Patents by Inventor Tae Yi Kang

Tae Yi Kang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240069310
    Abstract: A lens includes a lens unit; an intermediate layer configured to cover a surface portion of the lens unit; and a water-repellent layer, configured to cover a surface portion of the intermediate layer, including a base layer and an ultraviolet (UV) absorber disposed in the base layer.
    Type: Application
    Filed: March 16, 2023
    Publication date: February 29, 2024
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Tae Kyung LEE, Byung Ju KIM, Jung Ho LEE, Na Yi KANG, Joung Hun KIM, Jae Goon AUM
  • Patent number: 9536162
    Abstract: The present invention relates to a method for detecting a mark that is invisible in the visible light region. Here, the invisible mark is displayed on a card using a characteristic according to which the color of light is changed by means of a refractive index difference according to media in the visible light region. According to the method for detecting the invisible mark, it may be quickly determined whether the card is a counterfeit card in an investigation. In addition, since it is unnecessary to repeatedly inspect the card to be checked using various wavelengths, the time required for determining whether the card is a counterfeit card may be reduced.
    Type: Grant
    Filed: December 19, 2011
    Date of Patent: January 3, 2017
    Assignee: Republic of Korea (National Forensic Service Director Ministry of Public Administration and Security)
    Inventors: Joong Lee, Tae-Yi Kang, Jun Seok Byun
  • Publication number: 20130343599
    Abstract: The present invention relates to a method for detecting a mark that is invisible in the visible light region. Here, the invisible mark is displayed on a card using a characteristic according to which the color of light is changed by means of a refractive index difference according to media in the visible light region. According to the method for detecting the invisible mark, it may be quickly determined whether the card is a counterfeit card in an investigation. In addition, since it is unnecessary to repeatedly inspect the card to be checked using various wavelengths, the time required for determining whether the card is a counterfeit card may be reduced.
    Type: Application
    Filed: December 19, 2011
    Publication date: December 26, 2013
    Inventors: Joong Lee, Tae-Yi Kang, Jun Seok Byun
  • Patent number: 7691945
    Abstract: A radial multi-block copolymer contains a tapered block as represented by the following formula 1. The radial multi-block copolymer, which includes a polystyrene block, a poly(isoprene-styrene)tapered block, a polyisoprene block, and a polybutadiene block, can be used as an excellent pressure-sensitive adhesive material. (pA-pT-pB)m-X-n(pC-pB-pT-pA)??Formula 1 where pA is the polyvinyl aromatic block; pT is the poly(isoprene-styrene)tapered block; pB is the polyisoprene block; pC is the polybutadiene block; X is the residue of a multi-functional coupling agent used in preparation of the radial multi-block copolymer; m and n are integers equal to or greater than 1, representing the number of branches associated with X; and pT=pTA+pTB, where pTA is the pA component of pT, and pTB is the pB component of pT.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: April 6, 2010
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Geun Kim, Tae-Yi Kang, Sam-Min Kim
  • Patent number: 7534833
    Abstract: A radial multi-block copolymer contains a tapered block as represented by the following formula 1. The radial multi-block copolymer, which includes a polystyrene block, a poly(isoprene-styrene)tapered block, a polyisoprene block, and a polybutadiene block, can be used as an excellent pressure-sensitive adhesive material. (pA-pT-pB)m-X-n(pC-pB-pT-pA)??Formula 1: where pA is the polyvinyl aromatic block; pT is the poly(isoprene-styrene)tapered block; pB is the polyisoprene block; pC is the polybutadiene block; X is the residue of a multi-functional coupling agent used in preparation of the radial multi-block copolymer; m and n are integers equal to or greater than 1, representing the number of branches associated with X; and pT=pTA+pTB, where pTA is the pA component of pT, and pTB is the pB component of pT.
    Type: Grant
    Filed: February 18, 2005
    Date of Patent: May 19, 2009
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Geun Kim, Tae-Yi Kang, Sam-Min Kim
  • Publication number: 20070129499
    Abstract: A radial multi-block copolymer contains a tapered block as represented by the following formula 1. The radial multi-block copolymer, which includes a polystyrene block, a poly(isoprene-styrene)tapered block, a polyisoprene block, and a polybutadiene block, can be used as an excellent pressure-sensitive adhesive material. (pA-pT-pB)m-X-n(pC-pB-pT-pA)??Formula 1: where pA is the polyvinyl aromatic block; pT is the poly(isoprene-styrene)tapered block; pB is the polyisoprene block; pC is the polybutadiene block; X is the residue of a multi-functional coupling agent used in preparation of the radial multi-block copolymer; m and n are integers equal to or greater than 1, representing the number of branches associated with X; and pT=pTA+pTB, where pTA is the pA component of pT, and pTB is the pB component of pT.
