Patents by Inventor Takahiro Jindo

Takahiro Jindo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11929237
    Abstract: A plasma generation device includes a plasma head configured to eject plasma gas that is plasmatized, a gas supply device configured to supply gas serving as the plasma gas to the plasma head, a pair of electrodes that is provided in the plasma head, the pair of electrodes being configured to perform discharging for a part of the gas supplied from the gas supply device to generate the plasma gas, a temperature sensor that is provided in the plasma head, the temperature sensor being configured to measure a temperature of the plasma head; and a control device, in which the control device executes a cooling process of cooling the plasma head by causing the gas supply device to continue supply of the gas until the temperature sensor measures a temperature equal to or less than a predetermined value after the discharging of the pair of electrodes is stopped.
    Type: Grant
    Filed: August 28, 2018
    Date of Patent: March 12, 2024
    Assignee: FUJI CORPORATION
    Inventors: Shinji Takikawa, Tomoko Higashida, Takahiro Jindo
  • Patent number: 11904401
    Abstract: A practical plasma processing machine is provided, in which attachment mechanism is provided for attaching plasma head to attachment section of a head moving device that moves the plasma head. Since the plasma head can be attached or detached, for example, it is easy to exchange it with a different type of plasma head, remove for maintenance, attaching after maintenance, or the like.
    Type: Grant
    Filed: January 30, 2018
    Date of Patent: February 20, 2024
    Assignee: FUJI CORPORATION
    Inventors: Toshiyuki Ikedo, Takahiro Jindo
  • Patent number: 11632851
    Abstract: A plasma emitting device includes plasma head configured to generate a plasmarized gas and jet the plasmarized gas so generated from a nozzle thereof, a gas supply device configured to supply a gas to the plasma head while controlling a flow rate of the gas, gas tube connecting the gas supply device with the plasma head to constitute a gas flow path, and pressure detector configured to detect a pressure of the gas supplied from the gas supply deice. Pressures of gases which are supplied to the plasma head are detected for use for various purposes, whereby the practical plasma emitting device is made up. Specifically, for example, a head clogging, which is a clog impeding a gas flow in the plasma head, can be determined without difficulty based on the detected pressure.
    Type: Grant
    Filed: December 20, 2017
    Date of Patent: April 18, 2023
    Assignee: FUJI CORPORATION
    Inventors: Takahiro Jindo, Toshiyuki Ikedo, Shinji Takikawa, Akihiro Niwa
  • Patent number: 11523490
    Abstract: The object of the present disclosure is to efficiently generate plasma. In the plasma device of the present disclosure, a dielectric barrier discharger and an arc discharger are included, but the arc discharger is provided downstream from the dielectric barrier discharger in a discharge space where a gas for generating plasma is supplied. Dielectric barrier discharge occurs at the dielectric barrier discharger, and arch discharge occurs at the arc discharger. As a result of the gas for generating plasma being activated in the dielectric barrier discharge, the aforementioned gas can be adequately converted to plasma in the arc discharger.
    Type: Grant
    Filed: March 20, 2018
    Date of Patent: December 6, 2022
    Assignee: FUJI CORPORATION
    Inventor: Takahiro Jindo
  • Patent number: 11508561
    Abstract: A plasma processing apparatus, for releasing plasma-converted gas from plasma head for performing process, detects the pressures of a gas prior to application of a voltage to electrodes of the plasma head, the gas being supplied from gas supply section to a plasma head, and allow initiation of process by the plasma processing apparatus based on the detected pressures.
    Type: Grant
    Filed: May 23, 2018
    Date of Patent: November 22, 2022
    Assignee: FUJI CORPORATION
    Inventor: Takahiro Jindo
  • Patent number: 11470711
    Abstract: A plasma generator that detects whether a connector of a head is electrically connected to a power cable. The plasma generator includes the head including the connector with a terminal to supply electricity to electrodes that generate plasma by electrical discharge, and a first terminal and a second terminal that are connected to each other; a power cable to supply electricity to the terminal; a cable to transmit a signal to the first terminal; a first ground cable to ground the second terminal; and a detector to detect a signal current that flows in a path from the cable to the first ground cable in accordance with transmission of the signal.
    Type: Grant
    Filed: May 16, 2017
    Date of Patent: October 11, 2022
    Assignee: FUJI CORPORATION
    Inventor: Takahiro Jindo
  • Patent number: 11295932
    Abstract: Atmospheric-pressure plasma generation device of the present invention includes heat sinks. Flow paths are formed in the heat sinks, and cooling gas flows in the flow paths, thereby cooling lower housing in which a reaction chamber is formed. Here, the gas used for cooling is warmed by the heat of the lower housing. The warmed gas is supplied into heated gas supply device and heated by heater. The heated gas flows in lower cover and is emitted together with plasma gas from lower cover toward a processing object. Consequently, it is possible to perform cooling of the lower housing heated by electric discharge and perform heating of the processing object, and it is possible to reduce energy required for heating gas.
