Abstract: A substrate processing apparatus includes a drying unit configured to replace a liquid film formed on an upper surface of a substrate in a horizontal state with a supercritical fluid to dry the substrate, wherein the drying unit includes a pressure container provided with a drying chamber formed therein to dry the substrate, and a lid configured to close an opening of the pressure container, and the substrate processing apparatus further comprises a support member configured to support the lid so as to be movable in both a first direction parallel to the opening and a second direction opposite to the first direction.

Abstract: A substrate processing apparatus includes a unit block including multiple liquid film forming devices each configured to form a liquid film on a top surface of a substrate, and a drying device configured to replace the liquid film with a supercritical fluid to dry the substrate; and a transfer block provided between the multiple liquid film forming devices and the drying device. The transfer block includes a transfer device configured to transfer the substrate between the multiple liquid film forming devices and the drying device, and a length of a transfer path of the substrate is equal between each of the multiple liquid film forming devices and the drying device.

Abstract: A substrate processing apparatus that dries a liquid adhering to a substrate by using a processing fluid in a supercritical state, includes: a processing container in which the substrate is accommodated; a plurality of pipes configured to allow the processing fluid to flow to and from the processing container therethrough; a first fluid heating device configured to heat a first pipe that supplies the processing fluid to an interior of the processing container among the plurality of pipes; and a second fluid heating device configured to heat a second pipe that discharges the processing fluid from the interior of the processing container among the plurality of pipes.

Abstract: A substrate processing apparatus includes: a processing container in which a substrate is accommodated; a holder configured to hold the substrate in a horizontal posture at a holding position inside the processing container; and a fluid supplier configured to supply, into the processing container, a supercritical processing fluid for drying the substrate to which a liquid adheres, wherein the fluid supplier includes a first direction change member configured to change a flow of the supercritical processing fluid, supplied radially outward from the substrate held by the holder, in a direction that does not come in contact with a radial outer end of the substrate.

Abstract: A substrate processing apparatus that dries a liquid adhering to a substrate by using a processing fluid in a supercritical state, includes: a processing container in which the substrate is accommodated; a plurality of pipes configured to allow the processing fluid to flow to and from the processing container therethrough; a first fluid heating device configured to heat a first pipe that supplies the processing fluid to an interior of the processing container among the plurality of pipes; and a second fluid heating device configured to heat a second pipe that discharges the processing fluid from the interior of the processing container among the plurality of pipes.

Abstract: A side surface unit of a heat treatment space S is formed by a shutter member 250 including an outer shutter 260 and an inner shutter 270. Supply air A is supplied as a horizontal laminar flow toward a wafer W from a lower end side of the shutter member 250, that is, from a gap d1 located on the level with the wafer W placed on a heat plate 211 of a mounting table 210. Supply air B is supplied into the heat treatment space S from an upper end side of the shutter member 250, that is, from a gap d2 positioned higher than the wafer W. A ratio between a flow rate of the supply air A and a flow rate of the supply air B is 4:1.

Abstract: A side surface unit of a heat treatment space S is formed by a shutter member 250 including an outer shutter 260 and an inner shutter 270. Supply air A is supplied as a horizontal laminar flow toward a wafer W from a lower end side of the shutter member 250, that is, from a gap d1 located on the level with the wafer W placed on a heat plate 211 of a mounting table 210. Supply air B is supplied into the heat treatment space S from an upper end side of the shutter member 250, that is, from a gap d2 positioned higher than the wafer W. A ratio between a flow rate of the supply air A and a flow rate of the supply air B is 4:1.

Abstract: A side surface unit of a heat treatment space S is formed by a shutter member 250 including an outer shutter 260 and an inner shutter 270. Supply air A is supplied as a horizontal laminar flow toward a wafer W from a lower end side of the shutter member 250, that is, from a gap d1 located on the level with the wafer W placed on a heat plate 211 of a mounting table 210. Supply air B is supplied into the heat treatment space S from an upper end side of the shutter member 250, that is, from a gap d2 positioned higher than the wafer W. A ratio between a flow rate of the supply air A and a flow rate of the supply air B is 4:1.

