Patents by Inventor Takafumi Miwa

Takafumi Miwa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240346818
    Abstract: The purpose of the present invention is to provide an inspection device that can determine the reliability of an image feature value in a target region of an observation image of a sample. This inspection device extracts a first feature value from a target region including an inspection target in an observation image of a sample, extracts a second feature value from a reference region other than the target region in the observation image, and compares the first feature value and the second feature value, thereby calculating the reliability of the first feature value (see FIG. 1).
    Type: Application
    Filed: September 21, 2022
    Publication date: October 17, 2024
    Inventors: Takafumi MIWA, Sayaka KURATA, Shinichi MATSUBARA, Yuta IMAI
  • Patent number: 12106930
    Abstract: Provided is a charged particle beam device capable of reducing scattering of a foreign substance collected by a foreign substance collecting unit. The charged particle beam device includes: a sample chamber in which a sample is to be disposed; and a charged particle beam source configured to irradiate the sample with a charged particle beam. The charged particle beam device further includes: a foreign substance attachment/detachment unit from or to which a foreign substance is to detach or attach; and a foreign substance collecting unit provided in the sample chamber and configured to collect a foreign substance dropped from the foreign substance attachment/detachment unit. An opening through which the foreign substance passes is provided in an upper end portion of the foreign substance collecting unit. An area of the opening is smaller than a horizontal cross-sectional area of an internal space of the foreign substance collecting unit.
    Type: Grant
    Filed: December 23, 2019
    Date of Patent: October 1, 2024
    Assignee: Hitachi High-Tech Corporation
    Inventors: Takafumi Miwa, Go Miya, Kazuma Tanii, Seiichiro Kanno
  • Patent number: 11749494
    Abstract: A computing unit generates a to-be-used-in-computation netlist on the basis of a to-be-used-in-calculation device model corresponding to a correction sample, estimates a first application result, on the basis of the to-be-used-in-computation netlist and an optical condition, when a charged particle beam is applied to the correction sample under the optical condition, compares the first application result and a second application result based on a detection signal when the charged particle beam is applied to the correction sample under the optical condition, and corrects the optical condition when the first application result and the second application result differ from each other.
    Type: Grant
    Filed: December 8, 2021
    Date of Patent: September 5, 2023
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Takafumi Miwa, Yohei Nakamura, Natsuki Tsuno, Heita Kimizuka, Muneyuki Fukuda
  • Patent number: 11735394
    Abstract: Provided is a charged particle beam apparatus capable of analyzing foreign matters generated when a sample is transported or observed. The charged particle beam apparatus includes a sample stage on which a measurement sample is provided, a charged particle beam source that irradiates the measurement sample with a charged particle beam, and a detector that detects charged particles emitted by irradiation with the charged particle beam, and includes a foreign matter observation sample held on the sample stage together with the measurement sample and a foreign matter observation unit that causes a foreign matter to be observed on the foreign matter observation sample.
    Type: Grant
    Filed: November 30, 2018
    Date of Patent: August 22, 2023
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Takafumi Miwa, Seiichiro Kanno, Go Miya
  • Patent number: 11646172
    Abstract: A charged particle beam apparatus includes a database that stores a to-be-used-in-calculation device model for use in estimation of a circuit of a sample and an optical condition under which a charged particle beam is applied to the sample, a charged particle beam optical system that controls the beam applied to the sample under the optical condition, a detector that detects secondary electrons emitted from the sample excited by the application of the beam and outputs a detection signal based on the secondary electrons, and a computing unit that generates a to-be-used-in-computation netlist based on the to-be-used-in-calculation device model, estimates a first application result when the beam is applied to the sample based on the to-be-used-in-computation netlist and the optical condition, and compares the first application result with a second application result when the beam is applied to the sample based on the optical condition.