    Type: Grant
    Filed: August 11, 2016
    Date of Patent: April 5, 2022
    Assignee: FUJI CORPORATION
    Inventors: Takahiro Jindo, Toshiyuki Ikedo
  • Patent number: 11259396
    Abstract: A plasma generation system capable of more accurately measuring the actual temperature of a plasma gas applied to a target object. The plasma generation system includes: an emitting head configured to generate plasma gas by supplying power to electrodes provided in a reaction chamber to generate a plasma gas by converting a processing gas into plasma, and apply the generated plasma gas to a target object; and a temperature sensor configured to detect a temperature of the plasma gas and output a detection signal corresponding to the detected temperature. The temperature sensor is arranged at a position separated from an emission port of the emitting head from which the plasma gas is emitted. The emitting head is configured to be movable between the target object the temperature sensor.
    Type: Grant
    Filed: April 4, 2017
    Date of Patent: February 22, 2022
    Assignee: FUJI CORPORATION
    Inventors: Takahiro Jindo, Toshiyuki Ikedo
  • Patent number: 11195702
    Abstract: A plasma-generating device including: a pair of electrodes; a pair of holders configured to hold ends of the pair of electrodes in a protruding state; and a casing in which is formed a first recess and that is configured to combine with the pair of holders in a state with the ends of the pair of electrodes that protrude from the pair of holders inserted into the first recess, wherein the combined casing and the pair of holders contact each other only at an opposite side to a side between the ends of the pair of electrodes that project from the pair of holders.
    Type: Grant
    Filed: April 4, 2017
    Date of Patent: December 7, 2021
    Assignee: FUJI CORPORATION
    Inventors: Takahiro Jindo, Toshiyuki Ikedo
  • Publication number: 20210313155
    Abstract: In a plasma generator having a first supply port and a second supply port, in which the plasma generator includes a first supply device for supplying a first gas from the first supply port, and a second supply device connected to the first supply device so as to supply a second gas from the second supply port, a gas supply determination method includes a first supply step of causing the first supply device to start supplying the first gas in a state where the second supply device stops supplying the second gas, a first measurement step of measuring a flow rate of the gas supplied to the first supply port after the first supply step, and a first notification step of notifying a supply state of the first gas in the first supply port in accordance with a flow rate measurement result of the first measurement step.
    Type: Application
    Filed: August 28, 2018
    Publication date: October 7, 2021
    Applicant: FUJI CORPORATION
    Inventors: Shinji TAKIKAWA, Takahiro JINDO
  • Publication number: 20210276054
    Abstract: An object of the present invention is to provide a technique capable of removing oil regardless of a shape of a target object to which the oil is attached. Cutting oil is decomposed by irradiating the cutting oil with a plasma gas containing oxygen plasma. Oxygen radicals decompose a carbon element and a hydrogen element constituting the oil into carbon dioxide and water, respectively, to remove the oil. Therefore, paraffin and ester contained in the cutting oil can be decomposed by irradiating the cutting oil with the plasma gas containing oxygen plasma. Since the plasma gas can flow along a shape of a target object, the oil can be removed regardless of a shape of a portion of the target object to which the oil is attached.
    Type: Application
    Filed: August 2, 2018
    Publication date: September 9, 2021
    Applicant: FUJI CORPORATION
    Inventors: Takahiro JINDO, Takuya IWATA, Akihiro NIWA, Akihiro HIGASHIDA
  • Publication number: 20210183630
    Abstract: A plasma processing apparatus, for releasing plasma-converted gas from plasma head for performing process, detects the pressures of a gas prior to application of a voltage to electrodes of the plasma head, the gas being supplied from gas supply section to a plasma head, and allow initiation of process by the plasma processing apparatus based on the detected pressures.
    Type: Application
    Filed: May 23, 2018
    Publication date: June 17, 2021
    Applicant: FUJI CORPORATION
    Inventor: Takahiro JINDO
  • Publication number: 20210176852
    Abstract: A plasma generator capable of detecting whether a connector of a head is electrically connected to a power cable. When the connector of the plasma head is electrically connected to the cable harness, a signal current flows in a path from the controller to the ground via a photocoupler, a relay, a cable, a terminal, another terminal, and a first ground cable in response to a pulse signal outputted from the controller. Accordingly, the plasma generator is able to detect whether the connector of the head is electrically connected to the first power cable and the second power cable, based on whether the photocoupler detects a signal current.
    Type: Application
    Filed: May 16, 2017
    Publication date: June 10, 2021
    Applicant: FUJI CORPORATION
    Inventor: Takahiro JINDO
  • Publication number: 20210166919
    Abstract: A plasma generation device includes a plasma head configured to eject plasma gas that is plasmatized, a gas supply device configured to supply gas serving as the plasma gas to the plasma head, a pair of electrodes that is provided in the plasma head, the pair of electrodes being configured to perform discharging for a part of the gas supplied from the gas supply device to generate the plasma gas, a temperature sensor that is provided in the plasma head, the temperature sensor being configured to measure a temperature of the plasma head; and a control device, in which the control device executes a cooling process of cooling the plasma head by causing the gas supply device to continue supply of the gas until the temperature sensor measures a temperature equal to or less than a predetermined value after the discharging of the pair of electrodes is stopped.
