Abstract: To provide a highly productive, compact, and inexpensive film deposition apparatus while ensuring the stability of the film deposition quality, the apparatus includes a rotating body configured to be rotatable and provided with a holding unit that holds an object to be transferred in an attachable and detachable manner, the holding unit being provided along an outer peripheral portion of the rotating body; and a transfer mechanism having a gripping mechanism capable of gripping and releasing the object, the transfer mechanism transferring the object held by a predetermined device to the holding unit of the rotating body and transferring another object held by the rotating body to the predetermined device.

Abstract: The present invention discloses a film formation device. The film formation device includes a vacuum chamber, an evacuation mechanism communicating with an interior of the vacuum chamber, a substrate holding means capable of holding a plurality of substrates, and a film formation area located in the interior of the vacuum chamber. The film formation area allows sputter ions to be emitted from a target by sputtering and arrive at the substrates. The film formation device further includes an isolation means located in the vacuum chamber. The isolation means isolates the film formation area from other areas in the vacuum chamber. The isolation means is arranged such that the film formation area communicates with an exterior of the film formation area.

Abstract: Provided is a thin film forming apparatus for reducing operation time and cost by forming a film only on a specific portion on substrates. A substrate holding mechanism provided in the apparatus includes: substrate holding members holding substrates in a manner that a part of a non-film forming portion of a substrate overlaps the other substrate and a film forming portion is exposed, a support member supporting the substrate holding members, and a rotation member which rotates the support member. The substrate holding members include: holding surfaces holding the substrates and disposed between a film forming source and the substrates, step portions formed between the holding surfaces in a manner that ends of the substrates respectively contact with the step portions, and opening portions formed on the holding surfaces of the portion corresponding to the film forming portion when the ends of the substrates contact with the step portions.

Abstract: Provided is a thin film forming apparatus for reducing operation time and cost by forming a film only on a specific portion on substrates. A substrate holding mechanism provided in the apparatus includes: substrate holding members holding substrates in a manner that a part of a non-film forming portion of a substrate overlaps the other substrate and a film forming portion is exposed, a support member supporting the substrate holding members, and a rotation member which rotates the support member. The substrate holding members include: holding surfaces holding the substrates and disposed between a film forming source and the substrates, step portions formed between the holding surfaces in a manner that ends of the substrates respectively contact with the step portions, and opening portions formed on the holding surfaces of the portion corresponding to the film forming portion when the ends of the substrates contact with the step portions.

Abstract: A guest-host liquid crystal display device which employs a pleochroic liquid crystal mixture having helical molecular ordering. To prevent the occurrence of a light-scattering turbid texture the helical molecular ordering is converted into a miss-matching state of an increased strain energy by a proper combination of surface alignment treatments applied to the facing surfaces of a pair of transparent plates that sandwich the liquid crystal layer.