    Type: Grant
    Filed: December 8, 2021
    Date of Patent: May 9, 2023
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Takafumi Miwa, Yohei Nakamura, Natsuki Tsuno, Heita Kimizuka, Muneyuki Fukuda
  • Publication number: 20230005700
    Abstract: Provided is a charged particle beam device capable of reducing scattering of a foreign substance collected by a foreign substance collecting unit. The charged particle beam device includes: a sample chamber in which a sample is to be disposed; and a charged particle beam source configured to irradiate the sample with a charged particle beam. The charged particle beam device further includes: a foreign substance attachment/detachment unit from or to which a foreign substance is to detach or attach; and a foreign substance collecting unit provided in the sample chamber and configured to collect a foreign substance dropped from the foreign substance attachment/detachment unit. An opening through which the foreign substance passes is provided in an upper end portion of the foreign substance collecting unit. An area of the opening is smaller than a horizontal cross-sectional area of an internal space of the foreign substance collecting unit.
    Type: Application
    Filed: December 23, 2019
    Publication date: January 5, 2023
    Inventors: Takafumi MIWA, Go MIYA, Kazuma TANII, Seiichiro KANNO
  • Patent number: 11398367
    Abstract: A charged particle beam apparatus includes a database that stores a to-be-used-in-calculation device model for use in estimation of a circuit of a sample and an optical condition under which a charged particle beam is applied to the sample, a charged particle beam optical system that controls the beam applied to the sample under the optical condition, a detector that detects secondary electrons emitted from the sample excited by the application of the beam and outputs a detection signal based on the secondary electrons, and a computing unit that generates a to-be-used-in-computation netlist based on the to-be-used-in-calculation device model, estimates a first application result when the beam is applied to the sample based on the to-be-used-in-computation netlist and the optical condition, and compares the first application result with a second application result when the beam is applied to the sample based on the optical condition.
    Type: Grant
    Filed: July 14, 2020
    Date of Patent: July 26, 2022
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Takafumi Miwa, Yohei Nakamura, Natsuki Tsuno, Heita Kimizuka, Muneyuki Fukuda
  • Patent number: 11398366
    Abstract: A computing unit generates a to-be-used-in-computation netlist on the basis of a to-be-used-in-calculation device model corresponding to a correction sample, estimates a first application result, on the basis of the to-be-used-in-computation netlist and an optical condition, when a charged particle beam is applied to the correction sample under the optical condition, compares the first application result and a second application result based on a detection signal when the charged particle beam is applied to the correction sample under the optical condition, and corrects the optical condition when the first application result and the second application result differ from each other.
    Type: Grant
    Filed: July 13, 2020
    Date of Patent: July 26, 2022
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Takafumi Miwa, Yohei Nakamura, Natsuki Tsuno, Heita Kimizuka, Muneyuki Fukuda
  • Patent number: 11380518
    Abstract: A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.
    Type: Grant
    Filed: August 9, 2019
    Date of Patent: July 5, 2022
    Assignee: Hitachi, Ltd.
    Inventors: Takafumi Miwa, Hirokazu Tamaki, Momoyo Enyama, Makoto Sakakibara, Sayaka Kurata, Atsuko Shintani, Takashi Dobashi, Kotoko Urano, Akiko Kagatsume, Minseok Park, Yasuhiro Shirasaki, Thantip Krasienapibal
  • Patent number: 11335535
    Abstract: Provided is a charged particle beam apparatus capable of estimating an internal device structure of a sample. The charged particle beam apparatus includes an electron beam optical system, a detector, and a calculator. The electron beam optical system irradiates a plurality of irradiation points on a sample, which are different in position or time, with an electron beam. The detector detects electrons emitted from the sample in response to irradiation of the electron beam by the electron beam optical system. The calculator calculates a dependence relationship between the irradiation points based on the electrons detected by the detector at the plurality of irradiation points.
