Patents by Inventor Taiki Tsuzukiishi

Taiki Tsuzukiishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11692134
    Abstract: The present invention relates to a method for producing an InP-based quantum dot precursor from a phosphorus source and an indium source, in which a silylphosphine compound represented by the following Formula (1) with a content of a compound represented by the following Formula (2) of 0.3 mol % or less is used as the phosphorus source. Further, the present invention provides a method for producing an InP-based quantum dot comprising heating an InP quantum dot precursor to a temperature of 200° C. or more and 350° C. or less to obtain an InP quantum dot. (R is as defined in the specification.
    Type: Grant
    Filed: March 26, 2020
    Date of Patent: July 4, 2023
    Assignee: NIPPON CHEMICAL INDUSTRIAL CO., LTD.
    Inventors: Kazuhiro Nakatsui, Taiki Tsuzukiishi, Tomo Sakanoue
  • Publication number: 20220194889
    Abstract: A method for producing an indium carboxylate of the present invention comprises the steps of reacting a hydroxyl group-containing indium carboxylate represented by Formula (1): In(RCOO)3-x(OH)x, wherein R is a straight chain or branched chain aliphatic group having 0 to 5 carbon atoms, and x is a number more than 0 and less than 3, with a lower carboxylic acid represented by the following Formula (2): R?COOH, wherein R? is a hydrogen atom or a straight chain or branched chain aliphatic group having 1 to 5 carbon atoms, and the hydrogen atom in the aliphatic group may be replaced with a halogen atom, so as to obtain a product; and then reacting the product with a higher carboxylic acid having 12 or more carbon atoms.
    Type: Application
    Filed: March 26, 2020
    Publication date: June 23, 2022
    Applicant: NIPPON CHEMICAL INDUSTRIAL CO., LTD.
    Inventors: Kazuhiro Nakatsui, Taiki Tsuzukiishi
  • Publication number: 20220195299
    Abstract: The present invention relates to a method for producing an InP-based quantum dot precursor from a phosphorus source and an indium source, in which a silylphosphine compound represented by the following Formula (1) with a content of a compound represented by the following Formula (2) of 0.3 mol % or less is used as the phosphorus source. Further, the present invention provides a method for producing an InP-based quantum dot comprising heating an InP quantum dot precursor to a temperature of 200° C. or more and 350° C. or less to obtain an InP quantum dot. (R is as defined in the specification.
    Type: Application
    Filed: March 26, 2020
    Publication date: June 23, 2022
    Applicant: NIPPON CHEMICAL INDUSTRIAL CO., LTD.
    Inventors: Kazuhiro Nakatsui, Taiki Tsuzukiishi, Tomo Sakanoue