Patents by Inventor Taiyoung KIM

Taiyoung KIM has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR PREPARING A POLISHING SLURRY HAVING HIGH DISPERSION STABILITY
    Publication number: 20090229189
    Abstract: The present invention relates to an improved method for preparing a polishing slurry, comprising dispersing polishing particles and an anionic polymeric acid in water and then adding to the resulting dispersion an alkaline material in an amount of 0.1 to 8 weight parts based on 100 weight parts of the polishing particles. The polishing slurry obtained by the inventive method exhibits good dispersion stability and non-Prestonian polishing performance, which can be beneficially employed in chemical mechanical polishing of various precision electronic devices.
    Type: Application
    Filed: May 13, 2009
    Publication date: September 17, 2009
    Inventors: Yun Ju CHO, In Yeon LEE, Hoon Soo JEON, Duk Young HONG, Taiyoung KIM, Sangick LEE, Eunkyoung PARK
  • Method for preparing a polishing slurry having high dispersion stability
    Publication number: 20060213126
    Abstract: The present invention relates to an improved method for preparing a polishing slurry, comprising dispersing polishing particles and an anionic polymeric acid in water and then adding to the resulting dispersion an alkaline material in an amount of 0.1 to 8 weight parts based on 100 weight parts of the polishing particles. The polishing slurry obtained by the inventive method exhibits good dispersion stability and non-Prestonian polishing performance, which can be beneficially employed in chemical mechanical polishing of various precision electronic devices.
    Type: Application
    Filed: March 24, 2006
    Publication date: September 28, 2006
    Inventors: Yun Cho, In Lee, Hoon Jeon, Duk Hong, Taiyoung Kim, Sangick Lee, Eunkyoung Park