Patents by Inventor Takahiro Jindo
Takahiro Jindo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12154764Abstract: In a plasma generator having a first supply port and a second supply port, in which the plasma generator includes a first supply device for supplying a first gas from the first supply port, and a second supply device connected to the first supply device so as to supply a second gas from the second supply port, a gas supply determination method includes a first supply step of causing the first supply device to start supplying the first gas in a state where the second supply device stops supplying the second gas, a first measurement step of measuring a flow rate of the gas supplied to the first supply port after the first supply step, and a first notification step of notifying a supply state of the first gas in the first supply port in accordance with a flow rate measurement result of the first measurement step.Type: GrantFiled: August 28, 2018Date of Patent: November 26, 2024Assignee: FUJI CORPORATIONInventors: Shinji Takikawa, Takahiro Jindo
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Patent number: 11929237Abstract: A plasma generation device includes a plasma head configured to eject plasma gas that is plasmatized, a gas supply device configured to supply gas serving as the plasma gas to the plasma head, a pair of electrodes that is provided in the plasma head, the pair of electrodes being configured to perform discharging for a part of the gas supplied from the gas supply device to generate the plasma gas, a temperature sensor that is provided in the plasma head, the temperature sensor being configured to measure a temperature of the plasma head; and a control device, in which the control device executes a cooling process of cooling the plasma head by causing the gas supply device to continue supply of the gas until the temperature sensor measures a temperature equal to or less than a predetermined value after the discharging of the pair of electrodes is stopped.Type: GrantFiled: August 28, 2018Date of Patent: March 12, 2024Assignee: FUJI CORPORATIONInventors: Shinji Takikawa, Tomoko Higashida, Takahiro Jindo
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Patent number: 11904401Abstract: A practical plasma processing machine is provided, in which attachment mechanism is provided for attaching plasma head to attachment section of a head moving device that moves the plasma head. Since the plasma head can be attached or detached, for example, it is easy to exchange it with a different type of plasma head, remove for maintenance, attaching after maintenance, or the like.Type: GrantFiled: January 30, 2018Date of Patent: February 20, 2024Assignee: FUJI CORPORATIONInventors: Toshiyuki Ikedo, Takahiro Jindo
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Patent number: 11632851Abstract: A plasma emitting device includes plasma head configured to generate a plasmarized gas and jet the plasmarized gas so generated from a nozzle thereof, a gas supply device configured to supply a gas to the plasma head while controlling a flow rate of the gas, gas tube connecting the gas supply device with the plasma head to constitute a gas flow path, and pressure detector configured to detect a pressure of the gas supplied from the gas supply deice. Pressures of gases which are supplied to the plasma head are detected for use for various purposes, whereby the practical plasma emitting device is made up. Specifically, for example, a head clogging, which is a clog impeding a gas flow in the plasma head, can be determined without difficulty based on the detected pressure.Type: GrantFiled: December 20, 2017Date of Patent: April 18, 2023Assignee: FUJI CORPORATIONInventors: Takahiro Jindo, Toshiyuki Ikedo, Shinji Takikawa, Akihiro Niwa
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Patent number: 11523490Abstract: The object of the present disclosure is to efficiently generate plasma. In the plasma device of the present disclosure, a dielectric barrier discharger and an arc discharger are included, but the arc discharger is provided downstream from the dielectric barrier discharger in a discharge space where a gas for generating plasma is supplied. Dielectric barrier discharge occurs at the dielectric barrier discharger, and arch discharge occurs at the arc discharger. As a result of the gas for generating plasma being activated in the dielectric barrier discharge, the aforementioned gas can be adequately converted to plasma in the arc discharger.Type: GrantFiled: March 20, 2018Date of Patent: December 6, 2022Assignee: FUJI CORPORATIONInventor: Takahiro Jindo
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Patent number: 11508561Abstract: A plasma processing apparatus, for releasing plasma-converted gas from plasma head for performing process, detects the pressures of a gas prior to application of a voltage to electrodes of the plasma head, the gas being supplied from gas supply section to a plasma head, and allow initiation of process by the plasma processing apparatus based on the detected pressures.Type: GrantFiled: May 23, 2018Date of Patent: November 22, 2022Assignee: FUJI CORPORATIONInventor: Takahiro Jindo
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Patent number: 11470711Abstract: A plasma generator that detects whether a connector of a head is electrically connected to a power cable. The plasma generator includes the head including the connector with a terminal to supply electricity to electrodes that generate plasma by electrical discharge, and a first terminal and a second terminal that are connected to each other; a power cable to supply electricity to the terminal; a cable to transmit a signal to the first terminal; a first ground cable to ground the second terminal; and a detector to detect a signal current that flows in a path from the cable to the first ground cable in accordance with transmission of the signal.Type: GrantFiled: May 16, 2017Date of Patent: October 11, 2022Assignee: FUJI CORPORATIONInventor: Takahiro Jindo
