Abstract: A sputtering apparatus includes a space defining member defining a sputtering space for forming a film on a substrate. The space defining member includes a concave portion, and an opening portion is provided in the bottom portion of the concave portion. The sputtering apparatus includes a shield member configured to shield the opening portion from the sputtering space. The opening portion is formed so that a pressure gauge capable of measuring the pressure in the sputtering space can be attached, and the shield member is arranged so that at least a part of the shield member is buried in the concave portion.

Abstract: A sputtering apparatus includes a space defining member defining a sputtering space for forming a film on a substrate. The space defining member includes a concave portion, and an opening portion is provided in the bottom portion of the concave portion. The sputtering apparatus includes a shield member configured to shield the opening portion from the sputtering space. The opening portion is formed so that a pressure gauge capable of measuring the pressure in the sputtering space can be attached, and the shield member is arranged so that at least a part of the shield member is buried in the concave portion.

Abstract: A vacuum processing apparatus includes a tray configured to hold a substrate, a tray support member including an arm configured to support the tray, and a holder to which the tray support member is attached. The arm includes a support portion which abuts against a lower portion of the tray, and a counterbore portion formed into a recessed shape below an edge of the tray such that the counterbore portion does not abut against the tray. When the tray is supported by the tray support member, an edge of an outer side surface of the tray is positioned above the counterbore portion and does not contact the tray support member, and the tray support member is configured to support the tray while pushing the tray against the holder. The tray is configured to form a space with the holder when pushed against the holder while holding the substrate and includes, on a side of the holder, a substantially ring-like projection configured to abut against the holder.

Abstract: A chuck capable of holding a tray capable of holding a substrate in a predetermined position in a vacuum vessel includes a vertically movable frame, and an arm extending from the frame toward the tray and capable of supporting the tray. The arm includes a support portion which abuts against the tray, and a counterbore portion formed on that side of the support portion which faces the frame. This structure can reduce the warpage of the tray.

Abstract: Two shutter plates form a double rotary shutter mechanism. A cylindrical second deposition shield is interposed between the first shutter plate disposed on the side of a target and the second shutter plate so as to surround a first opening formed in the first shutter plate. A cylindrical first deposition shield is interposed between a sputtering cathode and the first shutter plate so as to surround the front surface region of the target. This makes it possible to prevent a sputtering substance from passing through the gaps between the first shutter plate and the second shutter plate and between the first shutter plate and the sputtering cathode, and to, in turn, prevent generation of any cross-contamination.

Abstract: A dry etching method in which a plasma of an etching gas is generated and a magnetic material is dry-etched using a mask material made of a non-organic material, wherein an alcohol having at least one hydroxyl group is used as the etching gas. The alcohol used as the etching gas has one hydroxyl group such as an alcohol selected from the group including methanol (CH3OH), ethanol (C2H5OH) and propanol (C3H7OH).

Abstract: A dry etching method in which a plasma of an etching gas is generated and a magnetic material is dry-etched using a mask material made of a non-organic material, wherein an alcohol having at least one hydroxyl group is used as the etching gas. The alcohol used as the etching gas has one hydroxyl group such as an alcohol selected from the group including methanol (CH3OH), ethanol (C2H5OH) and propanol (C3H7OH).

Abstract: A dry etching method in which a plasma of an etching gas is generated and a magnetic material is dry-etched using a mask material made of a non-organic material, wherein an alcohol having at least one hydroxyl group is used as the etching gas. The alcohol used as the etching gas has one hydroxyl group such as an alcohol selected from the group including methanol (CH3OH), ethanol (C2H5OH) and propanol (C3H7OH).