Patents by Inventor Taira Hasegawa

Taira Hasegawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130008870
    Abstract: To make an arrangement so as not to give any damage to the central part of a substrate during the operation for removing unnecessary film coated on the outer peripheral part of the substrate. The stage is provided therein with a refrigerant chamber 41 as a heat absorber and a refrigerant such as water is filled in the chamber. A wafer 90 is contacted with and supported on the support surface 10a of the stage 10. A reactive gas for removing unnecessary film is supplied the outer periphery of the wafer 90 through a reactive gas jet port 30b while heating the outer periphery of the wafer 90. On the other hand, the area inside the outer peripheral part of the wafer 90 is heat-absorbed by the heat absorber.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 10, 2013
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Mitsuhide NOGAMI, Taira HASEGAWA, Syunsuke KUNUGI
  • Publication number: 20080073324
    Abstract: To make an arrangement so as not to give any damage to the central part of a substrate during the operation for removing unnecessary film coated on the outer peripheral part of the substrate. The stage is provided therein with a refrigerant chamber 41 as a heat absorber and a refrigerant such as water is filled in the chamber. A wafer 90 is contacted with and supported on the support surface 10a of the stage 10. A reactive gas for removing unnecessary film is supplied the outer periphery of the wafer 90 through a reactive gas jet port 30b while heating the outer periphery of the wafer 90. On the other hand, the area inside the outer peripheral part of the wafer 90 is heat-absorbed by the heat absorber.
    Type: Application
    Filed: July 8, 2005
    Publication date: March 27, 2008
    Applicant: Sekisui Chemical Co., Ltd.
    Inventors: Mitsuhide Nogami, Taira Hasegawa, Syunsuke Kunugi
  • Publication number: 20080017613
    Abstract: To enhance a removing efficiency of unnecessary matters on a peripheral part of a substrate (90) such as wafer and to prevent particles from adhering to the substrate (90). A reactive gas is jetted out from a jet nozzle (75) toward a target spot (P) of the peripheral part of the substrate (90) in such a way that the reactive gas is made to flow approximately along a circumferential direction at the target spot (P) of the substrate (90) as viewed from a direction orthogonal to the substrate (90). Gases near the target spot (P) are sucked by a suction nozzle (76) along approximately the circumferential direction at a downstream side of the target spot (P).
    Type: Application
    Filed: July 17, 2007
    Publication date: January 24, 2008
    Inventors: Mitsuhide Nogami, Taira Hasegawa, Syunsuke Kunugi
  • Publication number: 20060035129
    Abstract: A proton conducting membrane having a high ionic conductivity and an excellent high temperature dimensional stability which can perform stably even at high temperatures, a method for producing the same and a solid polymer-based fuel cell comprising same are provided.
    Type: Application
    Filed: February 5, 2004
    Publication date: February 16, 2006
    Inventors: Shigeki Nomura, Kenji Yamauchi, Satoshi Koma, Toshiya Sugimoto, Taira Hasegawa