    Type: Grant
    Filed: July 6, 2020
    Date of Patent: May 17, 2022
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yohei Nakamura, Takafumi Miwa, Heita Kimizuka, Natsuki Tsuno, Muneyuki Fukuda
  • Publication number: 20220102108
    Abstract: A computing unit generates a to-be-used-in-computation netlist on the basis of a to-be-used-in-calculation device model corresponding to a correction sample, estimates a first application result, on the basis of the to-be-used-in-computation netlist and an optical condition, when a charged particle beam is applied to the correction sample under the optical condition, compares the first application result and a second application result based on a detection signal when the charged particle beam is applied to the correction sample under the optical condition, and corrects the optical condition when the first application result and the second application result differ from each other.
    Type: Application
    Filed: December 8, 2021
    Publication date: March 31, 2022
    Inventors: Takafumi Miwa, Yohei Nakamura, Natsuki Tsuno, Heita Kimizuka, Muneyuki Fukuda
  • Publication number: 20220102109
    Abstract: A charged particle beam apparatus includes a database that stores a to-be-used-in-calculation device model for use in estimation of a circuit of a sample and an optical condition under which a charged particle beam is applied to the sample, a charged particle beam optical system that controls the beam applied to the sample under the optical condition, a detector that detects secondary electrons emitted from the sample excited by the application of the beam and outputs a detection signal based on the secondary electrons, and a computing unit that generates a to-be-used-in-computation netlist based on the to-be-used-in-calculation device model, estimates a first application result when the beam is applied to the sample based on the to-be-used-in-computation netlist and the optical condition, and compares the first application result with a second application result when the beam is applied to the sample based on the optical condition.
    Type: Application
    Filed: December 8, 2021
    Publication date: March 31, 2022
    Inventors: Takafumi Miwa, Yohei Nakamura, Natsuki Tsuno, Heita Kimizuka, Muneyuki Fukuda
  • Publication number: 20220028650
    Abstract: Provided is a charged particle beam apparatus capable of analyzing foreign matters generated when a sample is transported or observed. The charged particle beam apparatus includes a sample stage on which a measurement sample is provided, a charged particle beam source that irradiates the measurement sample with a charged particle beam, and a detector that detects charged particles emitted by irradiation with the charged particle beam, and includes a foreign matter observation sample held on the sample stage together with the measurement sample and a foreign matter observation unit that causes a foreign matter to be observed on the foreign matter observation sample.
    Type: Application
    Filed: November 30, 2018
    Publication date: January 27, 2022
    Applicants: Hitachi High-Tech Corporation, Hitachi High-Tech Corporation
    Inventors: Takafumi Miwa, Seiichiro Kanno, Go Miya
  • Publication number: 20210407763
    Abstract: A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.
    Type: Application
    Filed: August 9, 2019
    Publication date: December 30, 2021
    Inventors: Takafumi MIWA, Hirokazu TAMAKI, Momoyo ENYAMA, Makoto SAKAKIBARA, Sayaka KURATA, Atsuko SHINTANI, Takashi DOBASHI, Kotoko URANO, Akiko KAGATSUME, Minseok PARK, Yasuhiro SHIRASAKI, Thantip KRASIENAPIBAL
  • Patent number: 11143606
    Abstract: To enable evaluation of a shape of a fine particle and a fine particle type, a substrate is set as a substrate on which an isolated fine particle to be measured and an isolated standard fine particle in the vicinity of the isolated fine particle to be measured are disposed, and a scanning electron microscope body including a detector configured to detect secondary charged particles obtained by scanning a surface of the substrate with an electron beam probe, and a computer that processes a detection signal and generates an image of the isolated fine particle to be measured and the isolated standard fine particle are provided. The computer corrects a shape of the isolated fine particle to be measured by using a measurement result of the isolated standard fine particle disposed in the vicinity of the isolated fine particle to be measured.
