Patents by Inventor Tak Gyum Kim

Tak Gyum Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8111389
    Abstract: Disclosed herein is a method of inspecting defects in a circuit pattern of a substrate. At least one laser beam radiation unit for radiating a laser beam onto an inspection target circuit pattern of a substrate in a non-contact manner is prepared. A probe beam radiation unit for radiating a probe beam onto a connection circuit pattern to be electrically connected to the inspection target circuit pattern in a non-contact manner is prepared. The laser beam is radiated onto the inspection target circuit pattern using the laser beam radiation unit. The probe beam is radiated onto the connection circuit pattern using the probe beam radiation unit, thus measuring information about whether the probe beam is diffracted, and a diffraction angle. Accordingly, the method can solve problems such as erroneous measurements caused by contact pressure and can reduce the time required for measurements.
    Type: Grant
    Filed: March 4, 2010
    Date of Patent: February 7, 2012
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Seung Seoup Lee, Tak Gyum Kim, Jin Won Park
  • Patent number: 8098382
    Abstract: Disclosed are a beam scanner and a surface measurement apparatus. The beam scanner includes a spinning mirror having top and bottom reflective surfaces and a plurality of side reflective surfaces between the top and bottom reflective surfaces, and rotating about a rotary shaft penetrating the top and bottom reflective surfaces to scan beams, falling onto the side reflective surface, in one direction, a first light source emitting first beams to the side reflective surface, a second light source emitting second beams to at least one of the top and bottom reflective surfaces, and a detector receiving beams reflected by the spinning mirror, among the second beams. The beam scanner and the surface measurement apparatus can achieve high-speed, high resolution surface measurement since errors caused by the movement of the spinning mirror for beam scanning are minimized.
    Type: Grant
    Filed: November 5, 2009
    Date of Patent: January 17, 2012
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Tak Gyum Kim, Bae Kyun Kim
  • Publication number: 20110247186
    Abstract: A method of manufacturing a multilayer ceramic capacitor includes forming a base dielectric layer, forming a unit ceramic capacitor by alternately depositing internal dielectric layers and internal electrode layers on a top surface of the base dielectric layer, and stacking another unit ceramic capacitor on the unit ceramic capacitor, wherein the number of unit ceramic capacitors being stacked is two or more.
    Type: Application
    Filed: December 30, 2010
    Publication date: October 13, 2011
    Applicant: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Sang Yong Yu, Jin Won Park, Tak Gyum Kim
  • Patent number: 7991037
    Abstract: There is provided a multi-beam laser apparatus including: a laser beam source generating a beam; an incident lens disposed on a path of the beam; a beam splitter splitting the beam incident on the incident lens into a plurality of beamlets; and a beam path adjustor disposed on each of paths of the split beamlets to change the respective paths of the split beamlets. The multi-beam laser apparatus easily produces a plurality of beamlets and adjusts paths of the beamlets obtained by a prism to improve machinability quality and uniformity.
    Type: Grant
    Filed: July 9, 2008
    Date of Patent: August 2, 2011
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Chang Yun Lee, Bae Kyun Kim, Sang Su Hong, Tak Gyum Kim
  • Publication number: 20110116084
    Abstract: Disclosed herein is a method of inspecting defects in a circuit pattern of a substrate. At least one laser beam radiation unit for radiating a laser beam onto an inspection target circuit pattern of a substrate in a non-contact manner is prepared. A probe beam radiation unit for radiating a probe beam onto a connection circuit pattern to be electrically connected to the inspection target circuit pattern in a non-contact manner is prepared. The laser beam is radiated onto the inspection target circuit pattern using the laser beam radiation unit. The probe beam is radiated onto the connection circuit pattern using the probe beam radiation unit, thus measuring information about whether the probe beam is diffracted, and a diffraction angle. Accordingly, the method can solve problems such as erroneous measurements caused by contact pressure and can reduce the time required for measurements.
    Type: Application
    Filed: March 4, 2010
    Publication date: May 19, 2011
    Inventors: Seung Seoup LEE, Tak Gyum KIM, Jin Won PARK
  • Patent number: 7921674
    Abstract: There is provided a method of manufacturing an optical waveguide, the method including: allowing a beam to be incident in an optical waveguide direction of an optical waveguide material; generating an optical soliton in the optical waveguide material by adjusting intensity of the incident beam according to the optical waveguide material; allowing the incident beam to be re-incident at an intensity higher than an intensity of the incident beam after checking generation of the optical soliton in the optical waveguide material; and increasing a refractive index of an optical soliton-generating area of the optical waveguide material by the re-incident beam to thereby form an optical waveguide.