Abstract: A side surface unit of a heat treatment space S is formed by a shutter member 250 including an outer shutter 260 and an inner shutter 270. Supply air A is supplied as a horizontal laminar flow toward a wafer W from a lower end side of the shutter member 250, that is, from a gap d1 located on the level with the wafer W placed on a heat plate 211 of a mounting table 210. Supply air B is supplied into the heat treatment space S from an upper end side of the shutter member 250, that is, from a gap d2 positioned higher than the wafer W. A ratio between a flow rate of the supply air A and a flow rate of the supply air B is 4:1.

Abstract: A method to efficiently reduce lead content of cement without exerting influence upon quality of the cement. The method comprises the steps of: controlling O2 concentration of combustion gas in an inlet end of a cement kiln to 5% or lower and/or CO concentration thereof 1000 ppm or more; extracting a part of combustion gas from the cement kiln and collecting dust contained in the combustion gas; and collecting lead from the dust collected. With this, the area where raw material temperature in the cement kiln is between 800° and 1100° can be turned into reducing atmosphere to sharply increase volatilization rate of lead, and collection of lead from the dust allows lead content of cement to efficiently be reduced without exerting influence upon quality of the cement.

Abstract: A method to efficiently reduce lead content of cement without exerting influence upon quality of the cement. The method comprises the steps of: controlling O2 concentration of combustion gas in an inlet end of a cement kiln to 5% or lower and/or CO concentration thereof 1000 ppm or more; extracting a part of combustion gas from the cement kiln and collecting dust contained in the combustion gas; and collecting lead from the dust collected. With this, the area where raw material temperature in the cement kiln is between 800° and 1100° can be turned into reducing atmosphere to sharply increase volatilization rate of lead, and collection of lead from the dust allows lead content of cement to efficiently be reduced without exerting influence upon quality of the cement.

Abstract: A surface-treated Al sheet that has excellent adhesion with a plating layer, solder wettability, and soldering strength, and can be preferably used for a heat sink which has excellent heat radiation and can be soldered; a heat sink using the Al sheet; and a method for manufacturing the surface-treated Al sheet at low cost are intended to be provided. A Zn layer is formed on a surface of an Al substrate, and a Ni layer and a Sn layer are formed by plating by displacement plating thereon, or a layer which has a solder flux property and improves thermal emission is further formed on the surface-treated Al sheet.

Abstract: Steel sheet for porcelain enameling having excellent workability yet capable of providing an enamel layer having excellent adhesion with the steel sheet on direct-on enameling once and still free of black specks defects, a method for producing the same, as well as a porcelain enamel product and the method for producing the same are provided, in which low carbon Al-killed steel sheet, high oxygen steel sheet, Ti-added steel sheet, Nb-added steel sheet, Ti—Nb-added steel sheet or B-added steel sheet is used. A steel sheet for porcelain enameling is produced by applying Ni—Mo alloy plating to the low carbon Al-killed steel sheet, high oxygen steel sheet, Ti-added steel sheet, Nb-added steel sheet, Ti—Nb-added steel sheet or B-added steel sheet having specified components and composition ratio, and after performing heat treatment thereto to control the content of Ni, Mo, and Fe that are present on the surface of the steel sheet in a predetermined range, porcelain enamel is applied and fired.

Abstract: Steel sheet for porcelain enameling capable of realizing excellent enamel adhesion with the steel sheet by direct-on enameling once is provided by using a Ti-added steel sheet; there are also a method for producing the same, as well as a porcelain enamel product and the method for producing the same. A steel sheet for porcelain enameling is produced by providing a Ni—Mo alloy plating film on a Ti-added steel sheet containing 0.01% by weight (wherein, % represents “% by weight” hereinafter) or less of C, 0.5% or less of Mn, 0.04% or less of P, 0.04% or less of S, 0.01 to 0.50% of Ti, and balance Fe accompanied by unavoidable impurities, and by then performing heat treatment thereto to control the content of Ni, Mo, and Fe present in the surface of the steel sheet in a predetermined range, porcelain enamel is applied once and fired.

