Patents by Inventor Takahisa Narriki

Takahisa Narriki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resist pattern thickening material and process for forming resist pattern, and semiconductor device and process for manufacturing the same
    Publication number: 20060188807
    Abstract: The present invention provides a resist pattern thickening material, which can utilize ArF excimer laser light; which, when applied over a resist pattern to be thickened e.g., in form of lines and spaces pattern, can thicken the resist pattern to be thickened regardless of the size of the resist pattern to be thickened; and which is suited for forming a fine space pattern or the like, exceeding exposure limits. The present invention also provides a process for forming a resist pattern and a process for manufacturing a semiconductor device, wherein the resist pattern thickening material of the present invention is suitably utilized.
    Type: Application
    Filed: January 20, 2006
    Publication date: August 24, 2006
    Applicant: FUJITSU LIMITED
    Inventors: Koji Nozaki, Miwa Kozawa, Takahisa Narriki