Patents by Inventor Takahiro Tetsuka

Takahiro Tetsuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9355875
    Abstract: Liquid processing units 2 each for performing a liquid process on a substrate are arranged horizontally side by side, a gas exhaust pipe 3 for exhausting an atmosphere within the liquid processing units is provided under the liquid processing units 2 to be extended along an arrangement of the liquid processing units 2, and a flow control member group 402 is disposed under the gas exhaust pipe 3. Liquid supply main pipe 5 and liquid drain main pipe 6 are provided under the flow control member group 402 to be extended along the arrangement of the liquid processing units 2. Liquid supply branch pipes are branched from the liquid supply main pipe 5 and connected with the liquid processing unit 2 via the flow control member group 402, and liquid drain branch pipes are branched from the liquid drain main pipe 6 and connected with the liquid processing unit 2.
    Type: Grant
    Filed: December 27, 2011
    Date of Patent: May 31, 2016
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Teruaki Konishi, Takahiro Tetsuka
  • Publication number: 20120160353
    Abstract: A liquid processing apparatus includes at least one liquid processing unit for performing a liquid process on a substrate with a processing solution; supply pipes for supplying the processing solution into the at least one liquid processing unit; a housing accommodating a flow control member group provided on the supply pipes; and an upstream port and a downstream port detachably connected to the supply pipes located at an upstream side of the flow control member group and a downstream side of the flow control member group, respectably. Here, one end of the supply pipes is connected with the liquid processing unit and the other end thereof is extended to below the liquid processing unit and both the upstream and downstream ports are provided in the housing facing a main maintenance region located at a lateral side of the liquid processing apparatus.
    Type: Application
    Filed: December 28, 2011
    Publication date: June 28, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Teruaki Konishi, Takahiro Tetsuka
  • Publication number: 20120160279
    Abstract: Liquid processing units 2 each for performing a liquid process on a substrate are arranged horizontally side by side, a gas exhaust pipe 3 for exhausting an atmosphere within the liquid processing units is provided under the liquid processing units 2 to be extended along an arrangement of the liquid processing units 2, and a flow control member group 402 is disposed under the gas exhaust pipe 3. Liquid supply main pipe 5 and liquid drain main pipe 6 are provided under the flow control member group 402 to be extended along the arrangement of the liquid processing units 2. Liquid supply branch pipes are branched from the liquid supply main pipe 5 and connected with the liquid processing unit 2 via the flow control member group 402, and liquid drain branch pipes are branched from the liquid drain main pipe 6 and connected with the liquid processing unit 2.
    Type: Application
    Filed: December 27, 2011
    Publication date: June 28, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Teruaki Konishi, Takahiro Tetsuka