Patents by Inventor Takahiko Kurosawa

Takahiko Kurosawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20160326410
    Abstract: A wire sealer having sufficient sealing properties and satisfactory workability of sealing treatment is provided. The wire sealer is radiation-curable, and contains the following components (A) to (C): (A) urethane (meth)acrylate; (B) a compound having one ethylenically unsaturated group and not having an anion dissociative group; and (C) a radiation polymerization initiator, wherein a cured film obtained from the radiation-curable wire sealer shows an oil absorptivity of 7% by mass or more, a water absorptivity of 10% by mass or less, and a Young's modulus of 2 to 500 MPa.
    Type: Application
    Filed: December 12, 2014
    Publication date: November 10, 2016
    Applicant: JSR CORPORATION
    Inventors: Hiroshi YAMAGUCHI, Kazuyuki KONDOU, Takahiko KUROSAWA, Hirokazu IMAI, Zen KOMIYA
  • Patent number: 8980971
    Abstract: A photocurable resin composition for three-dimensional photofabrication operations, including stereolithography, comprising (A) a cationically polymerizable compound having two or more bisphenol structures and one or more hydroxyl groups, (B) a cationically polymerizable compound other than the component (A), (C) a cationic photoinitiator, (D) a radically polymerizable compound, (E) a radical photoinitiator, and (F) multilayer polymer particles having a core and a shell layer, the shell layer containing functional group-modified rubber polymer particles having at least one reactive functional group.
    Type: Grant
    Filed: May 21, 2013
    Date of Patent: March 17, 2015
    Assignee: DSM IP Assets B.V.
    Inventors: Masahiro Ueda, Katsuyuki Takase, Takahiko Kurosawa
  • Publication number: 20140241687
    Abstract: A radiation curable resin composition, containing (A) urethane oligomer containing the reactants of an aliphatic polyester or polyether diol and a diisocyanate and a monohydric alcohol, or urethane oligomer obtained by reacting the reactants of an aliphatic polyester or polyether diol and a diisocyanate with a monohydric alcohol and then reacting a hydroxyl group-containing (meth)acrylate, and (B) monofunctional acrylic monomer, and the contained quantity of (C) polyfunctional acrylic monomer is 2 mass % or less is described and claimed.
    Type: Application
    Filed: May 7, 2014
    Publication date: August 28, 2014
    Applicant: DSM IP ASSETS B.V.
    Inventors: Hirokazu IMAI, Yuutoku YAMASHITA, Hiroshi YAMAGUCHI, Takahiko KUROSAWA
  • Publication number: 20130316154
    Abstract: A photocurable resin composition for three-dimensional photofabrication operations, including stereolithography, comprising (A) a cationically polymerizable compound having two or more bisphenol structures and one or more hydroxyl groups, (B) a cationically polymerizable compound other than the component (A), (C) a cationic photoinitiator, (D) a radically polymerizable compound, (E) a radical photoinitiator, and (F) multilayer polymer particles having a core and a shell layer, the shell layer containing functional group-modified rubber polymer particles having at least one reactive functional group.
    Type: Application
    Filed: May 21, 2013
    Publication date: November 28, 2013
    Applicants: DSM IP Assets B.V., Japan Fine Coatings Co., Ltd., JSR Corporation
    Inventors: Masahiro UEDA, Katsuyuki TAKASE, Takahiko KUROSAWA
  • Publication number: 20130199818
    Abstract: The invention relates to a radiation curable resin composition for forming a coating layer for electrical wire; wherein the electrical wire is destined for use as automotive electrical wire. In addition, this invention relates to a radiation curable resin composition for forming a coating layer for telephone cable and electrical wire for connecting between electronic devices and inside electronic devices. The resin composition includes the following: (A) a urethane (meth)acrylate having a hard segment derived from an aromatic polyol and a soft segment derived from an aliphatic polyol in a single molecule; (B) a compound with a cyclic structure and one ethylenic unsaturated group; and (C) a radiation polymerization initiator.
    Type: Application
    Filed: July 21, 2011
    Publication date: August 8, 2013
    Applicant: DSM IP ASSETS B.V.
    Inventors: Hirofumi Uchida, Hirokazu Imai, Yuutoku Yamashita, Takahiko Kurosawa
  • Patent number: 8404786
    Abstract: A process for producing a polymer includes mixing (A) a polysiloxane compound and (B) a polycarbosilane compound in the presence of a catalyst, water, and an organic solvent, and heating the mixture.
    Type: Grant
    Filed: March 4, 2010
    Date of Patent: March 26, 2013
    Assignee: JSR Corporation
    Inventors: Masahiro Akiyama, Takahiko Kurosawa, Hisashi Nakagawa, Atsushi Shiota
  • Publication number: 20120321270
    Abstract: A radiation curable resin composition, containing (A) urethane oligomer containing the reactants of an aliphatic polyester or polyether diol and a diisocyanate and a monohydric alcohol, or urethane oligomer obtained by reacting the reactants of an aliphatic polyester or polyether diol and a diisocyanate with a monohydric alcohol and then reacting a hydroxyl group-containing (meth)acrylate, and (B) monofunctional acrylic monomer, and the contained quantity of (C) polyfunctional acrylic monomer is 2 mass % or less is described and claimed.
