Patents by Inventor Taekyoon PARK

Taekyoon PARK has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11915155
    Abstract: An optimization calculation apparatus may comprise an algorithm module obtaining a plurality of first solutions (S1) from a plurality of input data, obtaining second solutions (S2) from the first solutions (S1), and repeating the process to derive an optimal solution (Sm). The optimization calculation apparatus may further comprise a similarity determination module connected to the algorithm module and computing a similarity of ith solutions in order to obtain (i+1)th solutions (1?i?m?1).
    Type: Grant
    Filed: October 8, 2018
    Date of Patent: February 27, 2024
    Assignees: Seoul National University R&DB Foundation, Korea University Research and Business Foundation
    Inventors: Jongmin Lee, Kwanyoung Lee, Yeonsoo Kim, Taekyoon Park, Gobong Choi
  • Patent number: 11715628
    Abstract: A method of forming a plasma processing apparatus comprises providing a chamber, the chamber including a wall defining an interior, and a viewport extending through the wall. An analysis apparatus connected to the viewport may be formed. The analysis apparatus includes an analyzer adjacent to the chamber, a probe connected to the analyzer and aligned with the viewport, and a first window aligned with the probe, the first window having a first surface, and a second surface at an opposite side relative to the first surface, the second surface being exposed to the interior of the chamber, and the second surface of the first window has a scattering surface.
    Type: Grant
    Filed: February 25, 2021
    Date of Patent: August 1, 2023
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Jeongil Mun, Kyeonghun Kim, Taekyoon Park, Jongwoo Sun, Seeyub Yang, Yongseok Lee, Hyungjoo Lee, Eunhee Jeang
  • Publication number: 20220044912
    Abstract: A method of forming a plasma processing apparatus comprises providing a chamber, the chamber including a wall defining an interior, and a viewport extending through the wall. An analysis apparatus connected to the viewport may be formed. The analysis apparatus includes an analyzer adjacent to the chamber, a probe connected to the analyzer and aligned with the viewport, and a first window aligned with the probe, the first window having a first surface, and a second surface at an opposite side relative to the first surface, the second surface being exposed to the interior of the chamber, and the second surface of the first window has a scattering surface.
    Type: Application
    Filed: February 25, 2021
    Publication date: February 10, 2022
    Inventors: Jeongil MUN, Kyeonghun KIM, Taekyoon PARK, Jongwoo SUN, Seeyub YANG, Yongseok LEE, Hyungjoo LEE, Eunhee JEANG
  • Publication number: 20210224667
    Abstract: An optimization calculation apparatus and an optimization calculation method are provided. The optimization calculation apparatus may comprise an algorithm module obtaining a plurality of first solutions (S1) from a plurality of input data, obtaining second solutions (S2) from the first solutions (S1) and repeating the process to derive an optimal solution (Sm), and a similarity determination module connected to the algorithm module and computing a similarity of ith solutions in order to obtain (i+1)th solutions (1?i?m?1).
    Type: Application
    Filed: October 8, 2018
    Publication date: July 22, 2021
    Inventors: Jongmin LEE, Kwanyoung LEE, Yeonsoo KIM, Taekyoon PARK, Gobong CHOI