    Type: Application
    Filed: August 28, 2018
    Publication date: June 3, 2021
    Applicant: FUJI CORPORATION
    Inventors: Shinji TAKIKAWA, Tomoko HIGASHIDA, Takahiro JINDO
  • Publication number: 20210151293
    Abstract: Atmospheric-pressure plasma generation device 10 of the present invention includes heat sinks 27 and 28. Flow paths are formed in the heat sinks, and cooling gas flows in the flow paths, thereby cooling lower housing 20 in which a reaction chamber is formed. Here, the gas used for cooling is warmed by the heat of the lower housing. The warmed gas is supplied into heated gas supply device 14 and heated by heater 112. The heated gas flows in lower cover 22 and is emitted together with plasma gas from lower cover 22 toward a processing object. Consequently, it is possible to perform cooling of the lower housing heated by electric discharge and perform heating of the processing object, and it is possible to reduce energy required for heating gas.
    Type: Application
    Filed: August 11, 2016
    Publication date: May 20, 2021
    Applicant: FUJI CORPORATION
    Inventors: Takahiro JINDO, Toshiyuki IKEDO
  • Publication number: 20210120657
    Abstract: The object of the present disclosure is to efficiently generate plasma. In the plasma device of the present disclosure, a dielectric barrier discharger and an arc discharger are included, but the arc discharger is provided downstream from the dielectric barrier discharger in a discharge space where a gas for generating plasma is supplied. Dielectric barrier discharge occurs at the dielectric barrier discharger, and arch discharge occurs at the arc discharger. As a result of the gas for generating plasma being activated in the dielectric barrier discharge, the aforementioned gas can be adequately converted to plasma in the arc discharger.
    Type: Application
    Filed: March 20, 2018
    Publication date: April 22, 2021
    Applicant: FUJI CORPORATION
    Inventor: Takahiro JINDO
  • Publication number: 20210111006
    Abstract: A plasma-generating device including: a pair of electrodes; a pair of holders configured to hold ends of the pair of electrodes in a protruding state; and a casing in which is formed a first recess and that is configured to combine with the pair of holders in a state with the ends of the pair of electrodes that protrude from the pair of holders inserted into the first recess, wherein the combined casing and the pair of holders contact each other only at an opposite side to a side between the ends of the pair of electrodes that project from the pair of holders.
    Type: Application
    Filed: April 4, 2017
    Publication date: April 15, 2021
    Applicant: FUJI CORPORATION
    Inventors: Takahiro JINDO, Toshiyuki IKEDO
  • Patent number: 10980101
    Abstract: An atmospheric pressure plasma generating device includes a nozzle block in which fourth gas passages from which plasma gas is emitted are formed, is covered by cover, and a through-hole is formed in the cover such that the leading end of the fourth gas passage is positioned on the inside. Heated gas is supplied inside the cover and is emitted from the through-hole of the cover, and plasma gas is emitted so as to penetrate the heated gas. By the plasma gas being surrounded by the heated gas in this manner, deactivation of the plasma gas is prevented. A distance between the leading end of the fourth gas passage and an opening of the through-hole at an outer wall of the cover is set from 0 to 2 mm in an emission direction of the plasma gas.
    Type: Grant
    Filed: June 2, 2015
    Date of Patent: April 13, 2021
    Assignee: FUJI CORPORATION
    Inventors: Akihiro Niwa, Takahiro Jindo
  • Patent number: 10950420
    Abstract: An atmospheric pressure plasma device including a plasma head; a gas tube configured to supply a gas to the plasma head; a flow rate controller configured to control a flow rate of the gas supplied to the gas tube; a pressure sensor arranged downstream of the flow rate controller and configured to detect a pressure in the gas tube; and a determining section configured to determine a state of the device based on how the pressure in the gas tube deviates from a standard value specified for each flow rate of the supplied gas. As a result, it is possible to determine the gas leakage of the atmospheric pressure plasma device. Further, it is possible to determine whether plasma is being generated in a favorable state.
    Type: Grant
    Filed: April 4, 2017
    Date of Patent: March 16, 2021
    Assignee: FUJI CORPORATION
    Inventors: Takahiro Jindo, Toshiyuki Ikedo, Akihiro Niwa
  • Publication number: 20210076480
    Abstract: A practical plasma processing machine is provided, in which attachment mechanism is provided for attaching plasma head to attachment section of a head moving device that moves the plasma head. Since the plasma head can be attached or detached, for example, it is easy to exchange it with a different type of plasma head, remove for maintenance, attaching after maintenance, or the like.
    Type: Application
    Filed: January 30, 2018
    Publication date: March 11, 2021
    Applicant: FUJI CORPORATION
    Inventors: Toshiyuki IKEDO, Takahiro JINDO