    Type: Grant
    Filed: February 1, 2018
    Date of Patent: October 12, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Tomihiro Hashizume, Masatoshi Yasutake, Tsunenori Nomaguchi, Takafumi Miwa
  • Patent number: 11043359
    Abstract: Provided are a charged particle beam apparatus and a charged particle beam inspection system capable of estimating electrical characteristics of a sample including capacitance characteristics. The charged particle beam apparatus estimates electrical characteristics of the sample using the correspondence data representing the correspondence between the node of the netlist and the coordinate on the sample and the pulsing condition when the sample is irradiated with the charged particle beam in a pulsed manner. The charged particle beam optical system irradiates a predetermined coordinate on the sample with a charged particle beam based on a pulsing condition, and the detector actually measures an emission amount of electrons.
    Type: Grant
    Filed: July 6, 2020
    Date of Patent: June 22, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Yohei Nakamura, Natsuki Tsuno, Heita Kimizuka, Takafumi Miwa, Muneyuki Fukuda, Junichi Tanaka
  • Patent number: 11011348
    Abstract: Provided is a scanning electron microscope. The scanning electron microscope is capable of removing a charge generated on a side wall of a deep hole or groove, and inspects and measures a bottom portion of the deep hole or groove with high accuracy.
    Type: Grant
    Filed: January 17, 2017
    Date of Patent: May 18, 2021
    Assignee: HITACHI HIGH-TECH CORPORATION
    Inventors: Daisuke Bizen, Natsuki Tsuno, Takafumi Miwa, Makoto Sakakibara, Toshiyuki Yokosuka, Hideyuki Kazumi
  • Publication number: 20210043412
    Abstract: A computing unit generates a to-be-used-in-computation netlist on the basis of a to-be-used-in-calculation device model corresponding to a correction sample, estimates a first application result, on the basis of the to-be-used-in-computation netlist and an optical condition, when a charged particle beam is applied to the correction sample under the optical condition, compares the first application result and a second application result based on a detection signal when the charged particle beam is applied to the correction sample under the optical condition, and corrects the optical condition when the first application result and the second application result differ from each other.
    Type: Application
    Filed: July 13, 2020
    Publication date: February 11, 2021
    Inventors: Takafumi Miwa, Yohei Nakamura, Natsuki Tsuno, Heita Kimizuka, Muneyuki Fukuda
  • Publication number: 20210043413
    Abstract: A charged particle beam apparatus includes a database that stores a to-be-used-in-calculation device model for use in estimation of a circuit of a sample and an optical condition under which a charged particle beam is applied to the sample, a charged particle beam optical system that controls the beam applied to the sample under the optical condition, a detector that detects secondary electrons emitted from the sample excited by the application of the beam and outputs a detection signal based on the secondary electrons, and a computing unit that generates a to-be-used-in-computation netlist based on the to-be-used-in-calculation device model, estimates a first application result when the beam is applied to the sample based on the to-be-used-in-computation netlist and the optical condition, and compares the first application result with a second application result when the beam is applied to the sample based on the optical condition.
    Type: Application
    Filed: July 14, 2020
    Publication date: February 11, 2021
    Inventors: Takafumi Miwa, Yohei Nakamura, Natsuki Tsuno, Heita Kimizuka, Muneyuki Fukuda
  • Publication number: 20210043419
    Abstract: Provided are a charged particle beam apparatus and a charged particle beam inspection system capable of estimating electrical characteristics of a sample including capacitance characteristics. The charged particle beam apparatus estimates electrical characteristics of the sample using the correspondence data representing the correspondence between the node of the netlist and the coordinate on the sample and the pulsing condition when the sample is irradiated with the charged particle beam in a pulsed manner. The charged particle beam optical system irradiates a predetermined coordinate on the sample with a charged particle beam based on a pulsing condition, and the detector actually measures an emission amount of electrons.
    Type: Application
    Filed: July 6, 2020
    Publication date: February 11, 2021
    Inventors: Yohei Nakamura, Natsuki Tsuno, Heita Kimizuka, Takafumi Miwa, Muneyuki Fukuda, Junichi Tanaka