    Type: Grant
    Filed: April 3, 2008
    Date of Patent: April 12, 2011
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Hong Ki Kim, Bae Kyun Kim, June Sik Park, Dong Hoon Kang, Sang Su Hong, Chang Yun Lee, Tak Gyum Kim
  • Publication number: 20100201974
    Abstract: There are provided a surface measurement apparatus and a surface measurement method. A surface measurement apparatus according to an aspect of the invention may include: a stage receiving a target object and causing linear and rotational movements of the target object; a light source irradiating a beam onto the target object and rotating relative to the stage; and a reflected-beam detection unit detecting a beam reflected from the target object. According to an aspect of the invention, a surface measurement apparatus and a surface measurement method can maximize detection performance by detecting foreign bodies present on a surface regardless of optical axes of the beams used for detection.
    Type: Application
    Filed: November 5, 2009
    Publication date: August 12, 2010
    Inventors: Tak Gyum KIM, Bae Kyun Kim
  • Publication number: 20100201993
    Abstract: Disclosed are a beam scanner and a surface measurement apparatus. The beam scanner includes a spinning mirror having top and bottom reflective surfaces and a plurality of side reflective surfaces between the top and bottom reflective surfaces, and rotating about a rotary shaft penetrating the top and bottom reflective surfaces to scan beams, falling onto the side reflective surface, in one direction, a first light source emitting first beams to the side reflective surface, a second light source emitting second beams to at least one of the top and bottom reflective surfaces, and a detector receiving beams reflected by the spinning mirror, among the second beams. The beam scanner and the surface measurement apparatus can achieve high-speed, high resolution surface measurement since errors caused by the movement of the spinning mirror for beam scanning are minimized.
    Type: Application
    Filed: November 5, 2009
    Publication date: August 12, 2010
    Inventors: Tak Gyum KIM, Bae Kyun Kim
  • Publication number: 20090091737
    Abstract: A laser measuring device for precisely measuring a short distance is obtained by adding a relatively simple structure to a TOF laser measuring device that is simple and easily handled. The laser measuring device includes a light emitter, a light receiver and an optical length extender, which increases an optical path of emitted light or incident light.
    Type: Application
    Filed: August 22, 2008
    Publication date: April 9, 2009
    Inventors: Hong Ki KIM, Bae Kyun Kim, June Sik Park, Dong Hoon Kang, Sang Su Hong, Chang Yun Lee, Tak Gyum Kim
  • Publication number: 20090016400
    Abstract: There is provided a multi-beam laser apparatus including: a laser beam source generating a beam; an incident lens disposed on a path of the beam; a beam splitter splitting the beam incident on the incident lens into a plurality of beamlets; and a beam path adjustor disposed on each of paths of the split beamlets to change the respective paths of the split beamlets. The multi-beam laser apparatus easily produces a plurality of beamlets and adjusts paths of the beamlets obtained by a prism to improve machinability quality and uniformity.
    Type: Application
    Filed: July 9, 2008
    Publication date: January 15, 2009
    Inventors: Chang Yun Lee, Bae Kyun Kim, Sang Su Hong, Tak Gyum Kim
  • Publication number: 20080304136
    Abstract: There is provided an optical parametric oscillator capable of converting a wavelength in a broader range and generating an output beam with high efficiency. The optical parametric oscillator includes: a non-linear optical material optical parametrically converting a beam pumped from a laser; and input and output optical devices opposing each other, the input and output optical devices guiding the optical parametrically-converted beam to the non-linear optical material to oscillate, wherein the input optical device includes an input optical mirror guiding the pumping beam into the oscillator, and the output optical device includes a plurality of output optical mirrors each guiding the optical parametrically-converted beam outside the oscillator, the output optical mirrors having reflectivities different from one another with respect to a wavelength of the optical parametrically-converted beam.
    Type: Application
    Filed: June 6, 2008
    Publication date: December 11, 2008
    Inventors: Hong Ki Kim, Bae Kyun Kim, June Sik Park, Dong Hoon Kang, Sang Su Hong, Kum Young Ji, Chang Yun Lee, Tak Gyum Kim
  • Publication number: 20080259973
    Abstract: a wavelength converted laser apparatus includes a laser oscillator emitting an excitation laser beam having a first wavelength, a harmonic wave generator converting the excitation laser beam into a beam having a second wavelength lower than the first wavelength and an optical parametric oscillator converting and outputting the beam having the second wavelength into a beam having a continuously selectable specific wavelength. The optical parametric oscillator has an OPO crystal, a SHG crystal disposed at an output terminal of the optical parametric oscillator crystal to generate a second harmonic beam and a pair of high reflectivity mirrors for amplifying the beam outputted from the optical parametric oscillator.
    Type: Application
    Filed: April 15, 2008
    Publication date: October 23, 2008
    Inventors: Hong Ki Kim, Bae Kyun Kim, June Sik Park, Dong Hoon Kang, Sang Su Hong, Chang Yun Lee, Tak Gyum Kim