Abstract: A glass laminate, in which an inorganic laminated film having a total thickness of 90 to 500 nm is laminated on a surface of a glass plate with an adhesive film including a resin film interposed therebetween, a carbon-containing film thinner than the inorganic laminated film is attached to a surface of the inorganic laminated film, a storage elastic modulus of an outermost surface on the inorganic laminated film side that is measured by a nanoindentation method using a flat punch indenter under conditions of 1 Hz and 28° C. is 50 MPa to 30 GPa, and a loss coefficient of the outermost surface on the inorganic laminated film side that is measured by the nanoindentation method using the flat punch indenter under conditions of 1 Hz and 28° C. is 0.005 to 0.14.

Abstract: To appropriately transmit far-infrared rays while ensuring design. A far-infrared ray transmission member (20) includes a base material (30) configured to transmit far-infrared rays, and a functional film (31) formed on the base material (30). Dispersion of reflectances with respect to pieces of light at a wavelength of 360 nm to 830 nm in increments of 1 nm is equal to or smaller than 30, a reflectance with respect to visible light defined by JIS R3106 is equal to or lower than 25%, and an average transmittance with respect to light at a wavelength of 8 ?m to 12 ?m is equal to or higher than 50%.

Abstract: To appropriately suppress reflection of far-infrared rays, and appropriately form an antireflection film. A far-infrared ray transmission member (20) includes a base material (30) that transmits far-infrared rays, and a functional film (32) that is formed on the base material (30) and includes a low refractive index layer (34) containing oxide as a principal component and having a refractive index equal to or smaller than 1.5 with respect to light at a wavelength of 10 ?m. The low refractive index layer (34) contains MgO as a principal component, and a content of MgO is equal to or larger than 50 mass % and equal to or smaller than 100 mass % with respect to the entire low refractive index layer (34).

Abstract: The present invention relates to an antiviral material including a Cu-M-O compound, in which the Cu at least includes a monovalent-state Cu and the M is at least one element selected from the group consisting of B, Al, Sc, Ti, Co, Cr, Ni, Ga, Y, Zr, In, Rh, and a lanthanoid.

Abstract: An optical filter includes a substrate and a dielectric multilayer film laid as an outermost layer on at least one major surface of the substrate. The dielectric multilayer film includes a low-refractive index film and a high-refractive index film provided alternately. At least one film selected from the group consisting of the low-refractive index film and the high-refractive index film satisfies the following optical characteristics (i-1) and (i-2A): (i-1) an extinction coefficient k600 at a wavelength of 600 nm is 0.12 or larger; and (i-2A) a minimum extinction coefficient k1530-1570MIN in a wavelength range of 1530 to 1570 nm is 0.01 or smaller; and the optical filter satisfies the following optical characteristic (ii-1A): (ii-1A) light in a wavelength range of 400 to 680 nm is blocked and light in the wavelength range of 1530 to 1570 nm is transmitted.

Abstract: An antifouling layer-attached glass substrate includes a glass substrate having a pair of main surfaces facing each other, and an antifouling layer formed on or above at least one main surface of the glass substrate. At the time of measuring an absorbance inside the antifouling layer-attached glass substrate by a Fourier transform infrared spectrophotometer according to ATR method (Attenuated Total Reflection) from a surface on a side where the antifouling layer is formed, in the case where an absorbance value at 3,955 cm?1 is set to 0.10, a value (H2O absorbance) obtained by subtracting, as a base, the absorbance value at 3,955 cm?1 from a peak value of an absorbance peak which appears around 3,400 cm?1 is 0.010 or more.

Abstract: An optical member includes a transparent substrate containing at least one substance selected from glass, a glass ceramic, silicon, and sapphire, and having an infrared high-transmittance region in which an optical transmittance is 78% or more in a wavelength band of 700 nm to 1800 nm; and an optical interference film disposed on a main surface of the transparent substrate corresponding to the infrared high-transmittance region, wherein a transmittance of light, of the optical member, of at least one wavelength ?3 in the wavelength band of 700 nm to 1800 nm in a region of the optical member corresponding to the infrared high-transmittance region of the transparent substrate has a minimum value of 86.5% or more and has a difference between the minimum value and a maximum value of 9% or less in a range where an incidence angle is from 0 degrees to 60 degrees.

