Patents by Inventor Taeko Ikegawa

Taeko Ikegawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio
    Patent number: 6884566
    Abstract: A novel copolymer includes a repeating unit (B) derived from an unsaturated carboxylic anhydride, a repeating unit (C) represented by Formula (II), and a repeating unit (D) represented by Formula (III).
    Type: Grant
    Filed: October 16, 2003
    Date of Patent: April 26, 2005
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Kousuke Doi, Hidekatsu Kohara
  • Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio
    Publication number: 20040096772
    Abstract: A novel copolymer includes a repeating unit (B) derived from an unsaturated carboxylic anhydride, a repeating unit (C) represented by Formula (II), and a repeating unit (D) represented by Formula (III).
    Type: Application
    Filed: October 16, 2003
    Publication date: May 20, 2004
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Kousuke Doi, Hidekatsu Kohara
  • Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio
    Publication number: 20030186171
    Abstract: A novel copolymer includes a repeating unit (B) derived from an unsaturated carboxylic anhydride, a repeating unit (C) represented by Formula (II), and a repeating unit (D) represented by Formula (III).
    Type: Application
    Filed: March 4, 2003
    Publication date: October 2, 2003
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Kousuke Doi, Hidekatsu Kohara
  • Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio
    Patent number: 6517993
    Abstract: A novel copolymer includes a repeating unit (A) represented by, for example, Formula (I) below, and a repeating unit (B) derived from an unsaturated carboxylic anhydride. The novel copolymer is suitable for the preparation of a photoresist composition that has satisfactory transparency, high sensitivity and definition and exhibits satisfactory DOF properties in the field of photolithography using a deep UV light source. By the use of the photoresist composition, a process forms a resist pattern with a high aspect ratio.
    Type: Grant
    Filed: July 11, 2001
    Date of Patent: February 11, 2003
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Kousuke Doi, Hidekatsu Kohara
  • Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio
    Publication number: 20020031719
    Abstract: A novel copolymer includes a repeating unit (A) represented by, for example, Formula (I) below, and a repeating unit (B) derived from an unsaturated carboxylic anhydride. The novel copolymer is suitable for the preparation of a photoresist composition that has satisfactory transparency, high sensitivity and definition and exhibits satisfactory DOF properties in the field of photolithography using a deep UV light source. By the use of the photoresist composition, a process forms a resist pattern with a high aspect ratio.
    Type: Application
    Filed: July 11, 2001
    Publication date: March 14, 2002
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Kousuke Doi, Hidekatsu Kohara
  • Novel copolymer, photoresist composition , and process for forming resist pattern with high aspect ratio
    Publication number: 20020031720
    Abstract: A novel copolymer includes a repeating unit (B) derived from an unsaturated carboxylic anhydride, a repeating unit (C) represented by Formula (II), and a repeating unit (D) represented by Formula (III).
    Type: Application
    Filed: July 11, 2001
    Publication date: March 14, 2002
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tsuyoshi Nakamura, Taeko Ikegawa, Atsushi Sawano, Kousuke Doi, Hidekatsu Kohara