Patents by Inventor Taizou Kawada

Taizou Kawada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patterning method, lithography apparatus, and article manufacturing method
    Patent number: 10466602
    Abstract: A lithography apparatus detects a plurality of first substrate-side marks arranged with respect to a part of shot regions on which patterning is to be performed by using the first original in the lithography apparatus and detects a plurality of second substrate-side marks arranged with respect to other shot regions different from the part of the shot regions on which patterning is to be performed by using the second original different from the first original in another lithography apparatus. The lithography apparatus outputs information on detection results of the plurality of second substrate-side marks to be available in the other lithography apparatus. Then, based on detection results of the plurality of first substrate-side marks, the lithography apparatus performs patterning while performing alignment with the first original with respect to the part of the shot regions.
    Type: Grant
    Filed: August 23, 2018
    Date of Patent: November 5, 2019
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Taichi Yoshioka, Yusuke Kurita, Tohru Suzuki, Moritaka Iwakoshi, Taizou Kawada, Hironori Okazumi, Shunsuke Karaki, Takayuki Hashimoto
  • PATTERNING METHOD, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
    Publication number: 20190072864
    Abstract: A lithography apparatus detects a plurality of first substrate-side marks arranged with respect to a part of shot regions on which patterning is to be performed by using the first original in the lithography apparatus and detects a plurality of second substrate-side marks arranged with respect to other shot regions different from the part of the shot regions on which patterning is to be performed by using the second original different from the first original in another lithography apparatus. The lithography apparatus outputs information on detection results of the plurality of second substrate-side marks to be available in the other lithography apparatus. Then, based on detection results of the plurality of first substrate-side marks, the lithography apparatus performs patterning while performing alignment with the first original with respect to the part of the shot regions.
    Type: Application
    Filed: August 23, 2018
    Publication date: March 7, 2019
    Inventors: Taichi Yoshioka, Yusuke Kurita, Tohru Suzuki, Moritaka Iwakoshi, Taizou Kawada, Hironori Okazumi, Shunsuke Karaki, Takayuki Hashimoto