Patents by Inventor Takafumi Toshimitsu

Takafumi Toshimitsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma Resistant Processing Apparatus
    Publication number: 20110083806
    Abstract: There is provided a processing apparatus undergoing various treatments using plasma and protected from plasma so as not to be damaged. The processing apparatus is one using plasma and having a protective layer comprising a fluorine-containing elastomer on the whole or a part of a surface exposed to plasma in the processing apparatus.
    Type: Application
    Filed: October 14, 2010
    Publication date: April 14, 2011
    Applicants: Greene, Tweed of Delaware, Inc., Daikin Industries, Ltd.
    Inventors: Tsuyoshi Noguchi, Takafumi Toshimitsu, William Brock Alexander, Seiichi Hirano
  • Substrate processing system and substrate processing method
    Patent number: 6536964
    Abstract: In an FAB having a plurality of coating and developing processing apparatus, atmospheric pressure is measured by a barometer provided in the FAB, and a measured value is sent to each of the coating and developing processing apparatus via a host computer. In each coating and developing processing apparatus, based on the value, the rotation speed of a substrate in a resist solution coating unit is regulated only when the atmospheric pressure value exceeds a predetermined allowable value which is preset according to the type of chemical. As a result, without causing the complication of the apparatus, plant and equipment investment can be held to minimum, and the coating film thickness of a substrate can be maintained at a predetermined thickness.
    Type: Grant
    Filed: August 31, 2000
    Date of Patent: March 25, 2003
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Kitano, Masami Akimoto, Takafumi Toshimitsu