    Type: Application
    Filed: December 28, 2006
    Publication date: June 7, 2007
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Geun Kim, Tae-Yi Kang, Sam-Min Kim
  • Patent number: 6987145
    Abstract: Disclosed is a hetero-branched radial block copolymer suitable as a base polymer of pressure-sensitive adhesives, the hetero-branched radial block having a hetero-branched structure comprised of polystyrene, polyisoprene, and polybutadiene blocks and being represented by (pS-pI)3X-(pB-pI-pS) wherein pS is polystyrene; pI is polyisoprene; pB is polybutadiene; and X is a residue of a tetravalent coupling agent.
    Type: Grant
    Filed: December 15, 2003
    Date of Patent: January 17, 2006
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Sam-Min Kim, Dai-Seung Choi, Jong-Geun Kim, Hak-Kyung Kim, Tae-Yi Kang
  • Publication number: 20050197463
    Abstract: A radial multi-block copolymer contains a tapered block as represented by the following formula 1. The radial multi-block copolymer, which includes a polystyrene block, a poly(isoprene-styrene)tapered block, a polyisoprene block, and a polybutadiene block, can be used as an excellent pressure-sensitive adhesive material. (pA-pT-pB)m-X-n(pC-pB-pT-pA)??Formula 1: where pA is the polyvinyl aromatic block; pT is the poly(isoprene-styrene)tapered block; pB is the polyisoprene block; pC is the polybutadiene block; X is the residue of a multi-functional coupling agent used in preparation of the radial multi-block copolymer; m and n are integers equal to or greater than 1, representing the number of branches associated with X; and pT=pTA+pTB, where pTA is the pA component of pT, and pTB is the pB component of pT.
    Type: Application
    Filed: February 18, 2005
    Publication date: September 8, 2005
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jong-Geun Kim, Tae-Yi Kang, Sam-Min Kim
  • Publication number: 20050131159
    Abstract: Disclosed is a hetero-branched radial block copolymer suitable as a base polymer of pressure-sensitive adhesives, the hetero-branched radial block having a hetero-branched structure comprised of polystyrene, polyisoprene, and polybutadiene blocks and being represented by (pS-pI)3X-(pB-pI-pS) wherein pS is polystyrene; pI is polyisoprene; pB is polybutadiene; and X is a residue of a tetravalent coupling agent.
    Type: Application
    Filed: December 15, 2003
    Publication date: June 16, 2005
    Applicant: KOREA KUMHO PETROCHEMICAL CO. LTD.
    Inventors: Sam-Min Kim, Dai-Seung Choi, Jong-Geun Kim, Hak-Kyung Kim, Tae-Yi Kang
  • Patent number: 6881865
    Abstract: Disclosed is a synthesis method of cyclohexyl phenyl ketone with a high selectivity and a high yield from 1,3-butadiene and acrylic acid in the presence or absence of benzene or a non-aromatic organic solvent in the same reaction without a step of separating or purifying intermediates, the synthesis method including sequentially carrying out a [2+4] Diels-Alder reaction, a hydrogenation reaction, a chlorination reaction and a Friedel-Crafts reaction in the presence/absence of benzene or a non-aromatic organic solvent without separation of intermediates.
    Type: Grant
    Filed: July 28, 2003
    Date of Patent: April 19, 2005
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Young J. Joo, Jin Eok Kim, Jeong Im Won, Tae Yi Kang
  • Publication number: 20040073068
    Abstract: Disclosed is a synthesis method of cyclohexyl phenyl ketone with a high selectivity and a high yield from 1,3-butadiene and acrylic acid in the presence or absence of benzene or a non-aromatic organic solvent in the same reaction without a step of separating or purifying intermediates, the synthesis method including sequentially carrying out a [2+4] Diels-Alder reaction, a hydrogenation reaction, a chlorination reaction and a Friedel-Crafts reaction in the presence/absence of benzene or a non-aromatic organic solvent without separation of intermediates.
    Type: Application
    Filed: July 28, 2003
    Publication date: April 15, 2004
    Applicant: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Young J. Joo, Jin Eok Kim, Jeong Im Won, Tae Yi Kang