Patents by Inventor Taichi Kiuchi

Taichi Kiuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and system for charged particle beam lithography
    Patent number: 8673542
    Abstract: There is disclosed a lithography method and system implemented by a charged particle beam passed through a shaping slit member having plural circular apertures of different diameters. The method and system operate to delineate a circular pattern by shooting the shaped circular beam passed through the desired circular aperture onto a workpiece. The method and system consists of causing circular beams shaped using different ones of the circular apertures to be shot onto the workpiece such that the circular beams are coincident with each other in center position to thereby delineate a circular pattern of a desired size. Consequently, circular patterns in a wide range of sizes can be obtained, although a limited number of circular apertures are used.
    Type: Grant
    Filed: August 10, 2012
    Date of Patent: March 18, 2014
    Assignee: JEOL Ltd.
    Inventors: Taichi Kiuchi, Takahisa Hasegawa
  • Method and System for Charged Particle Beam Lithography
    Publication number: 20130040241
    Abstract: There is disclosed a lithography method and system implemented by a charged particle beam passed through a shaping slit member having plural circular apertures of different diameters. The method and system operate to delineate a circular pattern by shooting the shaped circular beam passed through the desired circular aperture onto a workpiece. The method and system consists of causing circular beams shaped using different ones of the circular apertures to be shot onto the workpiece such that the circular beams are coincident with each other in center position to thereby delineate a circular pattern of a desired size. Consequently, circular patterns in a wide range of sizes can be obtained, although a limited number of circular apertures are used.
    Type: Application
    Filed: August 10, 2012
    Publication date: February 14, 2013
    Applicant: JEOL LTD.
    Inventors: Taichi Kiuchi, Takahisa Hasegawa