Abstract: A shoe insole includes an insole body for the stepping of the sole of one human foot. The insole body includes an upper insole layer having a top surface and an opposing bottom surface, a lower insole layer and a bulge. The upper insole layer is cold pressed to form bulges on the upper insole layer corresponding to different areas of the structure of the human foot. Then, the lower insole layer is bonded to the bottom surface of the upper insole layer, and then, perform cold pressing forming. Each bulge has a first convex surface and a first concave surface. The top surface of the upper insole layer integrally raised to form a first convex surface. The bottom surface of the upper insole layer integrally dented corresponding to the first convex surface to form a first concave surface.

Abstract: A thin film transistor includes a substrate, a semiconductor layer, a gate insulating layer, a gate, a source and a drain. The semiconductor layer is located above the substrate. The gate insulating layer is located above the semiconductor layer. The gate is located above the gate insulating layer and overlapping with the semiconductor layer. The gate includes a first portion, a second portion and a third portion. The first portion is extending along the surface of the gate insulating layer and directly in contact with the gate insulating layer. The second portion is separated from the gate insulating layer. Taking the surface of the gate insulating layer as a reference, the top surface of the second portion is higher than the top surface of the first portion. The third portion connects the first portion to the second portion. The source and the drain are electrically connected to the semiconductor layer.

Abstract: In an embodiment, a method includes: forming a first inter-metal dielectric (IMD) layer over a semiconductor substrate; forming a bottom electrode layer over the first IMD layer; forming a magnetic tunnel junction (MTJ) film stack over the bottom electrode layer; forming a first top electrode layer over the MTJ film stack; forming a protective mask covering a first region of the first top electrode layer, a second region of the first top electrode layer being uncovered by the protective mask; forming a second top electrode layer over the protective mask and the first top electrode layer; and patterning the second top electrode layer, the first top electrode layer, the MTJ film stack, the bottom electrode layer, and the first IMD layer with an ion beam etching (IBE) process to form a MRAM cell, where the protective mask is etched during the IBE process.

Abstract: An electronic device is disclosed. The electronic device includes a substrate, a plurality of color filters disposed on the substrate, an optical film disposed on the plurality of color filter, and a defect disposed between the substrate and the optical film. The optical film has a first base, a protective layer on the first base, and a second base between the first base and the protective layer and having a first processed area. In a top view of the electronic device, the first processed area corresponds to the defect and at least partially overlaps at least two color filters.

Abstract: A shoe insole and processing method for shoe insole are disclosed. The insole includes an insole body for the stepping of the sole of one human foot. The insole body includes an upper insole layer having a top surface and an opposing bottom surface, a lower insole layer and a bulge. The upper insole layer is cold pressed to form bulges on the upper insole layer corresponding to different areas of the structure of the human foot. Then, the lower insole layer is bonded to the bottom surface of the upper insole layer, and then, perform cold pressing forming. Each bulge has a first convex surface and a first concave surface. The top surface of the upper insole layer integrally raised to form a first convex surface. The bottom surface of the upper insole layer integrally dented corresponding to the first convex surface to form a first concave surface.

Abstract: A control assembly configured for an electronic device, the control assembly includes a mount seat configured to be installed on the electronic device, two first connection components movably connected to the mount seat, two second connection component movably connected to the two first connection components, respectively, two controllers configured to communicate with the electronic device, the two controllers are separated apart from each other and movably connected to the second connection components, respectively, such that the two controllers are connected to the mount seat via the two second connection components and the two first connection components.

Abstract: Example methods are provided to improve placement of an adaptor (210,220) to a mobile computing device (100) to measure a test strip (221) coupled to the adaptor (220) with a camera (104) and a screen (108) on a face of the mobile computing device (100). The method may include displaying a light area on a first portion of the screen (108). The first portion may be adjacent to the camera (104). The light area and the camera (104) may be aligned with a key area of the test strip (221) so that the camera (104) is configured to capture an image of the key area. The method may further include providing first guiding information for a user to place the adaptor (210,220) to the mobile computing device (100) according to a position of the light area on the screen (108).

Abstract: The present disclosure provides a method for manufacturing an auto-crosslinked hyaluronic acid gel, comprising conducting auto-crosslinking reaction of a colloid containing hyaluronic acid continuously at low temperature in an acidic environment, and treating the reaction product with steam at high temperature to obtain the auto-crosslinked hyaluronic acid gel with high viscosity.

Abstract: A TRS workflow is registered in a cloud-native biomedical informatics platform, and the TRS workflow includes at least one TRS_FQN. A workflow automation execution method applied in the cloud-native biomedical informatics platform includes providing a run sheet used to configure a sequencer to generate a first sequencing data. The run sheet includes a sample-specific metadata associating the first sequencing data, at least one TRS_FQN and a run identifier. The method further includes importing a first DRS object indicating the first sequencing data in response to the run sheet. A first WES_FQN is generated based on the run identifier and the at least one TRS_FQN and attached to the first DRS object. The method further includes performing a WES run running the TRS workflow on the first DRS object in response to the run sheet. The first DRS object is resolved based on the first WES_FQN.

Abstract: A touch function setting method is provided. The method comprising: receiving a sequence parameter which includes multiple clicks, each of the clicks is corresponding to one of areas of a touch panel or screen; receiving a function parameter corresponding to the sequence parameter, the function parameter is corresponding to activate a function; and storing a group of touch function parameters, which includes the sequence parameter and the function parameter.

