Patents by Inventor Taechun KWON

Taechun KWON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing method and substrate processing apparatus
    Patent number: 9406524
    Abstract: A substrate processing method for processing a substrate by supplying a processing gas into a processing chamber and allowing the processing gas to react on the substrate in the processing chamber by using a substrate processing apparatus includes the processing chamber accommodating the substrate, a processing gas supply unit for supplying the processing gas into the processing chamber, and a gas exhaust unit, for exhausting the processing chamber, having a turbo molecular pump. The method controls a processing uniformity by controlling a revolution speed of the turbo molecular pump while maintaining a pressure in the processing chamber to a predetermined level when by-products having a larger molecular mass compared to the processing gas are generated by the reaction of the processing gas.
    Type: Grant
    Filed: October 17, 2014
    Date of Patent: August 2, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Hiroyuki Takahashi, Taechun Kwon
  • SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
    Publication number: 20150111388
    Abstract: A substrate processing method for processing a substrate by supplying a processing gas into a processing chamber and allowing the processing gas to react on the substrate in the processing chamber by using a substrate processing apparatus includes the processing chamber accommodating the substrate, a processing gas supply unit for supplying the processing gas into the processing chamber, and a gas exhaust unit, for exhausting the processing chamber, having a turbo molecular pump. The method controls a processing uniformity by controlling a revolution speed of the turbo molecular pump while maintaining a pressure in the processing chamber to a predetermined level when by-products having a larger molecular mass compared to the processing gas are generated by the reaction of the processing gas.
    Type: Application
    Filed: October 17, 2014
    Publication date: April 23, 2015
    Inventors: Hiroyuki TAKAHASHI, Taechun KWON