Abstract: The alignment mechanism of the present disclosure is configured to adjust positions of a substrate and a mask, the alignment mechanism being characterized by including a substrate suctioner configured to suction and hold the substrate; a mask supporter configured to support the mask; a temporary receiver configured to temporarily support at least one of the substrate to be suctioned by the substrate suctioner and the mask to be placed on the mask supporter, the temporary receiver being provided at the mask supporter; a horizontal coarse movement stage mechanism that carries the mask supporter and the temporary receiver and moves the mask supporter and the temporary receiver within the horizontal plane; and a vertical coarse movement stage mechanism that raises and lowers the horizontal coarse movement stage mechanism.