    Type: Application
    Filed: December 22, 2010
    Publication date: December 20, 2012
    Inventors: Hirokazu Imai, Yuutoku Yamashita, Hiroshi Yamaguchi, Takahiko Kurosawa
  • Patent number: 8268403
    Abstract: A method of forming an organic silica film includes forming a coating including a silicon compound having an —Si—O—Si— structure and an —Si—CH2—Si— structure on a substrate, heating the coating, and curing the coating by applying ultraviolet radiation.
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: September 18, 2012
    Assignee: JSR Corporation
    Inventors: Masahiro Akiyama, Hisashi Nakagawa, Tatsuya Yamanaka, Atsushi Shiota, Takahiko Kurosawa
  • Publication number: 20120205135
    Abstract: A resin composition for wire coatings that has excellent adhesion with the center conductor as well as having excellent manufacturing efficiency for the coating layer and sufficient strength is described and claimed. This radiation curable resin composition for wire coating comprises the following ingredients (A), (B) and (D): (A) a urethane(meth)acrylate having two or more structural parts derived from an aliphatic polyol (B) a compound having a cyclic structure and one ethylenically unsaturated group, (D) a compound given by the following Formula (4a), wherein, R8 is a monovalent organic group having an ethylenically unsaturated group, and R9 is a hydrogen atom or a monovalent organic group that may have an ethylenically unsaturated group.
    Type: Application
    Filed: March 30, 2010
    Publication date: August 16, 2012
    Inventors: Hiroshi Yamaguchi, Satoshi Kamo, Takahiko Kurosawa
  • Publication number: 20120145432
    Abstract: This invention is a radiation curable resin composition for wire coatings that have excellent adhesion with the center conductor as well as having excellent manufacturing efficiency for the coating layer and sufficient strength. This radiation curable resin composition for wire coating comprising the following ingredients (A), (B) and (D): (A) a mixture of a urethane (meth)acrylate having a structure derived from an aliphatic polyol and a urethane (meth)acrylate not having a structure derived from a polyol, (B) a compound having a cyclic structure and one ethylenically unsaturated group, (D) a compound given by the following formula (4a) wherein, R8 is a monovalent organic group having an ethylenically unsaturated group, and R9 is a hydrogen atom or a monovalent organic group that may have an ethylenically unsaturated group.
    Type: Application
    Filed: March 30, 2010
    Publication date: June 14, 2012
    Inventors: Hiroshi Yamaguchi, Satoshi Kamo, Takahiko Kurosawa
  • Publication number: 20120055693
    Abstract: A kit for preparing a water-sealing agent, a water-sealing material for an electrical wire, a water-sealed electrical wire, and a water-sealing method, which are used for insulated wires and the like. A kit for preparing water-sealing material for electrical wire comprising compositions (I) and (II), wherein the water-sealing material for electrical wire is prepared by mixing them in an arbitrary ratio. (I): a liquid composition containing one or more components selected from the following components (A) to (C), and (D), without containing (E). (II): a liquid composition containing one or more components selected from the following components (A) to (C), and (E), without containing (D).
    Type: Application
    Filed: May 13, 2010
    Publication date: March 8, 2012
    Applicant: JSR CORPORATION
    Inventors: Hiroshi Yamaguchi, Katsuyuki Takase, Kazuyuki Kondou, Takahiko Kurosawa
  • Patent number: 7875317
    Abstract: An insulating-film-forming composition includes: a hydrolysis-condensation product obtained by hydrolyzing and condensing a hydrolyzable-group-containing silane monomer (A) in the presence of a polycarbosilane (B) and a basic catalyst (C); and an organic solvent.
    Type: Grant
    Filed: July 14, 2006
    Date of Patent: January 25, 2011
    Assignee: JSR Corporation
    Inventors: Hisashi Nakagawa, Masahiro Akiyama, Takahiko Kurosawa, Atsushi Shiota
  • Publication number: 20100227941
    Abstract: A photocurable resin composition for three-dimensional photofabrication operations, including stereolithography, comprising (A) a cationically polymerizable compound having two or more bisphenol structures and one or more hydroxyl groups, (B) a cationically polymerizable compound other than the component (A), (C) a cationic photoinitiator, (D) a radically polymerizable compound, (E) a radical photoinitiator, and (F) multilayer polymer particles having a core and a shell layer, the shell layer containing functional group-modified rubber polymer particles having at least one reactive functional group.
