Abstract: Among other things, one or more interconnect structures and techniques for forming such interconnect structures within integrated circuits are provided. An interconnect structure comprises one or more kinked structures, such as metal structures or via structures, formed according to a kinked profile. For example, the interconnect structure comprises a first kinked structure having a first tapered portion and a second kinked structure having a second tapered portion. The first tapered portion and the second tapered portion are both situated at an interface between two layers. Current leakage at the interface is mitigated because a length of the interface corresponds to a distance between the first tapered portion and the second tapered portion that is relatively larger than if the first kinked structure and the second kinked structure were merely formed according to a non-tapered shape.

Abstract: Among other things, one or more semiconductor devices and techniques for forming such semiconductor devices are provided. The semiconductor device comprises a strip-ground field plate. The strip-ground field plate is connected to a source region of the semiconductor device and/or a ground plane. The strip-ground field plate provides a release path for a gate edge electric field. The release path directs an electrical field away from a gate region of the semiconductor device. In this way, breakdown voltage and gate charge are improved.

Abstract: Among other things, one or more image sensors and techniques for guiding light towards a photodiode are provided. An image sensor comprises a metal grid configured to direct light towards a corresponding photodiode and away from other photodiodes. The image sensor also comprises a dielectric grid and a filler grid over the metal grid to direct light towards the corresponding photodiode and away from other photodiodes, where the filler grid has a different refractive index than the dielectric grid. In this way, crosstalk, otherwise resulting from detection of light by incorrect photodiodes, is mitigated.

Abstract: One or more electrostatic discharge (ESD) control circuit are disclosed herein. In an embodiment, an ESD control circuit has first and second trigger transistors, first and second ESD transistors, and first and second feedback transistors. The ESD transistors provide ESD current paths for ESD current generated during an ESD event. The first and second trigger transistors are on during normal operation to maintain the ESD transistors in an off state. During an ESD event, the first and second transistors are turned off to enable the first and second ESD transistors to provide ESD current paths. The first and second feedback transistors turn on during an ESD event to reinforce the on state of the ESD transistors and to reinforce the off state of the trigger transistors. In this way, the ESD control circuit stably provides multiple ESD current paths to discharge ESD current.

Abstract: A band gap reference circuit is provided that includes a first resistor (R1), a second resistor (R2), a third resistor (R3), a fourth resistor (Ra), a fifth resistor (Rb), a capacitor (Ca), an operational amplifier A, a first field effect transistor (FET) (P1), a second FET (P2), a third FET (P3), a fourth FET (Pa), a first bipolar junction transistor (BJT) (Q1), a second BJT (Q2), and a third BJT (Q3). P3 and Rb are used to control Pa, which is configured to control current flow to a reference node, and thus a reference voltage (Vref) output by the band gap reference circuit. The band gap reference circuit is configured to output a substantially constant reference voltage and is less sensitive or susceptible to noise from a power supply. Additionally, the band gap reference circuit prevents Vref from overshooting when the band gap circuit is enabled.

Abstract: Among other things, one or more techniques and systems for generating a common design rule check (DRC) rule set for verification of a design layout and for generating a common dummy insertion utility for design layout processing are provided. That is, the common DRC rule set comprises a set of design rules having design rule constraint values corresponding to a restriction threshold, such as a most restrictive value. The common dummy insertion utility is used to insert dummy polygons into a design layout according to a dummy size constraint and a dummy spacing constraint. The design layout is verified as compliant with the common DRC rule set. Once verified, the design layout can be converted from a universal design layout format to a target metal scheme to create a transformed design layout. In this way, design layouts, formatted according to the universal design layout, can be transformed to other formats.

Abstract: One or more embodiments of techniques or systems for forming a semiconductor structure are provided herein. In some embodiments, a semiconductor structure includes a substrate, a first lightly doped drain (LDD), a second LDD, an interface layer (IL), a high-k stack, a gate region, a dummy poly region, a first hard mask (HM) region, a second HM region, and a seal spacer region. The HK stack has a HK stack width and the gate region has a gate region width that is less than or substantially equal to the HK stack width. Because of the increased width of the HK stack, some of the HK stack likely overlaps some of the first LDD or the second LDD. In this manner, a saturation current and a threshold voltage associated with the semiconductor structure are improved. The increased width of the HK stack also protects more of the IL during LDD implanting.

