Abstract: A blocking device for mounting within a space defined within a hollow structure includes a holder and an expandable member. The holder is adapted to be mounted within the space. The expandable member is supported on the holder and is expandable by heat to form a foam member in order to block or substantially close the space. The holder includes a holder plate extending substantially perpendicular to the longitudinal axis of the space and supporting at least one side of the expandable member. The expandable member includes a constriction absorbing portion that is deformed so as to absorb potential constriction of the expandable member at the beginning of the expansion process of the expandable member.

Abstract: A method for correcting pattern data is provided which is capable of making a proper correction to data of a pattern having a complicated layout.

Abstract: A semiconductor device includes a substrate, a circuit pattern formed on the substrate, and a plurality of dummy patterns formed on the substrate in addition to the circuit pattern, wherein the plurality of dummy patterns include a plurality of marker dummy patterns in an array thereof, the marker dummy patterns being distinguishable from other dummy patterns and are distributed irregularly in the array of the dummy patterns.

Abstract: A pattern image comparison method is provided which comprises a first input step of inputting a first pattern image based on design data for a reticle mask or a semiconductor device; a second input step of inputting a second pattern image of the reticle mask or semiconductor device manufactured based on the design data; a calculation step of calculating at least one parameter of parameters including a part or all of area, outer periphery, barycenter, and diagonal line of the first pattern image and the second pattern image; and an output step of outputting a result of comparison of a pattern on the reticle mask or semiconductor device and a pattern of the design data based on the calculated parameters of the first and second pattern images.

Abstract: A method for correcting pattern data is provided which is capable of making a proper correction to data of a pattern having a complicated layout.

Abstract: A blocking device for mounting within a space defined within a hollow structure includes a holder and an expandable member. The holder is adapted to be mounted within the space. The expandable member is supported on the holder and is expandable by heat to form a foam member in order to block or substantially close the space. The holder includes a holder plate extending substantially perpendicular to the longitudinal axis of the space and supporting at least one side of the expandable member. The expandable member includes a constriction absorbing portion that is deformed so as to absorb potential constriction of the expandable member at the beginning of the expansion process of the expandable member.

Abstract: In the exposure method which carries out optical proximity correction processing for exposure data having a plurality of exposure patterns and exposes a sample in accordance with such corrected exposure data, the exposure patterns to be corrected are converted, in the optical proximity correction processing, into a minus objective pattern and a minus pattern to be deleted from the minus objective pattern, to form corrected exposure data. And, the minus pattern is deleted from the minus objective pattern of the corrected exposure data to bitmap a corrected exposure pattern, to expose a sample in accordance with such bitmapped corrected exposure pattern.

Abstract: A semiconductor device includes a substrate, a circuit pattern formed on the substrate, and a plurality of dummy patterns formed on the substrate in addition to the circuit pattern, wherein the plurality of dummy patterns include a plurality of marker dummy patterns in an array thereof, the marker dummy patterns being distinguishable from other dummy patterns and are distributed irregularly in the array of the dummy patterns.

Abstract: A pattern image comparison method is provided which comprises a first input step of inputting a first pattern image based on design data for a reticle mask or a semiconductor device; a second input step of inputting a second pattern image of the reticle mask or semiconductor device manufactured based on the design data; a calculation step of calculating at least one parameter of parameters including a part or all of area, outer periphery, barycenter, and diagonal line of the first pattern image and the second pattern image; and an output step of outputting a result of comparison of a pattern on the reticle mask or semiconductor device and a pattern of the design data based on the calculated parameters of the first and second pattern images.

Abstract: In the exposure method which carries out optical proximity correction processing for exposure data having a plurality of exposure patterns and exposes a sample in accordance with such corrected exposure data, the exposure patterns to be corrected are converted, in the optical proximity correction processing, into a minus objective pattern and a minus pattern to be deleted from the minus objective pattern, to form corrected exposure data. And, the minus pattern is deleted from the minus objective pattern of the corrected exposure data to bitmap a corrected exposure pattern, to expose a sample in accordance with such bitmapped corrected exposure pattern.

Abstract: A flexible screw for conveyors, which is made of a flexible rod and a polymer-coated cord helically wound on the rod, the cord being made of a core and a polymer layer formed on the core, and the core being a fiber bundle having a specific amount of buckling of not more than 0.3%. When the screw is used for transporting containers, it can adapt itself to a drastic change in the surrounding temperature and can endure a great tension caused by the transport of heavy containers, since winding pitch of the cord is not easily widened and the disturbance of the pitch can be prevented.

Abstract: A tubular guide body provided with a longitudinal slit portion has a flexible screw rotatably incorporated. A guiding portion of an object to be transported is brought into contact with the flexible screw through the slit portion. The flexible screw is rotated to exert forcing pressure upon the guiding portion of the object which is in contact with the flexible screw, thereby achieving the conveyance of the object in the longitudinal direction of the tubular guide body.