Abstract: A capacitor capable of releasing reactive oxygen species and reactive nitrogen species after powering of claim 1 is composed of the dielectric material. A plurality of through holes are designed on the capacitor, the through holes being used as air gaps to supply plasma gas and blow a fan to increase the gas flow, and the voltage being connected to the two corresponding electrode edges of the capacitor so that the capacitor generating a heating temperature (lower than 200 degrees Celsius). Thereby, after the capacitor is perforated to form honeycomb shape and powered, the air surrounding the capacitor flowing through the capacitor is ionized to the oxygen ion and nitrogen ion via heating and charge-discharge, generates plasma at room temperature and atmospheric pressure and releases the reactive oxygen ions and reactive nitrogen ions healing and helpful for body healing.

Abstract: A method for automating multimodal computational workflows enables an analysis process of an instruction set to be performed automatically in a cloud environment. Localizing step includes configuring a loader to load a dataset into dataframes of a memory or copy the dataset to a local host file system from a data source; configuring a transformer to transform the dataframes of the memory into a transformed dataset; configuring a formatter to format the transformed dataset to a formatted dataset; and configuring an executor to preprocess the formatted dataset as a managed table for a first command or save the formatted dataset to the local host file system for a second command. Delocalizing step includes configuring a collector to postprocess the command outputs outputted from the memory or retrieve the command outputs from the local host file system; and configuring a writer to save the command outputs to a storage.

Abstract: A semiconductor device includes a memory structure over a substrate, wherein the memory structure includes a first word line; a first bit line over the first word line; a second bit line over the first bit line; a memory material over sidewalls of the first bit line and the second bit line; a first control word line along a first side of the memory material, wherein the first control word line is electrically connected to the first word line; a second control word line along a second side of the memory material that is opposite the first side; and a second word line over the second bit line, the first control word line, and the second control word line, wherein the second word line is electrically connected to the second control word line.

Abstract: A semiconductor device structure is provided. The semiconductor device structure includes a substrate having a base and a fin over the base. The semiconductor device structure includes a gate structure wrapping around a top portion of the fin. The semiconductor device structure includes a first nanostructure over the fin and passing through the gate structure. The semiconductor device structure includes a source/drain structure over the fin. The source/drain structure is over a side of the gate structure and connected to the first nanostructure, the source/drain structure has an upper portion, a lower portion, and a neck portion between the upper portion and the lower portion, the upper portion has a first diamond-like shape, and the lower portion is wider than the neck portion.

Abstract: A method includes determining a first offset between a first alignment mark on a first side of a first wafer and a second alignment mark on a second side of the first wafer; aligning the first alignment mark of the first wafer to a third alignment mark on a first side of a second wafer, which includes detecting a location of the second alignment mark of the first wafer; determining a location of the first alignment mark of the first wafer based on the first offset and the location of the second alignment mark of the first wafer; and, based on the determined location of the first alignment mark, repositioning the first wafer to align the first alignment mark to the third alignment mark; and bonding the first side of the first wafer to the first side of the second wafer to form a bonded structure.

Abstract: A semiconductor device includes a memory structure over a substrate, wherein the memory structure includes a first word line; a first bit line over the first word line; a second bit line over the first bit line; a memory material over sidewalls of the first bit line and the second bit line; a first control word line along a first side of the memory material, wherein the first control word line is electrically connected to the first word line; a second control word line along a second side of the memory material that is opposite the first side; and a second word line over the second bit line, the first control word line, and the second control word line, wherein the second word line is electrically connected to the second control word line.

Abstract: A memory device and a method of manufacturing the same are provided. The memory device includes a semiconductor substrate, an interconnect structure and a memory cell. The interconnect structure is disposed over the semiconductor substrate, and the memory cell is disposed over the interconnect structure and electrically coupled with the semiconductor substrate and the interconnect structure. The memory cell includes a spin Hall electrode layer, an MTJ pillar, a hard mask, and a spacer. The MTJ pillar is disposed on the spin Hall electrode layer, the hard mask is disposed on the MTJ pillar, and the spacer is disposed on sidewalls of the MTJ pillar and the hard mask. Suitably, the spin Hall electrode layer at least comprises an inner portion and an outer portion surrounding the inner portion, and a top surface of the outer portion is lower than a top surface of the inner portion.

Abstract: The current disclosure describes techniques for forming gate-all-around (“GAA”) devices from stacks of separately formed nanowire semiconductor strips. The separately formed nanowire semiconductor strips are tailored for the respective GAA devices. A trench is formed in a first stack of epitaxy layers to define a space for forming a second stack of epitaxy layers. The trench bottom is modified to have determined or known parameters in the shapes or crystalline facet orientations. The known parameters of the trench bottom are used to select suitable processes to fill the trench bottom with a relatively flat base surface.

Abstract: A semiconductor device includes a substrate and a memory array disposed over the substrate. The memory array includes at least one film stack disposed over the substrate, a memory layer disposed over the substrate and covering a sidewall and a top of the film stack, a selector layer disposed on the memory layer, and at least one word line disposed on the selector layer and extending transversely with respect to the film stack. The film stack includes conductive layers and insulating layers alternately arranged, each conductive layer includes a first material and a second material in direct contact with each other, and a resistivity value of the second material is lower than a resistivity value of the first material.

Abstract: A memory cell includes pair of metal layers, insulating layer, memory layer, selector layer, and word line. The pair of metal layers extends in a first direction. A first metal layer of the pair is disposed in contact with a second metal layer of the pair. The first metal layer includes a first material. The second metal layer includes a second material. The second metal layer laterally protrudes with respect to the first metal layer along a second direction perpendicular to the first direction. The insulating layer extends in the first direction and is disposed on top of the pair. The memory layer conformally covers sides of the pair. The selector layer is disposed on the memory layer. The word line extends along the second direction on the selector layer over the pair.