Abstract: The apparatus according to the present invention is an apparatus for measuring width direction end position of a strip which passes through an enclosed space surrounded by a plurality of surfaces. The apparatus includes an antenna section which emits electromagnetic waves toward the width direction end and receives the electromagnetic waves reflected by the width direction end; a signal processing section for determining a position of the width direction end using the reflected electromagnetic waves; and a scattering plate for scattering electromagnetic waves which are incident thereon, wherein the antenna section is installed on a first surface which faces the width direction end a position of which is to be determined and the scattering plate is installed on a second surface which faces the first surface.

Abstract: A film thickness measuring device is provided with a light source, a spectroscopic sensor, a processor, and a storage unit, and configured in such a manner that light from the light source vertically enters a plane to be measured provided with a film and the light reflected by the plane to be measured enters the spectroscopic sensor. The storage unit stores theoretical values of reflectivity distributions of respective film thicknesses and theoretical values of color characteristic variables of the respective film thicknesses. The processor finds the thickness of the film of the plane to be measured from the reflectivity distribution measured by the spectroscopic sensor by using the theoretical values of the reflectivity distributions of the respective film thicknesses or the theoretical values of the color characteristic variables of the respective film thicknesses stored in the storage unit.

Abstract: A film thickness measuring device is provided with a light source, a spectroscopic sensor, a processor, and a storage unit, and configured in such a manner that light from the light source vertically enters a plane to be measured provided with a film and the light reflected by the plane to be measured enters the spectroscopic sensor. The storage unit stores theoretical values of reflectivity distributions of respective film thicknesses and theoretical values of color characteristic variables of the respective film thicknesses. The processor finds the thickness of the film of the plane to be measured from the reflectivity distribution measured by the spectroscopic sensor by using the theoretical values of the reflectivity distributions of the respective film thicknesses or the theoretical values of the color characteristic variables of the respective film thicknesses stored in the storage unit.