Abstract: There is provided an antioxidant agent capable of preventing scale from being produced on the surface of a heated metallic starting material more effectively than the conventional antioxidant agent. The antioxidant agent according to the present invention contains a plurality of glass frits having different softening points and an inorganic compound having a melting point not higher than 600° C. The inorganic compound mainly softens in the low-temperature range of about 600° C. The plurality of glass frits mainly soften in the low-temperature range of about 600 to 1300° C. Therefore, the antioxidant agent covers the surface of metallic starting material in a broad temperature range, oxidizes the surface of metallic starting material, and prevents the production of scale.

Abstract: A microstructure includes a substrate, a fixed supporting portion fixed to the substrate, a first movable portion, a second movable portion enhancing the rigidity of the first movable portion, and an elastic supporting portion elastically interconnecting the first movable portion and the fixed supporting portion. The second movable portion is secured to the first movable portion with a gap interposed therebetween and in such a manner as to cover the elastic supporting portion and the fixed supporting portion. The first movable portion and the second movable portion are elastically supported by the elastic supporting portion in such a manner as to be displaceable together relative to the fixed supporting portion.

Abstract: A sheath apparatus includes, a plurality of node rings configured to be tilted with respect to each other, each node ring defining a substantially cylindrical wall and having at least one hole passing through said cylindrical wall, the plurality of node rings being arranged next to each other along a linear axis such that consecutive node rings contact each other at a contact plane; a manipulating wire going through the holes in said stacked node rings; and a position restoring component configured to restore said stacked node rings from a tilted position to an original position, wherein said position restoring component is located inside or outside of the stacked node rings.

Abstract: There is provided an antioxidant agent excellent in anti-dripping property and anti-peeling property. The antioxidant agent in accordance with the present invention contains a plurality of glass frits having different softening points, potter's clay, and bentonite and/or sepiolite. On account of the potter's clay, the antioxidant agent applied to the surface of a metallic starting material is less liable to drip down. Further, on account of the bentonite and/or sepiolite, the antioxidant agent is less liable to peel off the surface of the metallic starting material.

Abstract: A method of manufacturing a structure includes a first step of forming, on a monocrystal silicon substrate having a (100) surface as a principal surface, a basic etching mask corresponding to a target shape and having at least a first structure with a projecting corner and a second structure adjoining the first structure with an opening intervening therebetween, and a correction etching mask extending from the projecting corner of an etching mask of the first structure and connected to an etching mask of the second structure, and a second step of performing anisotropic etching of the monocrystal silicon substrate having the basic etching mask and the correction etching mask to form the target shape.

Abstract: An electrostatic charged particle beam lens includes an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface. When an opening cross section is defined as a cross section of the through-hole taken along a plane perpendicular to the normal line and a representative diameter is defined as a diameter of a circle obtained by performing regression analysis of the opening cross section, a representative diameter of the opening cross section in a first region that is on the first surface side and a representative diameter of the opening cross section in a second region that is on the second surface side are each larger than a representative diameter of the opening cross section in a third region that is a region in the electrode disposed between the first surface and the second surface.

Abstract: There is provided a method for manufacturing a charged particle beam lens having a bonded electrode obtained by bonding at least a first conductive substrate having a first through-hole and a second conductive substrate having a second through-hole. The above method includes: forming the first through-hole in the first conductive substrate; forming the second through-hole in the second conductive substrate; and bonding the first conductive substrate and the second conductive substrate so that the first through-hole and the second through-hole communicate with each other.

Abstract: An electrostatic charged particle beam lens includes an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface. A circularity in a first region that is on the first surface side and a circularity in a second region that is on the second surface side are each better than a circularity in a third region that is a region in the electrode disposed between the first surface and the second surface.

Abstract: An electrostatic charged particle beam lens includes an electrode including a flat plate having a first surface having a normal line extending in a direction of an optical axis and a second surface opposite to the first surface, the electrode having a through-hole extending from the first surface to the second surface. When an opening cross section is defined as a cross section of the through-hole taken along a plane perpendicular to the normal line and a representative diameter is defined as a diameter of a circle obtained by performing regression analysis of the opening cross section, a representative diameter of the opening cross section in a first region that is on the first surface side and a representative diameter of the opening cross section in a second region that is on the second surface side are smaller than a representative diameter of the opening cross section in a third region that is a region in the electrode disposed between the first surface and the second surface.

Abstract: In a charged particle beam lens according to the present invention, the orientations of through-holes formed in electrodes and precision of forming the through-holes are determined in accordance with the degree of influences of the surfaces of the electrodes on the aberration of the lens.

Abstract: There is provided an antioxidant agent excellent in anti-dripping property and anti-peeling property. The antioxidant agent in accordance with the present invention contains a plurality of glass frits having different softening points, potter's clay, and bentonite and/or sepiolite. On account of the potter's clay, the antioxidant agent applied to the surface of a metallic starting material is less liable to drip down. Further, on account of the bentonite and/or sepiolite, the antioxidant agent is less liable to peel off the surface of the metallic starting material.

