Patents by Inventor Taisuke Isano
Taisuke Isano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220155659Abstract: A carriage that records data while moving on a rail system including a first moving unit located on one side of the rail and configured to move along the rail, a second moving unit located on a different side of the rail from the first moving unit and configured to move along the rail, a spring unit configured to slide one or more of the moving units in a direction perpendicular to the direction of the rail, and a position maintaining unit located between the first moving unit and the second moving unit, wherein the position maintaining unit prevents the first moving unit or the second moving unit from sliding more than a predetermined distance when traveling along the rail.Type: ApplicationFiled: March 11, 2020Publication date: May 19, 2022Inventors: Connor LESCHINSKY, Thomas WHEELESS, Leonard PASCUAL, Hesham ELSAGHIR, Paul RISQUE, Taisuke ISANO
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Publication number: 20210282331Abstract: A system for monitoring vegetation in a predetermined space includes an image capturing unit, a lighting unit, a rail unit on which the image capturing unit and lighting unit move, wherein, in a case where a lighting condition of the predetermined space is a first lighting condition, the image capturing unit performs image capturing of the vegetation, and wherein, in a case where the lighting condition of the predetermined space is a second lighting condition, different from the first lighting condition, the image capturing unit does not perform image capturing.Type: ApplicationFiled: August 28, 2019Publication date: September 16, 2021Inventors: Taisuke ISANO, Connor LESCHINSKY, Hesham ELSAGHIR, Leonard PASCUAL, Thomas WHEELESS, Paul RISQUE
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Patent number: 8309176Abstract: A method for manufacturing a three-dimensional structure includes forming a first structure having a relief pattern on a substrate, forming a sacrifice layer on the first structure such that the sacrifice layer can be filled in a concave part of the first structure and the sacrifice layer can cover a surface of a convex part of the first structure on a side opposite to the substrate, forming a second structure having a relief pattern on the sacrifice layer, and a fourth step of removing the sacrifice layer from between the first structure and the second structure, and thereby bringing the second structure into contact with the surface of the first structure.Type: GrantFiled: June 4, 2009Date of Patent: November 13, 2012Assignee: Canon Kabushiki KaishaInventors: Taisuke Isano, Kosuke Asano, Yasushi Kaneda
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Patent number: 8305683Abstract: A polarizer of the present invention having a higher level of polarization performance for a light in the deep ultraviolet wavelength range includes: a substrate transparent to deep ultraviolet light; and a periodic structure including a plurality of structural elements at predetermined intervals on the substrate, the polarizer being configured so that the deep ultraviolet light incident thereon is split into a light component reflected by the periodic structure and a light component passing between the structural elements adjacent to each other, and the periodic structure being composed of chromium oxide or tungsten.Type: GrantFiled: November 11, 2009Date of Patent: November 6, 2012Assignee: Canon Kabushiki KaishaInventors: Kosuke Asano, Taisuke Isano, Yasushi Kaneda
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Patent number: 8120848Abstract: A waveplate including a dielectric substrate and a periodic structure formed on the dielectric substrate, said periodic structure having a period which is equal to or smaller than a wavelength of an incident light, wherein the periodic structure is constructed of a deposited film, and a refractive index of the deposited film gradually changes in a thicknesswise direction of the deposited film.Type: GrantFiled: November 30, 2007Date of Patent: February 21, 2012Assignee: Canon Kabushiki KaishaInventor: Taisuke Isano
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Publication number: 20100118392Abstract: A polarizer of the present invention having a higher level of polarization performance for a light in the deep ultraviolet wavelength range includes: a substrate transparent to deep ultraviolet light; and a periodic structure including a plurality of structural elements at predetermined intervals on the substrate, the polarizer being configured so that the deep ultraviolet light incident thereon is split into a light component reflected by the periodic structure and a light component passing between the structural elements adjacent to each other, and the periodic structure being composed of chromium oxide or tungsten.Type: ApplicationFiled: November 11, 2009Publication date: May 13, 2010Applicant: CANON KABUSHIKI KAISHAInventors: Kosuke Asano, Taisuke Isano, Yasushi Kaneda
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Publication number: 20090304928Abstract: A method for manufacturing a three-dimensional structure includes forming a first structure having a relief pattern on a substrate, forming a sacrifice layer on the first structure such that the sacrifice layer can be filled in a concave part of the first structure and the sacrifice layer can cover a surface of a convex part of the first structure on a side opposite to the substrate, forming a second structure having a relief pattern on the sacrifice layer, and a fourth step of removing the sacrifice layer from between the first structure and the second structure, and thereby bringing the second structure into contact with the surface of the first structure.Type: ApplicationFiled: June 4, 2009Publication date: December 10, 2009Applicant: CANON KABUSHIKI KAISHAInventors: Taisuke Isano, Kosuke Asano, Yasushi Kaneda
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Patent number: 7428101Abstract: A dielectric substrate having a refractive index n1 is covered with an amorphous dielectric medium having a refractive index n2 larger than the refractive index n1, and a rectangular grating is formed in the amorphous dielectric medium through an etching process. When microcrystal is formed in the amorphous dielectric medium through a thermal treatment to increase the refractive index n2, a magnitude ?n of structure double refraction increases accordingly. Hence, a phase refraction ?? of an irregular grating pattern in the rectangular grating becomes large without increasing a depth D of each trench of the rectangular grating, and thus it is possible to obtain an optical retardation plate having a fine periodic structure and having a desired plate retardation.Type: GrantFiled: February 24, 2005Date of Patent: September 23, 2008Assignee: Canon Kabushiki KaishaInventor: Taisuke Isano
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Publication number: 20080158674Abstract: A waveplate including a dielectric substrate and a periodic structure formed on the dielectric substrate, said periodic structure having a period which is equal to or smaller than a wavelength of an incident light, wherein the periodic structure is constructed of a deposited film, and a refractive index of the deposited film gradually changes in a thicknesswise direction of the deposited film.Type: ApplicationFiled: November 30, 2007Publication date: July 3, 2008Applicant: CANON KABUSHIKI KAISHAInventor: Taisuke Isano
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Publication number: 20060140538Abstract: A surface reflection type phase grating 21 in which first metal film 23 is formed on a substrate 22, metal gratings 24 of a rectangular cross-sectional shape having a thickness d for which first-order diffraction becomes maximum by second metal film 24 formed of a material differing from that of the first metal film 23 is formed thereon, and transparent dielectric film 26 formed of SiO2 is further formed on the surfaces of the metal gratings 24 and the first metal film 23 exposed among them, and a displacement measuring apparatus adopting the surface reflection type phase grating.Type: ApplicationFiled: December 22, 2005Publication date: June 29, 2006Inventors: Taisuke Isano, Ko Ishizuka
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Publication number: 20050191467Abstract: A dielectric substrate having a refractive index n1 is covered with an amorphous dielectric medium having a refractive index n2 larger than the refractive index n1, and a rectangular grating is formed in the amorphous dielectric medium through an etching process. When microcrystal is formed in the amorphous dielectric medium through a thermal treatment to increase the refractive index n2, a magnitude ?n of structure double refraction increases accordingly. Hence, a phase refraction ?? of an irregular grating pattern in the rectangular grating becomes large without increasing a depth D of each trench of the rectangular grating, and thus it is possible to obtain an optical retardation plate having a fine periodic structure and having a desired plate retardation.Type: ApplicationFiled: February 24, 2005Publication date: September 1, 2005Inventor: Taisuke Isano