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Patent number: 11295932Abstract: Atmospheric-pressure plasma generation device of the present invention includes heat sinks. Flow paths are formed in the heat sinks, and cooling gas flows in the flow paths, thereby cooling lower housing in which a reaction chamber is formed. Here, the gas used for cooling is warmed by the heat of the lower housing. The warmed gas is supplied into heated gas supply device and heated by heater. The heated gas flows in lower cover and is emitted together with plasma gas from lower cover toward a processing object. Consequently, it is possible to perform cooling of the lower housing heated by electric discharge and perform heating of the processing object, and it is possible to reduce energy required for heating gas.Type: GrantFiled: August 11, 2016Date of Patent: April 5, 2022Assignee: FUJI CORPORATIONInventors: Takahiro Jindo, Toshiyuki Ikedo
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Patent number: 11259396Abstract: A plasma generation system capable of more accurately measuring the actual temperature of a plasma gas applied to a target object. The plasma generation system includes: an emitting head configured to generate plasma gas by supplying power to electrodes provided in a reaction chamber to generate a plasma gas by converting a processing gas into plasma, and apply the generated plasma gas to a target object; and a temperature sensor configured to detect a temperature of the plasma gas and output a detection signal corresponding to the detected temperature. The temperature sensor is arranged at a position separated from an emission port of the emitting head from which the plasma gas is emitted. The emitting head is configured to be movable between the target object the temperature sensor.Type: GrantFiled: April 4, 2017Date of Patent: February 22, 2022Assignee: FUJI CORPORATIONInventors: Takahiro Jindo, Toshiyuki Ikedo
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Patent number: 11195702Abstract: A plasma-generating device including: a pair of electrodes; a pair of holders configured to hold ends of the pair of electrodes in a protruding state; and a casing in which is formed a first recess and that is configured to combine with the pair of holders in a state with the ends of the pair of electrodes that protrude from the pair of holders inserted into the first recess, wherein the combined casing and the pair of holders contact each other only at an opposite side to a side between the ends of the pair of electrodes that project from the pair of holders.Type: GrantFiled: April 4, 2017Date of Patent: December 7, 2021Assignee: FUJI CORPORATIONInventors: Takahiro Jindo, Toshiyuki Ikedo
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Publication number: 20210313155Abstract: In a plasma generator having a first supply port and a second supply port, in which the plasma generator includes a first supply device for supplying a first gas from the first supply port, and a second supply device connected to the first supply device so as to supply a second gas from the second supply port, a gas supply determination method includes a first supply step of causing the first supply device to start supplying the first gas in a state where the second supply device stops supplying the second gas, a first measurement step of measuring a flow rate of the gas supplied to the first supply port after the first supply step, and a first notification step of notifying a supply state of the first gas in the first supply port in accordance with a flow rate measurement result of the first measurement step.Type: ApplicationFiled: August 28, 2018Publication date: October 7, 2021Applicant: FUJI CORPORATIONInventors: Shinji TAKIKAWA, Takahiro JINDO
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Publication number: 20210276054Abstract: An object of the present invention is to provide a technique capable of removing oil regardless of a shape of a target object to which the oil is attached. Cutting oil is decomposed by irradiating the cutting oil with a plasma gas containing oxygen plasma. Oxygen radicals decompose a carbon element and a hydrogen element constituting the oil into carbon dioxide and water, respectively, to remove the oil. Therefore, paraffin and ester contained in the cutting oil can be decomposed by irradiating the cutting oil with the plasma gas containing oxygen plasma. Since the plasma gas can flow along a shape of a target object, the oil can be removed regardless of a shape of a portion of the target object to which the oil is attached.Type: ApplicationFiled: August 2, 2018Publication date: September 9, 2021Applicant: FUJI CORPORATIONInventors: Takahiro JINDO, Takuya IWATA, Akihiro NIWA, Akihiro HIGASHIDA
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Publication number: 20210183630Abstract: A plasma processing apparatus, for releasing plasma-converted gas from plasma head for performing process, detects the pressures of a gas prior to application of a voltage to electrodes of the plasma head, the gas being supplied from gas supply section to a plasma head, and allow initiation of process by the plasma processing apparatus based on the detected pressures.Type: ApplicationFiled: May 23, 2018Publication date: June 17, 2021Applicant: FUJI CORPORATIONInventor: Takahiro JINDO
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Publication number: 20210176852Abstract: A plasma generator capable of detecting whether a connector of a head is electrically connected to a power cable. When the connector of the plasma head is electrically connected to the cable harness, a signal current flows in a path from the controller to the ground via a photocoupler, a relay, a cable, a terminal, another terminal, and a first ground cable in response to a pulse signal outputted from the controller. Accordingly, the plasma generator is able to detect whether the connector of the head is electrically connected to the first power cable and the second power cable, based on whether the photocoupler detects a signal current.Type: ApplicationFiled: May 16, 2017Publication date: June 10, 2021Applicant: FUJI CORPORATIONInventor: Takahiro JINDO
