Patents by Inventor Takahiro Mashimo

Takahiro Mashimo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210132273
    Abstract: An optical member includes a transparent substrate containing at least one substance selected from glass, a glass ceramic, silicon, and sapphire, and having an infrared high-transmittance region in which an optical transmittance is 78% or more in a wavelength band of 700 nm to 1800 nm; and an optical interference film disposed on a main surface of the transparent substrate corresponding to the infrared high-transmittance region, wherein a transmittance of light, of the optical member, of at least one wavelength ?3 in the wavelength band of 700 nm to 1800 nm in a region of the optical member corresponding to the infrared high-transmittance region of the transparent substrate has a minimum value of 86.5% or more and has a difference between the minimum value and a maximum value of 9% or less in a range where an incidence angle is from 0 degrees to 60 degrees.
    Type: Application
    Filed: January 11, 2021
    Publication date: May 6, 2021
    Applicant: AGC Inc.
    Inventors: Hiroyuki YAMAMOTO, Takahiro MASHIMO, Takuji OYAMA, Shinya TAHARA, Tatsuo NAGASHIMA
  • Publication number: 20200239360
    Abstract: The present invention relate to a transparent substrate laminate (10) having a transparent substrate (12), an antireflection layer (14) and an antifouling layer (16) in this order, the antireflection layer (14) contains a low-refractive index layer (142) and a high-refractive index layer (144) laminating alternately, the antifouling layer (16) contains a fluorine-containing organic compound, and when washing with ethanol and washing with a fluorine solvent under specific conditions are carried out on the antifouling layer (16) in this order, the antifouling layer (16) satisfies a ratio (i)/(ii) being more than 1 in which (i) represents a fluorine amount after the washing with ethanol and (ii) represents a fluorine amount after the washing with the fluorine solvent, and in which the fluorine amount (F amount) is measured by using an X-ray fluorescence instrument (XRF).
    Type: Application
    Filed: April 15, 2020
    Publication date: July 30, 2020
    Applicant: AGC Inc.
    Inventors: Akihisa Minowa, Takahiro Mashimo, Shunji Wachi, Hitoshi Saiki
  • Patent number: 10501369
    Abstract: A translucent substrate includes a glass substrate containing at least one element selected from a group consisting of Bi, Ti and Sn; a coating layer formed on the glass substrate; and a transparent conductive film formed on the coating layer, wherein the coating layer is deposited by a dry depositing method.
    Type: Grant
    Filed: November 5, 2015
    Date of Patent: December 10, 2019
    Assignee: AGC Inc.
    Inventors: Takahiro Mashimo, Naoto Kihara, Kazunobu Maeshige, Teruo Fujiwara, Masahiro Kishi, Nobuhiro Nakamura, Mamoru Isobe
  • Publication number: 20180273424
    Abstract: A wavelength-selective transmissive glass article has light transmittance Tmore than 315 nm and 400 nm or less at a wavelength of more than 315 nm and 400 nm or less of 1% or more. In addition, the wavelength-selective transmissive glass article has light transmittance T315 nm or less at a wavelength of 315 nm or less of 60% or less.
    Type: Application
    Filed: May 30, 2018
    Publication date: September 27, 2018
    Applicants: ASAHI GLASS COMPANY, LIMITED, TSUBOTA LABORATORY, INC.
    Inventors: Hideyuki Hirakoso, Takahiro Mashimo, Kensuke Nagai, Kazuo Tsubota, Toshihide Kurihara, Hidemasa Torii
  • Publication number: 20160060162
    Abstract: A translucent substrate includes a glass substrate containing at least one element selected from a group consisting of Bi, Ti and Sn; a coating layer formed on the glass substrate; and a transparent conductive film formed on the coating layer, wherein the coating layer is deposited by a dry depositing method.
