Abstract: A capacity control valve includes a valve housing provided a discharge port through which a discharge fluid of discharge pressure Pd passes, a suction port through which a suction fluid of suction pressure Ps passes, and a control port through which a control fluid of control pressure Pc passes, a rod configured to be driven by a solenoid, a main valve formed by a main valve seat and a main valve element and configured for opening and closing a communication between the discharge port and the control port in accordance with a movement of the rod, and a CS valve provided between the control port and the suction port and controlled by a dynamic pressure of a fluid flowing from the discharge port to the control port at an opening state of the main valve.

Abstract: A drive device includes a filter section that includes an optical filter, a transmission section that rotates around a rotation shaft, a first groove portion that is formed to the transmission section, a protruding portion that is formed to the filter section, in contact with the first groove portion, and that moves the filter section from a first position to a second position by moving along the first groove portion in coordination with rotation of the transmission section, and a second groove portion that is formed continuously with the first groove portion, and that is provided along a tangent line direction passing through the protruding portion that is on a circle having the rotation shaft of the transmission section at a center and a radius that is a distance between the rotation shaft and the protruding portion, when the optical filter section is moved to the second position.

Abstract: A semiconductor treatment composition includes particles having a particle size of 0.1 to 0.3 micrometers in a number of 3×101 to 1.5×103 per mL.

Abstract: A semiconductor treatment composition includes potassium, sodium, and a compound A represented by the formula (1), and has a potassium content MK (ppm) and a sodium content MNa (ppm) that satisfy MK/MNa=1×10?1 to 1×104.

Abstract: A semiconductor treatment composition includes potassium, sodium, and a compound A represented by the formula (1), and has a potassium content MK (ppm) and a sodium content MNa (ppm) that satisfy MK/MNa=1×10?1 to 1×104.

Abstract: An endoscope apparatus includes: first and second cooling units configured to cool first and second light source portions; an image pickup portion configured to generate a picked-up image; and a cooling control portion configured to control amounts of light emission of the light source portions while maintaining an amount-of-light ratio so that the brightness of the picked-up image becomes the target brightness and control cooling based on the information about the amount-of-light ratio and the brightness control information; wherein the cooling control portion decides a cooling capacity of the first cooling units and a cooling capacity of the second cooling units for cooling the respective light source portions for which the amounts of light emission are controlled, at the cooling ratio, so as to cause the light source portions to be included within a predetermined temperature range, based on the brightness control information.

Abstract: A semiconductor treatment composition includes potassium, sodium, and a compound A represented by the formula (1), and has a potassium content MK (ppm) and a sodium content MNa (ppm) that satisfy MK/MNa=1×10?1 to 1×104.

Abstract: A treatment composition for chemical mechanical polishing includes: (A) a water-soluble amine; (B) a water-soluble polymer having an aromatic hydrocarbon group-containing repeating unit; and an aqueous medium. The treatment composition for chemical mechanical polishing preferably further includes (C) an organic acid having an aromatic hydrocarbon group and has a pH of 9 or more.

Abstract: An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).

Abstract: A cleaning composition includes (A) at least one compound selected from the group consisting of a fatty acid that includes a hydrocarbon group having 8 to 20 carbon atoms, a phosphonic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, a sulfuric acid ester that includes a hydrocarbon group having 3 to 20 carbon atoms, an alkenylsuccinic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, and salts thereof, (B) an organic acid, (C) a water-soluble amine, (D) a water-soluble polymer, and an aqueous medium, the cleaning composition having a pH of 9 or more.

Abstract: A drive device includes a filter section that includes an optical filter, a transmission section that rotates around a rotation shaft, a first groove portion that is formed to the transmission section, a protruding portion that is formed to the filter section, in contact with the first groove portion, and that moves the filter section from a first position to a second position by moving along the first groove portion in coordination with rotation of the transmission section, and a second groove portion that is formed continuously with the first groove portion, and that is provided along a tangent line direction passing through the protruding portion that is on a circle having the rotation shaft of the transmission section at a center and a radius that is a distance between the rotation shaft and the protruding portion, when the optical filter section is moved to the second position.

Abstract: A semiconductor treatment composition includes potassium and sodium, and has a potassium content MK (ppm) and a sodium content MNa (ppm) that satisfy MK/MNa=5×103 to 1×105.

Abstract: A semiconductor treatment composition includes particles having a particle size of 0.1 to 0.3 micrometers in a number of 3×101 to 1.5×103 per mL.

Abstract: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.

Abstract: An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).

Abstract: An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).

Abstract: An endoscope apparatus includes: first and second cooling units configured to cool first and second light source portions; an image pickup portion configured to generate a picked-up image; and a cooling control portion configured to control amounts of light emission of the light source portions while maintaining an amount-of-light ratio so that the brightness of the picked-up image becomes the target brightness and control cooling based on the information about the amount-of-light ratio and the brightness control information; wherein the cooling control portion decides a cooling capacity of the first cooling units and a cooling capacity of the second cooling units for cooling the respective light source portions for which the amounts of light emission are controlled, at the cooling ratio, so as to cause the light source portions to be included within a predetermined temperature range, based on the brightness control information.

Abstract: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.

Abstract: A composition includes a polymer component including a first polymer having a first structural unit represented by a following formula (1), and a solvent. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R2 represents a single bond or a divalent organic group having 1 to 20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. RQ represents a perfluoroalkyl group having 1 to 5 carbon atoms. RX represents a hydrogen atom or a monovalent base-labile group.

Abstract: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.