Abstract: The present invention relate to a transparent substrate laminate (10) having a transparent substrate (12), an antireflection layer (14) and an antifouling layer (16) in this order, the antireflection layer (14) contains a low-refractive index layer (142) and a high-refractive index layer (144) laminating alternately, the antifouling layer (16) contains a fluorine-containing organic compound, and when washing with ethanol and washing with a fluorine solvent under specific conditions are carried out on the antifouling layer (16) in this order, the antifouling layer (16) satisfies a ratio (i)/(ii) being more than 1 in which (i) represents a fluorine amount after the washing with ethanol and (ii) represents a fluorine amount after the washing with the fluorine solvent, and in which the fluorine amount (F amount) is measured by using an X-ray fluorescence instrument (XRF).

Abstract: A translucent substrate includes a glass substrate containing at least one element selected from a group consisting of Bi, Ti and Sn; a coating layer formed on the glass substrate; and a transparent conductive film formed on the coating layer, wherein the coating layer is deposited by a dry depositing method.

Abstract: A wavelength-selective transmissive glass article has light transmittance Tmore than 315 nm and 400 nm or less at a wavelength of more than 315 nm and 400 nm or less of 1% or more. In addition, the wavelength-selective transmissive glass article has light transmittance T315 nm or less at a wavelength of 315 nm or less of 60% or less.

Abstract: A translucent substrate includes a glass substrate containing at least one element selected from a group consisting of Bi, Ti and Sn; a coating layer formed on the glass substrate; and a transparent conductive film formed on the coating layer, wherein the coating layer is deposited by a dry depositing method.

Abstract: An optical element includes an optical member made of a material that transmits light; a high refractive index layer and a low refractive index layer that are stacked on a front surface of the optical member; and a surface protection layer that is formed on an upper most layer among the high refractive index layer and the low refractive index layer, the surface protection layer being made of a material including one of a mixed oxide of Si and Sn, a mixed oxide of Si and Zr, and a mixed oxide of Si and Al, and the refraction index of the surface protection layer being less than or equal to the refraction index of the high refractive index layer and greater than or equal to the refraction index of the low refractive index layer.

Abstract: To provide an electroconductive laminate which has an excellent electrical conductivity (electromagnetic wave shielding properties) and a high visible light transmittance and is excellent in productivity, and a protective plate for a plasma display which has excellent electromagnetic wave shielding properties and a broad transmission/reflection band and is excellent in productivity.

Abstract: The invention provides a method for producing a silicon oxide film, whereby a film having uniform optical constants such as refractive index, absorption coefficient, etc. can be formed continuously at a high deposition rate. A method for producing a silicon oxide film, which comprises depositing a silicon oxide film on a substrate by carrying out AC sputtering by using a sputtering target comprising silicon carbide and silicon with a ratio in number of atoms of C to Si being from 0.5 to 0.95, in an atmosphere containing an oxidizing gas, with an alternating current having a frequency of from 1 to 1,000 kHz.

Abstract: The invention provides a method for producing a silicon oxide film, whereby a film having uniform optical constants such as refractive index, absorption coefficient, etc. can be formed continuously at a high deposition rate. A method for producing a silicon oxide film, which comprises depositing a silicon oxide film on a substrate by carrying out AC sputtering by using a sputtering target comprising silicon carbide and silicon with a ratio in number of atoms of C to Si being from 0.5 to 0.95, in an atmosphere containing an oxidizing gas, with an alternating current having a frequency of from 1 to 1,000 kHz.

Abstract: A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.

Abstract: A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.

Abstract: A sputtering apparatus and a sputter film deposition method, which includes a conventional magnetron and an AC magnetron for deposition of a low refractive index film, and a conventional magnetron and an AC magnetron for deposition of a high refractive index film, performs film deposition by each of the AC magnetrons until having achieved 90% of a designed film thickness, and then performs the film deposition only by each of the conventional magnetrons, and which can control the film thickness with high precision and have excellent productivity.