Abstract: Among other things, one or more techniques and systems for cleaning a scrub brush of a scrubber utilized in semiconductor fabrication are provided. In particular, a charge modification element, such as a base pH material or ammonia, is applied to the scrub brush to modify a charge of a particle on the scrub brush to a modified charge. The modified charge of the particle is similar to a charge of the scrub brush, such that the particle and the scrub brush repel one another. The particle can be detached from the scrub brush utilizing various techniques such as a de-ionized water technique or a mechanical cleaning bar technique. In this way, one or more particles can be detached from the scrub brush to clean the scrub brush of particles so that the scrub brush can be used to clean a semiconductor wafer.

Abstract: Among other things, techniques and systems are provided for devising a schedule for performing read/write operations on a memory cell. A control signal is provided to timing logic. Using one or more properties of the control signal, such as a voltage property, the timing logic is configured to adjust a time window during which at least one of a read operation or a write operation is performed within a cycle. In this way, the timing logic affects a dynamic switch between an early-read operation, a late-read operation, an early-write operation, a late-write operation, a read-then-write operation, and a write-then-read operation between cycles. In some embodiments, the memory cell for which the schedule is devised is an SRAM cell, such as a six-transistor SRAM cell.

Abstract: Among other things, one or more techniques and systems for selectively filtering RF signals within one or more RF frequency band are provided. In particular, an RF choke, such as a 3D RF choke or a semi-lumped RF choke, configured to selectively filter such RF signals is provided. The RF choke comprises a metal connection line configured as an inductive element for the RF choke. In an example, one or more metal lines, such as a metal open stub, are formed as capacitive elements for the RF choke. In another example, one or more through vias are formed as capacitive elements for the RF choke. In this way, the RF choke allows DC power signals to pass through the metal connection line, while impeding RF signals within the one or more RF frequency bands from passing through the metal connection line.

Abstract: One or more embodiments of techniques or systems for variation factor assignment for a device are provided herein. In some embodiments, a peripheral environment is determined for a device. A peripheral environment is a layout structure or an instance. When the peripheral environment is the layout structure, a variation factor is assigned to the device based on an architecture associated with the layout structure. When the peripheral environment is the instance, the variation factor is assigned to the device based on a bounding window created for the instance. In this manner, variation factor assignment is provided, such that a first device within a first block of a die has a different variation factor than a second device within a second block of the die, thus giving finer granularity to variation factor assignments.

Abstract: Among other things, one or more techniques and systems for performing design layout are provided. An initial design layout is associated with an electrical component, such as a standard cell. The initial design layout comprises a first pattern, such as a mandrel pattern, and a second pattern, such as a passive fill pattern. An initial cut pattern is generated for the initial design layout. Responsive to identifying a design rule violation associated with the initial cut pattern, the initial design layout is modified to generate a modified initial design layout. An updated cut pattern, not resulting in the design rule violation, is generated based upon the modified initial design layout. The updated cut pattern is applied to the modified initial design layout to generate a final design layout. The final design layout can be verified as self-aligned multiple patterning (SAMP) compliant.

Abstract: One or more techniques or systems for controlling a voltage divider are provided herein. In some embodiments, a control circuit is configured to bias a pull up unit of a voltage divider using an analog signal, thus enabling the voltage divider to be level tunable. In other words, the control circuit enables the voltage divider to output multiple voltage levels. Additionally, the control circuit is configured to bias the pull up unit based on a bias timing associated with a pull down unit of the voltage divider. For example, the pull up unit is activated after the pull down unit is activated. In this manner, the control circuit provides a timing boost, thus enabling the voltage divider to stabilize more quickly.

