Patents by Inventor Tai-Liang LYU

Tai-Liang LYU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mechanisms for cleaning wafer and scrubber
    Patent number: 9478444
    Abstract: Embodiments of mechanisms for cleaning a wafer are provided. A method for cleaning a wafer includes cleaning a wafer by using a wafer scrubber and cleaning the wafer scrubber in a scrubber cleaning module. An agitated cleaning liquid is applied on the wafer scrubber to clean the wafer scrubber. The method also includes cleaning the wafer or a second wafer by the wafer scrubber after the wafer scrubber is cleaned by the agitated cleaning liquid.
    Type: Grant
    Filed: July 23, 2013
    Date of Patent: October 25, 2016
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Tai-Liang Lyu, Shao-Yen Ku, Tzu-Yang Chung, Chia-Ming Tai, Chao-Hui Kuo
  • MECHANISMS FOR CLEANING WAFER AND SCRUBBER
    Publication number: 20150027489
    Abstract: Embodiments of mechanisms for cleaning a wafer are provided. A method for cleaning a wafer includes cleaning a wafer by using a wafer scrubber and cleaning the wafer scrubber in a scrubber cleaning module. An agitated cleaning liquid is applied on the wafer scrubber to clean the wafer scrubber. The method also includes cleaning the wafer or a second wafer by the wafer scrubber after the wafer scrubber is cleaned by the agitated cleaning liquid.
    Type: Application
    Filed: July 23, 2013
    Publication date: January 29, 2015
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Tai-Liang LYU, Shao-Yen KU, Tzu-Yang CHUNG, Chia-Ming TAI, Chao-Hui KUO