Patents by Inventor Takahiro Yajimaa

Takahiro Yajimaa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for forming a deposited film on a substrate
    Patent number: 6436797
    Abstract: A film-forming apparatus for forming a non-single crystalline silicon series semiconductor film on a substrate in a film-forming space provided in a vacuum chamber using a very high frequency power supplied through a high frequency power supply means comprising a bar-like shaped electrode, wherein said bar-like shaped electrode is arranged such that the longitudinal direction thereof intersects a direction for said substrate to be moved, and a length of said film-forming space relative to the direction for said substrate to be moved is in a range of from {fraction (1/16)} to ½ of a wavelength of said very high frequency power supplied in said film-forming space. A film-forming method for forming a non-single crystalline silicon series semiconductor film on a substrate using said film-forming apparatus.
    Type: Grant
    Filed: May 26, 2000
    Date of Patent: August 20, 2002
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yasushi Fujioka, Shotaro Okabe, Masahiro Kanai, Akira Sakai, Tadashi Sawayama, Yuzo Koda, Takahiro Yajimaa