Patents by Inventor Taeko Oonuma
Taeko Oonuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12264212Abstract: There is provided a copolymer for suppressing protein adsorption, which contains a constitutional unit (a) represented by Formula 1 and a constitutional unit (b) represented by Formula 2, and which is used for producing an article that comes in contact with a protein. In the formula, R1 represents a hydrogen atom or a methyl group, R2 represents an OR33, a halogen atom, COR34, COOR35, CN, CONR36R37, or R38, where R33 to R37 each independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alicyclic group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heteroaryl group, a substituted or unsubstituted non-aromatic heterocyclic group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, or a substituted or unsubstituted organosilyl group, and R38 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted heteroaryl group.Type: GrantFiled: March 18, 2021Date of Patent: April 1, 2025Assignee: Mitsubishi Chemical CorporationInventors: Masanari Nishimura, Kazunori Mukunoki, Taeko Oonuma, Hiromi Aso, Yumiko Saeki
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Publication number: 20210206896Abstract: There is provided a copolymer for suppressing protein adsorption, which contains a constitutional unit (a) represented by Formula 1 and a constitutional unit (b) represented by Formula 2, and which is used for producing an article that comes in contact with a protein. In the formula, R1 represents a hydrogen atom or a methyl group, R2 represents an OR33, a halogen atom, COR34, COOR35, CN, CONR36R37, or R38, where R33 to R37 each independently represent a hydrogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alicyclic group, a substituted or unsubstituted aryl group, a substituted or unsubstituted heteroaryl group, a substituted or unsubstituted non-aromatic heterocyclic group, a substituted or unsubstituted aralkyl group, a substituted or unsubstituted alkaryl group, or a substituted or unsubstituted organosilyl group, and R38 represents a substituted or unsubstituted aryl group or a substituted or unsubstituted heteroaryl group.Type: ApplicationFiled: March 18, 2021Publication date: July 8, 2021Applicant: Mitsubishi Chemical CorporationInventors: Masanari NISHIMURA, Kazunori MUKUNOKI, Taeko OONUMA, Hiromi ASO, Yumiko SAEKI
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Patent number: 10793660Abstract: Provided is a macromonomer copolymer (Y) including a monomer unit of a specific macromonomer (A) and a monomer unit of a comonomer (B) copolymerizable with the macromonomer (A), in which a value of Hx represented by a specific expression is 0.05 to 0.40.Type: GrantFiled: November 14, 2018Date of Patent: October 6, 2020Assignee: Mitsubishi Chemical CorporationInventors: Go Otani, Taeko Oonuma, Yoshiko Irie
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Patent number: 10611870Abstract: The present application pertains to a production method for a polymer, including a step for polymerizing a starting material composition (I) that includes: a monomer mixture (I-1) containing a macromonomer (a) represented by the following formula (1), and (b) a vinyl monomer; and 0.01 to 5 parts by mass of a non-metallic chain transfer agent with respect to 100 parts by mass of the monomer mixture (I-1); a polymer obtained by the production method; and a molded article. According to the present invention, there can be provided a polymer having exceptional resistance to dwell-induced degradation, and a molded article having exceptional yellowing resistance, a low haze value, and exceptional pliability.Type: GrantFiled: October 14, 2014Date of Patent: April 7, 2020Assignee: Mitsubishi Chemical CorporationInventors: Kousuke Fujiyama, Masanari Nishimura, Shingo Hikita, Fuminori Nakaya, Taeko Oonuma, Tetsuya Noda
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Publication number: 20190077898Abstract: Provided is a macromonomer copolymer (Y) including a monomer unit of a specific macromonomer (A) and a monomer unit of a comonomer (B) copolymerizable with the macromonomer (A), in which a value of Hx represented by a specific expression is 0.05 to 0.40.Type: ApplicationFiled: November 14, 2018Publication date: March 14, 2019Applicant: Mitsubishi Chemical CorporationInventors: Go OTANI, Taeko Oonuma, Yoshiko Irie
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Patent number: 9796804Abstract: A molded product with excellent transparency can be obtained by using a polymer (D) obtained by suspension polymerization of a monomer mixture (1) containing (a) to (c) below: (a) 5-60 mass % of a specific macromonomer; (b) 5-60 mass % of the raw material monomer of a homopolymer (B) that has a solubility parameter that is different by 0.25 or more from the solubility parameter of the macromonomer (a); and (c) 10-80 mass % of the raw material monomer of a homopolymer (C) that has a solubility parameter that is different by less than 0.25 from the solubility parameter of macromonomer (a).Type: GrantFiled: December 18, 2013Date of Patent: October 24, 2017Assignee: Mitsubishi Chemical CorporationInventors: Taeko Oonuma, Shingo Hikita, Tetsuya Noda, Masakazu Itou
