Abstract: A projection exposure apparatus, which has a projection optical system and exposes a substrate through the projection optical system and a liquid, while a gap between the projection optical system and the substrate is filled with the liquid. The apparatus includes a light-receiving element configured to detect light incident thereon through the projection optical system and the liquid, a vessel in which the light-receiving element is arranged, and a fluoroplastic filling a space within the vessel to cover the light-receiving element.

Abstract: A projection exposure apparatus, which has a projection optical system and exposes a substrate through the projection optical system and a liquid, while a gap between the projection optical system and the substrate is filled with the liquid. The apparatus includes a light-receiving element configured to detect light incident thereon through the projection optical system and the liquid, a vessel in which the light-receiving element is arranged, and a fluoroplastic filling a space within the vessel to cover the light-receiving element.

Abstract: A projection exposure apparatus which has a projection optical system and projects a pattern onto a substrate through the projection optical system. The apparatus includes a sensor unit which includes a light-receiving element for detecting light incident through the projection optical system, a vessel in which the light receiving element is arranged, a sealing window which transmits the incident light and seals the vessel, and a driving mechanism which aligns the substrate. A space between the sealing window and the light-receiving element is filled with a liquid having a refractive index which is greater than one, and the liquid also serves as a coolant for cooling the driving mechanism.

Abstract: An exposure apparatus for exposing a substrate to a light pulse via a mask. The apparatus includes an array of photoelectric converters to detect the light pulse, and a read circuit to read electrical signals from the array. The read circuit reads electrical signals from a part of the photoelectric converters sequentially switched with respect to each time interval between a successive two of the light pulses thereby to obtain cumulative electrical signals corresponding to a plurality of the light pulses.

Abstract: An exposure apparatus reads an electrical signal from a photoelectric sensor by using the time interval between emission pulses even at a high emission frequency of the light source. A photoelectric sensor attached to an exposure apparatus which exposes a substrate to a pulse beam emitted by a light source for generating a pulse beam has a plurality of photoelectric converters. The photoelectric converters are divided into a plurality of blocks. While charges are read from each block by using one time interval between pulse beams, charges in all the photoelectric converters are read by using a plurality of time intervals between pulse beams.

Abstract: An exposure apparatus for exposing a substrate to a light pulse via a mask. The apparatus includes an array of photoelectric converters to detect the light pulse, and a read circuit to read electrical signals from the array. The read circuit reads electrical signals from a part of the photoelectric converters sequentially switched with respect to each time interval between a successive two of the light pulses thereby to obtain cumulative electrical signals corresponding to a plurality of the light pulses.

Abstract: A projection exposure apparatus which has a projection optical system and projects a pattern onto a substrate through the projection optical system is disclosed. This apparatus includes a sensor unit which comprises a light-receiving element for detecting light incident through the projection optical system, a vessel in which the light-receiving element is arranged, and a sealing window which transmits the incident light and seals the vessel. A space between the sealing window and the light-receiving element is filled with a medium having a refractive index greater than 1.

Abstract: This invention provides an exposure apparatus capable of properly reading an electrical signal from a photoelectric sensor by using the time interval between emission pulses even at a high emission frequency of the light source. A photoelectric sensor attached to an exposure apparatus which exposes a substrate to a pulse beam emitted by a light source for generating a pulse beam has a plurality of photoelectric converters (29-1-29-n). The photoelectric converters (29-1-29-n) are divided into a plurality of blocks. While charges are read from each block by using one time interval between pulse beams, charges in all the photoelectric converters (29-1-29-n) are read by using a plurality of time intervals between pulse beams.

Abstract: An alignment system incudes a sensor device including a pair of a light emitting element and a light receiving element, for detecting an edge of a substrate without contact thereto; a driving device for supporting the substrate and for moving the substrate; and a control device for controlling the driving device so as to position the substrate, wherein the control device controls the driving device so that the sensor device produces an output of a level which is within a predetermined tolerance range with respect to a set level, and wherein the control device is operable to renew the set level at a predetermined timing on the basis of (i) a first output of the sensor device corresponding to an output of the sensor device as produced in a first state in which light from the light emitting element of the sensor device is received by the light receiving element of the sensor device without being blocked and (ii) a second output of the sensor device corresponding to an output of the sensor device as produced in a

Abstract: A surface position detecting device usable with a semiconductor device manufacturing exposure apparatus having a projection lens system for projecting an image of a pattern of a mask onto a semiconductor wafer. The device is arranged to detect the position of the wafer relative to an image plane of the projection lens system, into which plane the wafer is to be positioned. The device includes a sensor for sensing light reflected by the wafer thereby to detect the position of the wafer. Also, in order to avoid detection errors due to interference of light caused by a resist layer formed on the wafer, the wafer is irradiated with different wavelengths of lights from plural light sources. In one aspect, the device uses a reference light which is directed to the sensor without reflection by the wafer in order to avoid an effect of drift of the sensor.

Abstract: A device for detecting a position of an edge of a disk-like workpiece having an outer periphery whose shape includes a portion bearing positional information related to the workpiece, the device including a system for rotationally moving the workpiece; an illuminating system; and a photodetecting system; wherein the illuminating system and the photodetecting system are disposed so as to sandwich therebetween an outer peripheral portion of the workpiece when it is rotationally moved by the moving system and wherein the illuminating system projects, toward the photodetecting system, a light beam having an elongated shape in cross-section.

Abstract: A device for positioning a disk-like workpiece, the device having a system for detecting a change in position of an edge of the workpiece, the detecting system producing a signal; a system for selecting a portion of the signal produced by said detecting means, which portion contains desired positional information, the selecting means producing a signal; and a positioning system for rotating the workpiece on the basis of the signal produced by the selecting system, to thereby position the workpiece.