Patents by Inventor Takafumi Iwata

Takafumi Iwata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9165818
    Abstract: [Problem] To provide a method capable of forming an insulating film having homogeneous and high bulk density and less suffering defects. [Means for solving] A substrate surface is coated with a silicon dioxide dispersion containing silicon dioxide fine particles, a polymer, a surfactant and a dispersion medium; and then further coated with a polysilazane composition; and thereafter heated to form an insulating film.
    Type: Grant
    Filed: February 17, 2012
    Date of Patent: October 20, 2015
    Assignee: MERCK PATENT GMBH
    Inventors: Yusuke Takano, Tatsuro Nagahara, Shinde Ninad, Takafumi Iwata
  • Publication number: 20130323904
    Abstract: [Problem] To provide a method capable of forming an insulating film having homogeneous and high bulk density and less suffering defects. [Means for solving] A substrate surface is coated with a silicon dioxide dispersion containing silicon dioxide fine particles, a polymer, a surfactant and a dispersion medium; and then further coated with a polysilazane composition; and thereafter heated to form an insulating film.
    Type: Application
    Filed: February 17, 2012
    Publication date: December 5, 2013
    Applicant: AZ ELECTRONIC MATERIALS USA CORP.
    Inventors: Yusuke Takano, Tatsuro Nagahara, Shinde Ninad, Takafumi Iwata
  • Patent number: 8563673
    Abstract: A propylene-based resin molded article satisfying the following requirements (1) through (4): Requirement (1) Lc/La?1.50 Requirement (2) Lc?10.0 Requirement (3) F1?0.07 Requirement (4) F2?0.06 wherein in Requirements (1) through (4), La denotes the distance (unit: nm) between crystalline lamellae calculated from the long-period distance calculated from a small-angle X-ray scattering profile and the degree of crystallization calculated from the amount of heat of fusion measured by differential scanning calorimetry, Lc denotes the thickness (unit: nm) of a crystalline lamella calculated from the distance between crystalline lamellae and the long-period distance, F1 denotes the degree of orientation calculated from the infrared dichroic ratio measured at a wave number of 997 cm?1, and F2 denotes the degree of orientation calculated from the infrared dichroic ratio measured at a wave number of 973 cm?1.
    Type: Grant
    Filed: May 29, 2007
    Date of Patent: October 22, 2013
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Takafumi Iwata, Hideki Oshima, Satoru Moritomi
  • Publication number: 20110020625
    Abstract: A propylene-based resin molded article satisfying the following requirements (1) through (4): Requirement (1) Lc/La ?1.50 Requirement (2) Lc?10.0 Requirement (3) F1?0.07 Requirement (4) F2?0.06 wherein in Requirements (1) through (4), La denotes the distance (unit: nm) between crystalline lamellae calculated from the long-period distance calculated from a small-angle X-ray scattering profile and the degree of crystallization calculated from the amount of heat of fusion measured by differential scanning calorimetry, Le denotes the thickness (unit: nm) of a crystalline lamella calculated from the distance between crystalline lamellae and the long-period distance, Fl denotes the degree of orientation calculated from the infrared dichroic ratio measured at a wave number of 997 cm?1, and F2 denotes the degree of orientation calculated from the infrared dichroic ratio measured at a wave number of 973 cm?1.
    Type: Application
    Filed: May 29, 2007
    Publication date: January 27, 2011
    Inventors: Takafumi Iwata, Hideki Oshima, Satoru Moritomi