    Type: Application
    Filed: March 19, 2008
    Publication date: September 9, 2010
    Applicants: DSM IP Assets B.V., JSR Corporation
    Inventors: Masahiro Ueda, Katsuyuki Takase, Takahiko Kurosawa
  • Publication number: 20100168327
    Abstract: A process for producing a polymer includes mixing (A) a polysiloxane compound and (B) a polycarbosilane compound in the presence of a catalyst, water, and an organic solvent, and heating the mixture.
    Type: Application
    Filed: March 4, 2010
    Publication date: July 1, 2010
    Applicant: JSR CORPORATION
    Inventors: Masahiro AKIYAMA, Takahiko Kurosawa, Hisashi Nakagawa, Atsushi Shiota
  • Patent number: 7736748
    Abstract: An insulating-film-forming composition including an organic solvent and a hydrolysis-condensation product which is obtained by hydrolysis and condensation of a component (A) in the presence of a component (B).
    Type: Grant
    Filed: October 16, 2006
    Date of Patent: June 15, 2010
    Assignee: JSR Corporation
    Inventors: Masahiro Akiyama, Hisashi Nakagawa, Takahiko Kurosawa, Atsushi Shiota
  • Publication number: 20100071928
    Abstract: The present invention is a radiation curable resin composition comprising: (A) a urethane (meth) aerylate which is a reaction product of a polyol, a polyisocyanate, and a hydroxyl group-containing (meth) aerylate; (B) a compound having a cyclic structure and one ethylenically unsaturated group; (C) from about 0 to about 5 mass % of a compound having two or more ethylenically unsaturated group; and (D) a polyol having a number average molecular weight of about 1500 or more. In another embodiment of the invention component (A) must include a polyester polyol and the polyol of component (D) must have a number average molecular weight of from about 500 to about 1500. The composition is useful for coating electric wire.
    Type: Application
    Filed: March 28, 2008
    Publication date: March 25, 2010
    Inventors: Hiroshi Yamaguchi, Satoshi Kamo, Takahiko Kurosawa
  • Patent number: 7556860
    Abstract: A laminate including: a first silica-based film; a second silica-based film; and an organic film, wherein the second silica-based film includes an organic group containing a carbon-carbon double bond or a carbon-carbon triple bond. A method of forming the laminate includes: forming a first coating for a first silica-based film on a substrate; forming a second coating for a second silica-based film on the first coating, the second coating including an organic group containing a carbon-carbon double bond or a carbon-carbon triple bond; forming a third coating for an organic film on the second coating; and curing a multilayer film including the first to third coatings.
    Type: Grant
    Filed: April 26, 2006
    Date of Patent: July 7, 2009
    Assignee: JSR Corporation
    Inventors: Masahiro Akiyama, Seitaro Hattori, Takahiko Kurosawa, Manabu Sekiguchi, Terukazu Kokubo, Michihiro Mita, Tatsuya Yamanaka, Masaki Obi
  • Patent number: 7528207
    Abstract: A method of producing a polymer includes hydrolyzing and condensing a hydrolyzable-group-containing silane monomer (B) in the presence of one or more polycarbosilanes (A), at least one of the polycarbosilanes (A) being a polycarbosilane (I) having a weight average molecular weight of 500 or more and obtained by reacting a compound of the following general formula (1) in the presence of at least one of an alkali metal and an alkaline earth metal, R1mY3-mSiCR2nX3-n??(1) wherein R1 and R2 individually represent a monovalent organic group or a hydrogen atom, X represents a halogen atom, Y represents a halogen atom or an alkoxy group, and m and n individually represent integers from 0 to 2.
    Type: Grant
    Filed: July 13, 2006
    Date of Patent: May 5, 2009
    Assignee: JSR Corporation
    Inventors: Hisashi Nakagawa, Masahiro Akiyama, Takahiko Kurosawa, Atsushi Shiota
  • Publication number: 20080268264
    Abstract: A method of forming an organic silica film includes forming a coating including a silicon compound having an —Si—O—Si— structure and an —Si—CH2—Si— structure on a substrate, heating the coating, and curing the coating by applying ultraviolet radiation.
    Type: Application
    Filed: April 28, 2005
    Publication date: October 30, 2008
    Applicant: JSR CORPORATION
    Inventors: Masahiro Akiyama, Hisashi Nakagawa, Tatsuya Yamanaka, Atsushi Shiota, Takahiko Kurosawa
  • Patent number: 7358317
    Abstract: A polycarbosilane, having a main chain in which silicon atoms and carbon atoms are alternately repeated, includes a repeating unit shown by a following general formula (1), a repeating unit shown by a following general formula (2), and a repeating unit shown by a following general formula (3).
    Type: Grant
    Filed: September 16, 2005
    Date of Patent: April 15, 2008
    Assignee: JSR Corporation
    Inventors: Hisashi Nakagawa, Masahiro Akiyama, Takahiko Kurosawa, Atsushi Shiota