Abstract: A method of manufacturing an oscillator device having first and second oscillators being driven at first and second driving resonance frequencies gf1 and gf2, the method including a first step for processing the two oscillators, wherein, when the two oscillators are going to be processed as oscillators having first and second resonance frequencies different from the two driving resonance frequencies with a certain dispersion range, the two oscillators are so processed that the first and second resonance frequencies different from the two driving resonance frequencies become equal to first and second resonance frequencies f1 and f2, respectively, which are included in adjustable resonance frequency ranges, respectively, and a second step for adjusting the first and second resonance frequencies f1 and f2 so that they become equal to the first and second driving resonance frequencies gf1 and gf2, respectively.

Abstract: There is provided an antioxidant agent capable of preventing scale from being produced on the surface of a heated metallic starting material more effectively than the conventional antioxidant agent. The antioxidant agent according to the present invention contains a plurality of glass frits having different softening points and an inorganic compound having a melting point not higher than 600° C. The inorganic compound mainly softens in the low-temperature range of about 600° C. The plurality of glass frits mainly soften in the low-temperature range of about 600 to 1300° C. Therefore, the antioxidant agent covers the surface of metallic starting material in a broad temperature range, oxidizes the surface of metallic starting material, and prevents the production of scale.

Abstract: A microstructural body includes a substrate such as an electrode substrate, a support portion, one post that fixes the support portion to the substrate, a frame-shaped movable portion provided around outer periphery of the support portion, and an elastic support portion that elastically connects the movable portion and the support portion. The elastic support portion supports the frame-shaped movable portion such that the movable portion is movable relative to the support portion. The elastic support portion includes torsion springs and an elastically deformable connecting portion.

Abstract: In a fabrication method of fabricating a structure, a basic etching mask corresponding a target shape with a convex corner, and a correction etching mask with a first portion, a second portion and an opening portion are formed on a single-crystal silicon substrate, and the silicon substrate with the basic etching mask and the correction etching mask formed thereon is subjected to an anisotropic etching to form the silicon substrate having the target shape. The first portion extends in a <110> direction, respective ends of the first portion are connected to the basic etching mask. The second portion is connected to a side of the first portion extending in the <110> direction.

Abstract: A silicon processing method includes: forming a mask pattern on a principal plane of a single-crystal silicon substrate; and applying crystal anisotropic etching to the principal surface to form a structure including a (111) surface and a crystal surface equivalent thereto and having width W1 and length L1. The principal plane includes a (100) surface and a crystal surface equivalent thereto or a (110) surface and a crystal surface equivalent thereto. A determining section for determining the width W1 of the structure is formed in the mask pattern. The width of the determining section for the width W1 of the mask pattern is width W2. The width of the mask pattern other than the determining section is larger than the width W2 over a length direction of the mask pattern.

Abstract: A method of manufacturing an oscillator device having an oscillator supported relative to a fixed member by a torsion spring for oscillation around a torsion axis and arranged to be driven at a resonance frequency, which method includes a first step for determining an assumed value of an inertia moment weight of the oscillator, a second step for measuring the resonance frequency, a third step for calculating a spring constant of the torsion spring, from the assumed value of the inertia moment weight and the measured resonance frequency obtained at said first and second steps, a fourth step for calculating an adjustment amount for the inertia moment of the oscillator or for the spring constant of the torsion spring, based on the spring constant calculated at said third step and a target resonance frequency determined with respect to the resonance frequency of the oscillator, so as to adjust the resonance frequency to the target resonance frequency, and a fifth step for adjusting the resonance frequency of the

Abstract: An oscillating device includes an oscillator, an elastic supporting member for movably supporting the oscillator, a first supporting frame for supporting the elastic supporting member, and a second supporting frame extending along the elastic supporting member with a spacing maintained therebetween, the second supporting member extending from the first supporting frame, wherein the second supporting frame is provided in a cantilever shape relative to the first supporting frame.

Abstract: Provided is a continuous-type charge deflection liquid ejection head that is suitable for higher-density and multiple nozzles. This liquid ejection head includes: an orifice plate having a plurality of nozzles arranged in a two-dimensional manner; a charging electrode plate having a charging electrode to charge ink droplets from each of the plurality of nozzles; and first and second deflection electrode plates each having a deflection electrode to deflect each of the ink droplets charged by the charging electrode, in which each of the charging member, the first deflection member, and the second deflection member has through-holes that ink droplets pass through, and the charging member, the first deflection member, and the second deflection member are laminated in this order in an ejecting direction of the ink droplets.

Abstract: A structure includes a holder unit including a peripheral portion and a step portion that is higher than the peripheral portion; and a device unit including a bonding portion, an elastic portion, and a support portion that are formed integrally with each other, the support portion being elastically supported with respect to the bonding portion by the elastic portion. The bonding portion is fixed to the peripheral portion of the holder unit. The support portion is caused to contact the step portion by a restoring force of the elastic portion in an elastically deformed state.