cavity installed on the base plate to form a space at a rear side of the base plate; first and high-voltage transformers positioned in the space, and installed in one side and the center of the base plate, respectively; a first magnetron positioned in the space and disposed in the opposite side of the first high-voltage transformer; a second magnetron positioned in the space and disposed over the first magnetron; a fan assembly positioned in the space and disposed over the first transformer; a fan housing covering the fan assembly; and an air guide tube connected to the fan housing, and guiding an air flow to the first and second magnetrons.