Abstract: One or more techniques or systems for determining double patterning technology (DPT) layout routing compliance are provided herein. For example, a layout routing component of a system is configured to assign a pin loop value to a pin loop. In some embodiments, the pin loop value is assigned based on a mask assignment of a pin of the pin loop. In some embodiments, the pin loop value is assigned based on a number of nodes associated with the pin loop. DPT compliance or a DPT violation is determined for the pin loop based on the pin loop value. In this manner, odd loop detection associated with DPT layout routing is provided because a DPT violation results in generation of an additional instance of a net, for example. Detecting an odd loop allows a design to be redesigned before fabrication, where the odd loop would present undesired issues.

Abstract: One or more techniques or systems for mitigating pattern collapse are provided herein. For example, a semiconductor structure for mitigating pattern collapse is formed. In some embodiments, the semiconductor structure includes an extreme low-k (ELK) dielectric region associated with a via or a metal line. For example, a first metal line portion and a second metal line portion are associated with a first lateral location and a second lateral location, respectively. In some embodiments, the first portion is formed based on a first stage of patterning and the second portion is formed based on a second stage of patterning. In this manner, pattern collapse associated with the semiconductor structure is mitigated, for example.

Abstract: One or more techniques or systems for bias control are provided herein. In some embodiments, the bias control relates to biasing of a column of one or more pixels for an image sensor. In some embodiments, an associated circuit includes a reset transistor, a source-follower transistor, a first transfer transistor, a first bias transistor, a second bias transistor, and a switch connected to the second bias transistor. In some embodiments, the first bias transistor and the second bias transistor bias a column of pixels at a first time. In some embodiments, the second bias transistor is turned off, thus removing a second bias at a second time. In this way, performance of the image sensor is improved, at least because the second bias transistor enables faster settling time when active, and a wide pixel operation range when switched off.

Abstract: One or more techniques or systems for forming an n-type metal oxide semiconductor (NMOS) transistor for electrostatic discharge (ESD) are provided herein. In some embodiments, the NMOS transistor includes a first region, a first n-type plus (NP) region, a first p-type plus (PP) region, a second NP region, a second PP region, a shallow trench isolation (STI) region, and a gate stack. In some embodiments, the first PP region is between the first NP region and the second NP region. In some embodiments, the second NP region is between the first PP region and the second PP region, the gate stack is between the first PP region and the second NP region, the STI region is between the second NP region and the second PP region. Accordingly, the first PP region enables ESD current to discharge based on a low trigger voltage for the NMOS transistor.

Abstract: Among other things, a system and method for adjusting the intensity of a laser beam applied to a semiconductor device are provided for herein. A sensor is configured to measure the intensity of a laser beam reflected from the semiconductor device. Based upon the reflection intensity, an intensity of the laser beam that is applied to the semiconductor device is adjusted, such as to alter an annealing operation performed on the semiconductor device, for example.

Abstract: One or more techniques or systems for mitigating density gradients between two or more regions of cells are provided herein. In some embodiments, an array of cells is associated with a dummy region. For example, the array of cells includes an array of gates and an array of OD regions. In some embodiments, the array of gates includes a first set of gates associated with a first gate dimension and a second set of gates associated with a second gate dimension. In some embodiments, the array of OD regions includes a first set of OD regions associated with a first OD dimension and a second set of OD regions associated with a second OD dimension. In this manner, at least one of a pattern density, gate density, or OD density is customized to a region associated with active cells, thus mitigating density gradients between respective regions.

Abstract: One or more techniques or systems for forming a black level correction (BLC) structure are provided herein. In some embodiments, the BLC structure comprises a first region, a second region above at least some of the first region, and a third region above at least some of the second region. For example, the first region comprises silicon and the third region comprises a passivation dielectric. In some embodiments, the second region comprises a first sub-region, a second sub-region above the first sub-region, and a third sub-region above the second sub-region. For example, the first sub-region comprises a metal-silicide, the second sub-region comprises a metal, and the third sub-region comprises a metal-oxide. In this manner, a BLC structure is provided, such that a surface of the BLC structure is flush, at least because the third region is flush, for example.