Patents by Inventor Takahiro Inatsugi

Takahiro Inatsugi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11078211
    Abstract: Provided are a compound represented by the following formula I; a novel photoreactive compound that can be used in nucleic acid photoreaction techniques by a photoreactive crosslinking agent comprising the compound; and a photoreactive crosslinking agent in which the photoreactive compound is used.
    Type: Grant
    Filed: July 19, 2018
    Date of Patent: August 3, 2021
    Assignees: JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, NICCA CHEMICAL CO., LTD.
    Inventors: Takahiro Inatsugi, Ayako Koto, Isao Ishimaru, Masahiko Takamura, Kenzo Fujimoto
  • Publication number: 20200317685
    Abstract: Provided are a compound represented by the following formula I; a novel photoreactive compound that can be used in nucleic acid photoreaction techniques by a photoreactive crosslinking agent comprising the compound; and a photoreactive crosslinking agent in which the photoreactive compound is used.
    Type: Application
    Filed: July 19, 2018
    Publication date: October 8, 2020
    Applicants: JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY, NICCA CHEMICAL CO., LTD.
    Inventors: Takahiro Inatsugi, Ayako Koto, Isao Ishimaru, Masahiko Takamura, Kenzo Fujimoto
  • Publication number: 20100129752
    Abstract: The photosensitive resin composition of the present invention is a photosensitive resin composition comprising: (A) a binder polymer; (B) a photopolymerizable compound with at least one polymerizable ethylenic unsaturated group in the molecule; and (C) a photopolymerization initiator, wherein component (A) contains a polymer that contains a compound represented by the following general formula (I) as a polymerization component: CH2?C(L1)-COOL2??(I) (wherein L1 represents a hydrogen atom or methyl group and L2 represents a C2-20 alkyl group group) and component (B) contains a compound represented by the following general formula (II): (wherein R1 represents a hydrogen atom or methyl group, R2 represents a C3-20 alkyl group that has at least 2 tertiary or higher carbon atoms, X represents a C2-6 alkylene group, and n is an integer from 1 to 20).
    Type: Application
    Filed: May 15, 2006
    Publication date: May 27, 2010
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Yoshiki Ajioka, Tatsuya Ichikawa, Mitsuo Matsuda, Takahiro Inatsugi