Abstract: An exposure apparatus which forms a pattern on an object. The apparatus includes an exposure head structure in which a plurality of elemental exposure units are arrayed, each elemental exposure unit including (i) at least one light source for emitting exposure light and (ii) an optical element which forms an image of the at least one light source on the object, for exposing the object. Positions of the images of the at least one light source in a direction perpendicular to a surface of the object include plural positions different from each other. A sensor detects a position of the surface of the object and produces a detection result. A controller receives the detection result and controls the exposure head structure such that a pattern is formed on the object by the exposure is selected to expose the object based on the detection result by the sensor.

Abstract: An exposure method for exposing a pattern of a reticle which has a patterned area that has the pattern, and a light shielding area provided around the patterned area, said exposure method includes the step of illuminating the reticle via an illumination optical system that includes a field stop, wherein a position corresponding to an edge of an aperture in the field stop is closer to the patterned area than a center of a width of the light shielding area on the reticle, the aperture defining a region for illuminating the reticle.

Abstract: An exposure method for exposing a pattern of a reticle which has a patterned area that has the pattern, and a light shielding area provided around the patterned area, said exposure method includes the step of illuminating the reticle via an illumination optical system that includes a field stop, wherein a position corresponding to an edge of an aperture in the field stop is closer to the patterned area than a center of a width of the light shielding area on the reticle, the aperture defining a region for illuminating the reticle.

Abstract: An exposure apparatus which forms a pattern on an object includes an exposure head structure in which a plurality of elemental exposure units each including at least one light source and an optical element which forms an image of the light source on the object are arrayed, a sensor which detects the surface position of the object, and a controller which controls exposure by the exposure head structure based on the detection result by the sensor. The controller forms a pattern on the object while selectively operating one of the plurality of elemental exposure units, which satisfies a predetermined condition.

Abstract: There is provided an illumination apparatus including an optical integrator including multiple optical systems for receiving light from a light source, and for producing multiple beams for illuminating a plane of mask or reticle on which a pattern is draw, a position of an incidence plane of the optical integrator and a position of the plane to be illuminated being arranged optically conjugate with each other, and a device for forming an optical characteristic distribution of light at the incidence plane, the light entering at least part of the multiple optical systems, whereby different areas on the plane of plane to be illuminated can be illuminated under different illumination conditions.

Abstract: There is provided an illumination apparatus including an optical integrator including multiple optical systems for receiving light from a light source, and for producing multiple beams for illuminating a plane of mask or reticle on which a pattern is draw, a position of an incidence plane of the optical integrator and a position of the plane to be illuminated being arranged optically conjugate with each other, and a device for forming an optical characteristic distribution of light at the incidence plane, the light entering at least part of the multiple optical systems, whereby different areas on the plane of plane to be illuminated can be illuminated under different illumination conditions.