Patents by Inventor Takahiro Omura

Takahiro Omura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240075874
    Abstract: A data processing device for performing suitable feedback with regard to a pointing gesture of a vehicle occupant is provided. The occupant state recognition unit recognizes motion of an occupant of the vehicle pointing to outside the vehicle. The peripheral conditions acquisition unit acquires the peripheral circumstances around the vehicle. The target recognition unit recognizes a target pointed at by the occupant based on recognition results obtained by the occupant state recognition unit and recognition results obtained by the peripheral conditions acquisition unit. The light emitting unit has a long shape and is installed above or below a windshield of the vehicle over a vehicle body width direction. The light emission control unit controls, in two stages, a luminescence mode for a portion of the light emitting unit corresponding to a direction pointed at by the occupant and/or a direction in which the target is located.
    Type: Application
    Filed: August 29, 2023
    Publication date: March 7, 2024
    Applicant: Faurecia Clarion Electronics Co. Ltd.
    Inventors: Takahiro UEMURA, Tatsuya OMURA, Yuki MATSUSHITA, Keiichiro YOSHIHARA
  • Patent number: 11923116
    Abstract: Disclosed is a grain-oriented electrical steel sheet with extremely low iron loss by means of a magnetic domain refining technique. In a grain-oriented electrical steel sheet having a plurality of magnetic domains refined via a local strain introduction portion, when a direct-current external magnetic field is applied to the steel sheet in a rolling direction, for a magnetic flux leaked from the local strain introduction portion at a position 1.0 mm away from a surface of the steel sheet at a side of the local strain introduction portion, a value obtained by dividing an intensity level of a total leakage magnetic flux by an intensity level of a magnetic flux leaked due to causes other than strain is more than 1.2.
    Type: Grant
    Filed: November 21, 2019
    Date of Patent: March 5, 2024
    Assignee: JFE STEEL CORPORATION
    Inventors: Takeshi Omura, Yoshihisa Ichihara, Kunihiro Senda, Takahiro Koshihara
  • Patent number: 11914248
    Abstract: An object of the invention is to provide a photo-alignment copolymer which makes it possible to produce a photo-alignment film having excellent solvent resistance and liquid crystal aligning properties, and a photo-alignment film and an optical laminate produced using the photo-alignment copolymer. A photo-alignment copolymer of the invention is a photo-alignment copolymer having a repeating unit A including a photo-alignment group represented by Formula (A) and a repeating unit B including a crosslinkable group represented by Formula (B).
    Type: Grant
    Filed: November 8, 2020
    Date of Patent: February 27, 2024
    Assignee: FUJIFILM Corporation
    Inventors: Yutaka Nozoe, Takashi Iizumi, Kazushige Nakagawa, Takahiro Kato, Miho Asahi, Hirofumi Omura, Yuki Hirai
  • Publication number: 20200407672
    Abstract: A scaffolding material for cell culture, which has a dispersion component ?d of the surface free energy of 24.5 mJ/m2 or more and less than 45.0 mJ/m2, and a dipole component ?p of the surface free energy of 1.0 mJ/m2 or more and less than 20.0 mJ/m2. According to the scaffolding material for cell culture, the scaffolding material can have suitable hydrophilicity and strength, high fixation of cells after seeding, and highly efficient cell proliferation.
    Type: Application
    Filed: July 2, 2020
    Publication date: December 31, 2020
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Satoshi HANEDA, Yuriko MANABE, Ryoma ISHII, Hiroki IGUCHI, Hiroshi YAMAUCHI, Takahiro OMURA
  • Publication number: 20200399576
    Abstract: A scaffolding material for culturing a cell, the scaffolding material for culturing a cell containing a synthetic resin, and having a nitrogen content of the synthetic resin of 0.1% by mass or more and 10% by mass or less. According to the scaffolding material for cell culture, the scaffolding material can have suitable hydrophilicity and strength, high fixation of cells after seeding, and highly efficient cell proliferation.
    Type: Application
    Filed: July 2, 2020
    Publication date: December 24, 2020
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Satoshi HANEDA, Yuriko MANABE, Ryoma ISHII, Hiroki IGUCHI, Hiroshi YAMAUCHI, Takahiro OMURA
  • Publication number: 20200370009
    Abstract: A scaffolding material for culturing a stem cell, which contains a synthetic resin, and has a nitrogen content of the synthetic resin of 0.1% by mass or more and 10% by mass or less. According to the scaffolding material for stem cell culture, the scaffolding material can have suitable hydrophilicity and strength, high fixation of stem cells after seeding, and highly efficient cell proliferation.
    Type: Application
    Filed: December 27, 2018
    Publication date: November 26, 2020
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Satoshi HANEDA, Yuriko MANABE, Ryoma ISHII, Hiroki IGUCHI, Hiroshi YAMAUCHI, Takahiro OMURA
  • Publication number: 20200362289
    Abstract: A scaffolding material for stem cell culture, which has a dispersion component ?d of the surface free energy of 24.5 or more and less than 45.0, and a dipole component ?p of the surface free energy of 1 or more and less than 20.0. According to the scaffolding material for stem cell culture, the scaffolding material can have suitable hydrophilicity and strength, high fixation of stem cells after seeding, and highly efficient cell proliferation.
    Type: Application
    Filed: December 27, 2018
    Publication date: November 19, 2020
    Applicant: SEKISUI CHEMICAL CO., LTD.
    Inventors: Satoshi HANEDA, Yuriko MANABE, Ryoma ISHII, Hiroki IGUCHI, Hiroshi YAMAUCHI, Takahiro OMURA
  • Patent number: 6583221
    Abstract: This invention is related to a vinyl chloride resin as obtainable by graft-copolymerizing an acrylic copolymer (a) having a mean particle diameter of 60 to 250 nm with a vinyl monomer (b) predominantly composed of vinyl chloride, said acrylic copolymer (a) being obtainable by graft-copolymerizing 40 to 90 weight % of a copolymer (a−1) with 10 to 60 weight % of a mixture monomer (a−2), said copolymer (a−1) being composed of 100 weight parts of a radical-polymerizable monomer which gives a homopolymer having a glass transition point of not lower than −140° C. but lower than −60° C. and 0.1 to 1 weight part of a polyfunctional monomer, and said mixture monomer (a−2) comprising 100 weight parts of a radical-polymerizable monomer predominantly comprised of a (meth) acrylate which gives a homopolymer having a glass transition point of not lower than −55° C. but lower than −10° C. and 1.5 to 10 weight parts of a polyfunctional monomer.
    Type: Grant
    Filed: July 13, 2001
    Date of Patent: June 24, 2003
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Takahiro Omura, Noriki Fujii