Patents by Inventor Takafumi Okamura

Takafumi Okamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11921939
    Abstract: This information processing system includes: a controller including an operation element to be displaced from an initial position by user's operation, a restoring force imparting section applying a restoring force for returning the displaced operation element to the initial position, a resistance section using a magnetorheological fluid whose viscosity changes with a magnetic-field intensity and which becomes resistance when the operation element is displaced from/to the initial position, and a magnetic field generation section which provides the magnetic field to the magnetorheological fluid; and a circuit capable of controlling the magnetic field generation section. The circuit controls a magnetic-field intensity so that the viscosity of the magnetorheological fluid periodically changes at least between a first viscosity state and a second viscosity state in which the viscosity is lower than in the first viscosity state so that the operation element returns to the initial position by the restoring force.
    Type: Grant
    Filed: May 11, 2023
    Date of Patent: March 5, 2024
    Assignee: Nintendo Co., Ltd.
    Inventors: Takafumi Aoki, Takanori Okamura
  • Patent number: 9924596
    Abstract: The structural body related to the present disclosure includes a substrate having insulation properties arranged with a first surface and a second surface opposing the first surface, a through hole passing through the first surface and the second surface of the substrate, and a through electrode including a conductive material arranged within the through hole, the through electrode conducting the first surface and the second surface of the substrate and including a projection part exposed from the second surface to the outside of the through hole, wherein at least a part of the through hole is gradually increasing in size approaching the second surface in a thickness direction of the substrate, and forming a depression part keeping a gap between the through hole and the through electrode.
    Type: Grant
    Filed: August 15, 2017
    Date of Patent: March 20, 2018
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Masaaki Asano, Hiroshi Mawatari, Takafumi Okamura
  • Publication number: 20170347451
    Abstract: The structural body related to the present disclosure includes a substrate having insulation properties arranged with a first surface and a second surface opposing the first surface, a through hole passing through the first surface and the second surface of the substrate, and a through electrode including a conductive material arranged within the through hole, the through electrode conducting the first surface and the second surface of the substrate and including a projection part exposed from the second surface to the outside of the through hole, wherein at least a part of the through hole is gradually increasing in size approaching the second surface in a thickness direction of the substrate, and forming a depression part keeping a gap between the through hole and the through electrode.
    Type: Application
    Filed: August 15, 2017
    Publication date: November 30, 2017
    Inventors: Masaaki Asano, Hiroshi Mawatari, Takafumi Okamura
  • Patent number: 9769927
    Abstract: The structural body related to the present disclosure includes a substrate having insulation properties arranged with a first surface and a second surface opposing the first surface, a through hole passing through the first surface and the second surface of the substrate, and a through electrode including a conductive material arranged within the through hole, the through electrode conducting the first surface and the second surface of the substrate and including a projection part exposed from the second surface to the outside of the through hole, wherein at least a part of the through hole is gradually increasing in size approaching the second surface in a thickness direction of the substrate, and forming a depression part keeping a gap between the through hole and the through electrode.
    Type: Grant
    Filed: March 8, 2017
    Date of Patent: September 19, 2017
    Assignee: DAI NIPPON PRINTING CO., LTD.
    Inventors: Masaaki Asano, Hiroshi Mawatari, Takafumi Okamura
  • Publication number: 20170181280
    Abstract: The structural body related to the present disclosure includes a substrate having insulation properties arranged with a first surface and a second surface opposing the first surface, a through hole passing through the first surface and the second surface of the substrate, and a through electrode including a conductive material arranged within the through hole, the through electrode conducting the first surface and the second surface of the substrate and including a projection part exposed from the second surface to the outside of the through hole, wherein at least a part of the through hole is gradually increasing in size approaching the second surface in a thickness direction of the substrate, and forming a depression part keeping a gap between the through hole and the through electrode.
    Type: Application
    Filed: March 8, 2017
    Publication date: June 22, 2017
    Inventors: Masaaki ASANO, Hiroshi MAWATARI, Takafumi OKAMURA
  • Patent number: 6764792
    Abstract: The invention relates to a halftone phase shift photomask which is controlled with precision in terms of its transmittance at a wavelength applied to inspection, and measuring equipment, so that its quality can easily be assured even when its phase difference at an exposure wavelength is controlled at 180° C. with precision and its transmittance is set at 1 to 20% as desired at that wavelength. The halftone phase shift photomask (107) comprises on a transparent substrate (101) and a halftone phase shift film containing at least tantalum, oxygen, carbon and nitrogen, and has a multilayer structure comprising at least two or more different layers (102) and (103).
    Type: Grant
    Filed: April 27, 2001
    Date of Patent: July 20, 2004
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Junji Fujikawa, Yoshinori Kinase, Takafumi Okamura, Hiroshi Mohri, Toshifumi Yokoyama, Haruo Kokubo
  • Patent number: 6458496
    Abstract: A blank for a halftone phase shift photomask in the present invention comprises a transparent substrate and a halftone phase shift film provided thereon, and said halftone phase shift film has a multilayer construction in which at least a first layer capable of being etched with a chlorinated gas and a second layer capable of being etched with a fluorinated gas are disposed in this order from the side near said transparent substrate. A film made of tantalum silicides is suitable to use as the second layer of the halftone phase shift film.
    Type: Grant
    Filed: December 14, 2000
    Date of Patent: October 1, 2002
    Assignee: Dai Nippon Printing Co., Ltd.
    Inventors: Toshiaki Motonaga, Toshifumi Yokoyama, Takafumi Okamura, Yoshinori Kinase, Hiroshi Mohri, Junji Fujikawa, Hiro-o Nakagawa, Shigeki Sumida, Satoshi Yusa, Masashi Ohtsuki
  • Publication number: 20010005564
    Abstract: A blank for a halftone phase shift photomask in the present invention comprises a transparent substrate and a halftone phase shift film provided thereon, and said halftone phase shift film has a multilayer construction in which at least a first layer capable of being etched with a chlorinated gas and a second layer capable of being etched with a fluorinated gas are disposed in this order from the side near said transparent substrate. A film made of tantalum silicides is suitable to use as the second layer of the halftone phase shift film.
    Type: Application
    Filed: December 14, 2000
    Publication date: June 28, 2001
    Inventors: Toshiaki Motonaga, Toshifumi Yokoyama, Takafumi Okamura, Yoshinori Kinase, Hiroshi Mohri, Junji Fujikawa, Hiro-o Nakagawa, Shigeki Sumida, Satoshi Yusa, Masashi Ohtsuki