Abstract: Exemplary embodiments of the invention disclose an exposure apparatus and a method of tuning parameters of a chuck, which may reduce a time taken to level the chuck by previously tuning parameters of the chuck. The method of tuning parameters of a chuck includes detecting a tilt component of the chuck, performing chuck tilt adjustment to minimize the tilt component of the chuck, and tuning the parameters of the chuck if a residual tilt component is present after performing the chuck tilt adjustment.

Abstract: Exemplary embodiments of the invention disclose an exposure apparatus and a method of tuning parameters of a chuck, which may reduce a time taken to level the chuck by previously tuning parameters of the chuck. The method of tuning parameters of a chuck includes detecting a tilt component of the chuck, performing chuck tilt adjustment to minimize the tilt component of the chuck, and tuning the parameters of the chuck if a residual tilt component is present after performing the chuck tilt adjustment.

Abstract: Exemplary embodiments of the invention disclose an exposure apparatus and a method of tuning parameters of a chuck, which may reduce a time taken to level the chuck by previously tuning parameters of the chuck. The method of tuning parameters of a chuck includes detecting a tilt component of the chuck, performing chuck tilt adjustment to minimize the tilt component of the chuck, and tuning the parameters of the chuck if a residual tilt component is present after performing the chuck tilt adjustment.

Abstract: A method of determining and controlling position and attitude information associated with a 6-degree-of-freedom stage includes: receiving, from a plurality of sensors associated with the 6-degree-of-freedom stage, displacement information associated with the 6-degree-of-freedom stage. A plurality of equations associated with the plurality of sensors are determined by a control unit based on the displacement information to represent an amount of change in position and attitude associated with each measurement axis of each of the plurality of sensors. The control unit determines position information and attitude information associated with the 6-degree-of-freedom stage using the equations. Movement of the 6-degree-of-freedom stage is caused, at least in part, to be controlled based on the position information, the attitude information, or both the position information and the attitude information.

Abstract: According to an example embodiment, a method to determine an exposure start position and orientation includes loading a substrate on a moving table. The substrate includes at least one alignment mark of a first set of alignment marks of a first pattern layer patterned thereon. At least one alignment mark of a second set of alignment marks of a second pattern layer is exposed on the substrate using maskless lithography. A position of the at least one alignment mark of the first set of alignment marks and a position of the at least one alignment mark of the second set of alignment marks on the substrate is measured. A relative orientation difference between a desired exposure start orientation and an obtained exposure start orientation is acquired using the measured positions of the at least one alignment mark of the first set of alignment marks and the at least one alignment mark of the second set of alignment marks.

Abstract: A method of determining and controlling position and attitude information associated with a 6-degree-of-freedom stage includes: receiving, from a plurality of sensors associated with the 6-degree-of-freedom stage, displacement information associated with the 6-degree-of-freedom stage. A plurality of equations associated with the plurality of sensors are determined by a control unit based on the displacement information to represent an amount of change in position and attitude associated with each measurement axis of each of the plurality of sensors. The control unit determines position information and attitude information associated with the 6-degree-of-freedom stage using the equations. Movement of the 6-degree-of-freedom stage is caused, at least in part, to be controlled based on the position information, the attitude information, or both the position information and the attitude information.

Abstract: Disclosed herein are a system of measuring position information of a workpiece, such as a substrate (or a semiconductor wafer) using one or more alignment systems, and a position measurement method using the same. Positions of respective alignment systems are calculated using multiple fiducial marks (FMs) disposed on a fiducial alignment scope unit mark array (FAA) on a table, and positions of alignment marks (AMs) disposed on the workpiece are measured by moving the table so that the AMs are located within a field of vision (FOV) of the alignment system. The position information of the workpiece is measured using the position information of the alignment system and the position information of the FMs.

Abstract: Exemplary embodiments of the invention disclose an exposure apparatus and a method of tuning parameters of a chuck, which may reduce a time taken to level the chuck by previously tuning parameters of the chuck. The method of tuning parameters of a chuck includes detecting a tilt component of the chuck, performing chuck tilt adjustment to minimize the tilt component of the chuck, and tuning the parameters of the chuck if a residual tilt component is present after performing the chuck tilt adjustment.

Abstract: According to an example embodiment, a method to determine an exposure start position and orientation includes loading a substrate on a moving table. The substrate includes at least one alignment mark of a first set of alignment marks of a first pattern layer patterned thereon. At least one alignment mark of a second set of alignment marks of a second pattern layer is exposed on the substrate using maskless lithography. A position of the at least one alignment mark of the first set of alignment marks and a position of the at least one alignment mark of the second set of alignment marks on the substrate is measured. A relative orientation difference between a desired exposure start orientation and an obtained exposure start orientation is acquired using the measured positions of the at least one alignment mark of the first set of alignment marks and the at least one alignment mark of the second set of alignment marks.

Abstract: In one example embodiment, position of the alignment unit is acquired using a fiducial mark formed on a moving table, and the moving table is moved such that an alignment mark formed on the workpiece is located within a field of view of the alignment unit to measure the position of the alignment mark. Subsequently, the position and posture of the workpiece are accurately measured based on the position of the alignment unit and the position of the alignment mark measured by the alignment unit.

Abstract: In one embodiment a method determines a system parameter of an alignment unit in a system that measures a position and posture of a workpiece, such as a substrate (or a semiconductor wafer), using the alignment unit. A mounting error of the alignment unit is determined, and a real system parameter value of the alignment unit is determined based on the mounting error, thereby accurately measuring position and posture information of the workpiece.

Abstract: A feeding robot which is capable of drawing a glass panel for a liquid crystal display from a cassette without bringing it into collision with the cassette, and then feeding the drawn glass panel with a reduced error, and a method for controlling the same. Determination is made as to whether an object to be fed has been accurately aligned with a traveling axis of the feeding robot. A turned angle of the object relative to the traveling axis is calculated if the object has not been accurately aligned with the traveling axis. The robot is turned by the turned angle and then draws the object. While the robot moves to a target position, a correction value for the target position is calculated, and the target position is then corrected by the calculated correction value. The feeding robot control method is capable of aligning the glass panel with a hand of the feeding robot using sensors in the robot.

Abstract: A feeding robot which is capable of drawing a glass panel for a liquid crystal display from a cassette without bringing it into collision with the cassette, and then feeding the drawn glass panel with a reduced error, and a method for controlling the same. Determination is made as to whether an object to be fed has been accurately aligned with a traveling axis of the feeding robot. A turned angle of the object relative to the traveling axis is calculated if the object has not been accurately aligned with the traveling axis. The robot is turned by the turned angle and then draws the object. While the robot moves to a target position, a correction value for the target position is calculated, and the target position is then corrected by the calculated correction value. The feeding robot control method is capable of aligning the glass panel with a hand of the feeding robot using sensors in the robot.