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Publication number: 20170233502Abstract: To provide a novel compound having both a surface-activating ability and a polymerization controlling ability. A compound represented by the following general formula (1) or (2): wherein, R1 and R3 are an organic group having the hydrophile-lipophile balance (HLB) determined by Griffin's method of 3 or more. The definitions of R1, R2, R3, R4, Z, p and q are described in the Description.Type: ApplicationFiled: May 1, 2017Publication date: August 17, 2017Applicant: Mitsubishi Chemical CorporationInventors: Tetsuya NODA, Fuminori NAKAYA, Keiichi SAKASHITA, Yosuke MATSUNAGA, Taeko OONUMA, Yoshiko IRIE
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Patent number: 9676888Abstract: To provide a novel compound having both a surface-activating ability and a polymerization controlling ability. A compound represented by the following general formula (1) or (2): wherein, R1 and R3 are an organic group having the hydrophile-lipophile balance (HLB) determined by Griffin's method of 3 or more. The definitions of R1, R2, R3, R4, Z, p and q are described in the Description.Type: GrantFiled: July 13, 2016Date of Patent: June 13, 2017Assignee: Mitsubishi Chemical CorporationInventors: Tetsuya Noda, Fuminori Nakaya, Keiichi Sakashita, Yosuke Matsunaga, Taeko Oonuma, Yoshiko Irie
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Publication number: 20160319063Abstract: To provide a novel compound having both a surface-activating ability and a polymerization controlling ability. A compound represented by the following general formula (1) or (2): wherein, R1 and R3 are an organic group having the hydrophile-lipophile balance (HLB) determined by Griffin's method of 3 or more. The definitions of R1, R2, R3, R4, Z, p and q are described in the Description.Type: ApplicationFiled: July 13, 2016Publication date: November 3, 2016Applicant: Mitsubishi Rayon Co., Ltd.Inventors: Tetsuya NODA, Fuminori NAKAYA, Keiichi SAKASHITA, Yosuke MATSUNAGA, Taeko OONUMA, Yoshiko IRIE
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Patent number: 9452978Abstract: To provide a novel compound having both a surface-activating ability and a polymerization controlling ability. A compound represented by the following general formula (1) or (2): wherein, R1 and R3 are an organic group having the hydrophile-lipophile balance (HLB) determined by Griffin's method of 3 or more. The definitions of R1, R2, R3, R4, Z, p and q are described in the Description.Type: GrantFiled: January 27, 2011Date of Patent: September 27, 2016Assignee: Mitsubishi Rayon Co., Ltd.Inventors: Tetsuya Noda, Fuminori Nakaya, Keiichi Sakashita, Yosuke Matsunaga, Taeko Oonuma, Yoshiko Irie
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Publication number: 20160237192Abstract: The present application pertains to a production method for a polymer, including a step for polymerizing a starting material composition (I) that includes: a monomer mixture (I-1) containing a macromonomer (a) represented by the following formula (1), and (b) a vinyl monomer; and 0.01 to 5 parts by mass of a non-metallic chain transfer agent with respect to 100 parts by mass of the monomer mixture (I-1); a polymer obtained by the production method; and a molded article. According to the present invention, there can be provided a polymer having exceptional resistance to dwell-induced degradation, and a molded article having exceptional yellowing resistance, a low haze value, and exceptional pliability.Type: ApplicationFiled: October 14, 2014Publication date: August 18, 2016Applicant: MITSUBISHI RAYON CO., LTD.Inventors: Kousuke FUJIYAMA, Masanari NISHIMURA, Shingo HIKITA, Fuminori NAKAYA, Taeko OONUMA, Tetsuya NODA
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Publication number: 20160185893Abstract: A molded product with excellent transparency can be obtained by using a polymer (D) obtained by suspension polymerization of a monomer mixture (1) containing (a) to (c) below: (a) 5-60 mass % of a specific macromonomer; (b) 5-60 mass % of the raw material monomer of a homopolymer (B) that has a solubility parameter that is different by 0.25 or more from the solubility parameter of the macromonomer (a); and (c) 10-80 mass % of the raw material monomer of a homopolymer (C) that has a solubility parameter that is different by less than 0.25 from the solubility parameter of macromonomer (a).Type: ApplicationFiled: December 18, 2013Publication date: June 30, 2016Applicant: MITSUBISHI RAYON CO., LTD.Inventors: Taeko OONUMA, Shingo HIKITA, Tetsuya NODA, Masakazu ITOU
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Publication number: 20120309900Abstract: To provide a novel compound having both a surface-activating ability and a polymerization controlling ability. A compound represented by the following general formula (1) or (2): wherein, R1 and R3 are an organic group having the hydrophile-lipophile balance (HLB) determined by Griffin's method of 3 or more. The definitions of R1, R2, R3, R4, Z, p and q are described in the Description.Type: ApplicationFiled: January 27, 2011Publication date: December 6, 2012Applicant: Mitsubishi Rayon Co., Ltd.Inventors: Tetsuya Noda, Fuminori Nakaya, Keiichi Sakashita, Yousuke Matsunaga, Taeko Oonuma, Yoshiko Irie