Abstract: Steel sheet for porcelain enameling having excellent workability yet capable of providing an enamel layer having excellent adhesion with the steel sheet on direct-on enameling once and still free of black specks defects, a method for producing the same, as well as a porcelain enamel product and the method for producing the same are provided, in which low carbon Al-killed steel sheet, high oxygen steel sheet, Ti-added steel sheet, Nb-added steel sheet, Ti—Nb-added steel sheet or B-added steel sheet is used. A steel sheet for porcelain enameling is produced by applying Ni—Mo alloy plating to the low carbon Al-killed steel sheet, high oxygen steel sheet, Ti-added steel sheet, Nb-added steel sheet, Ti—Nb-added steel sheet or B-added steel sheet having specified components and composition ratio, and after performing heat treatment thereto to control the content of Ni, Mo, and Fe that are present on the surface of the steel sheet in a predetermined range, porcelain enamel is applied and fired.

Abstract: Steel sheet for porcelain enameling capable of realizing excellent enamel adhesion with the steel sheet by direct-on enameling once is provided by using a Ti-added steel sheet; there are also a method for producing the same, as well as a porcelain enamel product and the method for producing the same. A steel sheet for porcelain enameling is produced by providing a Ni—Mo alloy plating film on a Ti-added steel sheet containing 0.01% by weight (wherein, % represents “% by weight” hereinafter) or less of C, 0.5% or less of Mn, 0.04% or less of P, 0.04% or less of S, 0.01 to 0.50% of Ti, and balance Fe accompanied by unavoidable impurities, and by then performing heat treatment thereto to control the content of Ni, Mo, and Fe present in the surface of the steel sheet in a predetermined range, porcelain enamel is applied once and fired.

Abstract: In a vector control method for controlling a motor by detecting a primary current in a motor driven by an inverter circuit with an electric current detector, dividing the primary current detection value detected by the electric current detector to a current-for-torque detection value and a detected current-for-excitation detection value, and thus dividing a primary current instruction value to a current-for-torque instruction value and a current-for-excitation value, a portion between the current-for-torque detection value and current-for-excitation detection value each obtained from the primary current detection value is changed by an Iq gain circuit (gain Kqc) and an Id gain circuit (gain Kd), which are discrete circuits, and the rated torque characteristics of the motor is changed according to change of the apportion.

Abstract: An inverter control apparatus and method for a motor driven by an inverter circuit. The primary current of the motor is detected by a detector circuit and is used in combination with a primary current command value to provide pulse-width modulation of the inverter circuit. The inverter is controlled by a switching circuit that can change the PWM frequency based on any one or more factors, including motor speed, motor speed or position control mode, equivalent load factor and detected temperature.

Abstract: A machine tool controlling apparatus and method wherein the current operation is in a normal operation mode or in a positionly synchronized operation mode in which a spindle and a subordinate axis are positionly synchronized. If it is determined that the current operation is in the positionly synchronized operation mode, transfer function models for the spindle and the subordinate axis are extrapolated into a position instruction issued to the subordinate axis.

Abstract: A position command method and apparatus for shortening the acceleration and deceleration times of a servo controlled apparatus by effectively utilizing the torque of the controlled apparatus. A value of speed per unit time is developed on the basis of speed and position data, and a constant speed or an acceleration or deceleration function processing may be selectably performed. In the position commanding method and its unit of the present invention, the deceleration stop distance of output speed is computed at all times or is held as a list data as described above and moreover is compared with a residual distance XR. Consequently, the deceleration stop distance does not have to coincide with the residual portion from the acceleration command, and the acceleration/deceleration curve alone can be realized in an independent form. Also, the speed change can be made smoother by correcting the cross point of independently formed acceleration and/or deceleration curves defining a corner section.