    Type: Application
    Filed: November 5, 2015
    Publication date: March 3, 2016
    Applicant: Asahi Glass Company, Limited
    Inventors: Takahiro MASHIMO, Naoto KIHARA, Kazunobu MAESHIGE, Teruo FUJIWARA, Masahiro KISHI, Nobuhiro NAKAMURA, Mamoru ISOBE
  • Publication number: 20150138638
    Abstract: An optical element includes an optical member made of a material that transmits light; a high refractive index layer and a low refractive index layer that are stacked on a front surface of the optical member; and a surface protection layer that is formed on an upper most layer among the high refractive index layer and the low refractive index layer, the surface protection layer being made of a material including one of a mixed oxide of Si and Sn, a mixed oxide of Si and Zr, and a mixed oxide of Si and Al, and the refraction index of the surface protection layer being less than or equal to the refraction index of the high refractive index layer and greater than or equal to the refraction index of the low refractive index layer.
    Type: Application
    Filed: December 5, 2014
    Publication date: May 21, 2015
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Takahiro Mashimo, Susumu Suzuki, Mitsuo Osawa, Koji Miyasaka, Takaaki Murakami
  • Publication number: 20110212336
    Abstract: To provide an electroconductive laminate which has an excellent electrical conductivity (electromagnetic wave shielding properties) and a high visible light transmittance and is excellent in productivity, and a protective plate for a plasma display which has excellent electromagnetic wave shielding properties and a broad transmission/reflection band and is excellent in productivity.
    Type: Application
    Filed: May 9, 2011
    Publication date: September 1, 2011
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Yasushi KAWAMOTO, Eiji Shidoji, Kazunobu Maeshige, Takahiro Mashimo
  • Patent number: 7842168
    Abstract: The invention provides a method for producing a silicon oxide film, whereby a film having uniform optical constants such as refractive index, absorption coefficient, etc. can be formed continuously at a high deposition rate. A method for producing a silicon oxide film, which comprises depositing a silicon oxide film on a substrate by carrying out AC sputtering by using a sputtering target comprising silicon carbide and silicon with a ratio in number of atoms of C to Si being from 0.5 to 0.95, in an atmosphere containing an oxidizing gas, with an alternating current having a frequency of from 1 to 1,000 kHz.
    Type: Grant
    Filed: October 25, 2005
    Date of Patent: November 30, 2010
    Assignee: Asahi Glass Company, Limited
    Inventors: Toru Ikeda, Takahiro Mashimo, Eiji Shidoji, Toshihisa Kamiyama, Yoshihito Katayama
  • Publication number: 20060032739
    Abstract: The invention provides a method for producing a silicon oxide film, whereby a film having uniform optical constants such as refractive index, absorption coefficient, etc. can be formed continuously at a high deposition rate. A method for producing a silicon oxide film, which comprises depositing a silicon oxide film on a substrate by carrying out AC sputtering by using a sputtering target comprising silicon carbide and silicon with a ratio in number of atoms of C to Si being from 0.5 to 0.95, in an atmosphere containing an oxidizing gas, with an alternating current having a frequency of from 1 to 1,000 kHz.
    Type: Application
    Filed: October 25, 2005
    Publication date: February 16, 2006
    Applicant: Asahi Glass Company, Limited
    Inventors: Toru Ikeda, Takahiro Mashimo, Eiji Shidoji, Toshihisa Kamiyama, Yoshihito Katayama
  • Publication number: 20050121311
    Abstract: A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.
    Type: Application
    Filed: January 24, 2005
    Publication date: June 9, 2005
    Applicant: Asahi Glass Company, Limited
    Inventors: Eiji Shidoji, Eiichi Ando, Tomohiro Yamada, Takahiro Mashimo
  • Patent number: 6863785
    Abstract: A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.
    Type: Grant
    Filed: August 7, 2003
    Date of Patent: March 8, 2005
    Assignee: Asahi Glass Company, Limited
    Inventors: Eiji Shidoji, Eiichi Ando, Tomohiro Yamada, Takahiro Mashimo
  • Publication number: 20040026240
    Abstract: A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.
    Type: Application
    Filed: August 7, 2003
    Publication date: February 12, 2004
    Applicant: ASAHI GLASS COMPANY LIMITED
    Inventors: Eiji Shidoji, Eiichi Ando, Tomohiro Yamada, Takahiro Mashimo