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Publication number: 20210166919Abstract: A plasma generation device includes a plasma head configured to eject plasma gas that is plasmatized, a gas supply device configured to supply gas serving as the plasma gas to the plasma head, a pair of electrodes that is provided in the plasma head, the pair of electrodes being configured to perform discharging for a part of the gas supplied from the gas supply device to generate the plasma gas, a temperature sensor that is provided in the plasma head, the temperature sensor being configured to measure a temperature of the plasma head; and a control device, in which the control device executes a cooling process of cooling the plasma head by causing the gas supply device to continue supply of the gas until the temperature sensor measures a temperature equal to or less than a predetermined value after the discharging of the pair of electrodes is stopped.Type: ApplicationFiled: August 28, 2018Publication date: June 3, 2021Applicant: FUJI CORPORATIONInventors: Shinji TAKIKAWA, Tomoko HIGASHIDA, Takahiro JINDO
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Publication number: 20210151293Abstract: Atmospheric-pressure plasma generation device 10 of the present invention includes heat sinks 27 and 28. Flow paths are formed in the heat sinks, and cooling gas flows in the flow paths, thereby cooling lower housing 20 in which a reaction chamber is formed. Here, the gas used for cooling is warmed by the heat of the lower housing. The warmed gas is supplied into heated gas supply device 14 and heated by heater 112. The heated gas flows in lower cover 22 and is emitted together with plasma gas from lower cover 22 toward a processing object. Consequently, it is possible to perform cooling of the lower housing heated by electric discharge and perform heating of the processing object, and it is possible to reduce energy required for heating gas.Type: ApplicationFiled: August 11, 2016Publication date: May 20, 2021Applicant: FUJI CORPORATIONInventors: Takahiro JINDO, Toshiyuki IKEDO
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Publication number: 20210120657Abstract: The object of the present disclosure is to efficiently generate plasma. In the plasma device of the present disclosure, a dielectric barrier discharger and an arc discharger are included, but the arc discharger is provided downstream from the dielectric barrier discharger in a discharge space where a gas for generating plasma is supplied. Dielectric barrier discharge occurs at the dielectric barrier discharger, and arch discharge occurs at the arc discharger. As a result of the gas for generating plasma being activated in the dielectric barrier discharge, the aforementioned gas can be adequately converted to plasma in the arc discharger.Type: ApplicationFiled: March 20, 2018Publication date: April 22, 2021Applicant: FUJI CORPORATIONInventor: Takahiro JINDO
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Publication number: 20210111006Abstract: A plasma-generating device including: a pair of electrodes; a pair of holders configured to hold ends of the pair of electrodes in a protruding state; and a casing in which is formed a first recess and that is configured to combine with the pair of holders in a state with the ends of the pair of electrodes that protrude from the pair of holders inserted into the first recess, wherein the combined casing and the pair of holders contact each other only at an opposite side to a side between the ends of the pair of electrodes that project from the pair of holders.Type: ApplicationFiled: April 4, 2017Publication date: April 15, 2021Applicant: FUJI CORPORATIONInventors: Takahiro JINDO, Toshiyuki IKEDO
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Patent number: 10980101Abstract: An atmospheric pressure plasma generating device includes a nozzle block in which fourth gas passages from which plasma gas is emitted are formed, is covered by cover, and a through-hole is formed in the cover such that the leading end of the fourth gas passage is positioned on the inside. Heated gas is supplied inside the cover and is emitted from the through-hole of the cover, and plasma gas is emitted so as to penetrate the heated gas. By the plasma gas being surrounded by the heated gas in this manner, deactivation of the plasma gas is prevented. A distance between the leading end of the fourth gas passage and an opening of the through-hole at an outer wall of the cover is set from 0 to 2 mm in an emission direction of the plasma gas.Type: GrantFiled: June 2, 2015Date of Patent: April 13, 2021Assignee: FUJI CORPORATIONInventors: Akihiro Niwa, Takahiro Jindo
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Patent number: 10950420Abstract: An atmospheric pressure plasma device including a plasma head; a gas tube configured to supply a gas to the plasma head; a flow rate controller configured to control a flow rate of the gas supplied to the gas tube; a pressure sensor arranged downstream of the flow rate controller and configured to detect a pressure in the gas tube; and a determining section configured to determine a state of the device based on how the pressure in the gas tube deviates from a standard value specified for each flow rate of the supplied gas. As a result, it is possible to determine the gas leakage of the atmospheric pressure plasma device. Further, it is possible to determine whether plasma is being generated in a favorable state.Type: GrantFiled: April 4, 2017Date of Patent: March 16, 2021Assignee: FUJI CORPORATIONInventors: Takahiro Jindo, Toshiyuki Ikedo, Akihiro Niwa