Patents by Inventor Takahisa Shiozawa
Takahisa Shiozawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 7760330Abstract: An illumination optical system that is used for an exposure apparatus that includes a mirror and exposes an object, illuminates a surface to be illuminated using light from a light source, and includes a filter member arranged at a position that substantially has a Fourier transform relationship with the surface to be illuminated, the filter member including a transmittance distribution preset to correct a non-uniformity of a transmittance distribution of the illumination optical system caused by the mirror.Type: GrantFiled: January 23, 2008Date of Patent: July 20, 2010Assignee: Canon Kabushiki KaishaInventors: Takahisa Shiozawa, Yoshio Goto
-
Patent number: 7671967Abstract: An exposure method includes the steps of (a) calculating a pupil transmittance distribution in a projection optical system based on a first effective light source distribution of the projection optical system acquired by a measuring apparatus of an exposure apparatus, and a second effective light source distribution derived from a pupil plane light intensity distribution measured on a plate plane using light that has passed the projection optical system without a reticle, (b) calculating an imaging performance by using a result of the pupil transmittance distribution calculating step and the first or second effective light source distributions, (c) adjusting at least one of the effective light source distribution or the projection optical system by using the imaging performance, and (d) exposing the plate based on at least one of the effective light source distribution and the projection optical system that have been adjusted.Type: GrantFiled: April 18, 2006Date of Patent: March 2, 2010Assignee: Canon Kabushiki KaishaInventors: Takafumi Miyaharu, Takahisa Shiozawa
-
Patent number: 7468781Abstract: An exposure apparatus includes an illumination optical system that includes an optical integrator for forming a secondary light source from the light, and a variable stop arranged at or near a position where the secondary light source is formed, the diameter variable stop that defines a NA of the illumination optical system, a projection optical system that includes an aperture stop arranged at a position substantially optically conjugate with the variable stop, the aperture stop defining a numerical aperture of the projection optical system, and a controller for controlling the aperture diameter of the variable stop as the aperture diameter varies so that an image of the secondary light source can fall within the aperture diameter of the aperture stop.Type: GrantFiled: August 7, 2007Date of Patent: December 23, 2008Assignee: Canon Kabushiki KaishaInventor: Takahisa Shiozawa
-
Publication number: 20080218719Abstract: An exposure apparatus includes an illumination optical system that includes an optical integrator for forming a secondary light source from the light, and a variable stop arranged at or near a position where the secondary light source is formed, the diameter variable stop that defines a NA of the illumination optical system, a projection optical system that includes an aperture stop arranged at a position substantially optically conjugate with the variable stop, the aperture stop defining a numerical aperture of the projection optical system, and a controller for controlling the aperture diameter of the variable stop as the aperture diameter varies so that an image of the secondary light source can fall within the aperture diameter of the aperture stop.Type: ApplicationFiled: August 7, 2007Publication date: September 11, 2008Applicant: CANON KABUSHIKI KAISHAInventor: Takahisa SHIOZAWA
-
Publication number: 20080143993Abstract: An illumination optical system that is used for an exposure apparatus that includes a mirror and exposes an object, illuminates a surface to be illuminated using light from a light source, and includes a filter member arranged at a position that substantially has a Fourier transform relationship with the surface to be illuminated, the filter member including a transmittance distribution preset to correct a non-uniformity of a transmittance distribution of the illumination optical system caused by the mirror.Type: ApplicationFiled: January 23, 2008Publication date: June 19, 2008Applicant: CANON KABUSHIKI KAISHAInventors: Takahisa Shiozawa, Yoshio Goto
-
Patent number: 7345741Abstract: An illumination optical system that is used for an exposure apparatus that includes a mirror and exposes an object, illuminates a surface to be illuminated using light from a light source, and includes a filter member arranged at a position that substantially has a Fourier transform relationship with the surface to be illuminated, the filter member including a transmittance distribution preset to correct a non-uniformity of a transmittance distribution of the illumination optical system caused by the mirror.Type: GrantFiled: June 2, 2005Date of Patent: March 18, 2008Assignee: Canon Kabushiki KaishaInventors: Takahisa Shiozawa, Yoshio Goto
-
Patent number: 7286206Abstract: An exposure apparatus includes an illumination optical system that includes an optical integrator for forming a secondary light source from the light, and a variable stop arranged at or near a position where the secondary light source is formed, the diameter variable stop that defines a NA of the illumination optical system, a projection optical system that includes an aperture stop arranged at a position substantially optically conjugate with the variable stop, the aperture stop defining a numerical aperture of the projection optical system, and a controller for controlling the aperture diameter of the variable stop as the aperture diameter varies so that an image of the secondary light source can fall within the aperture diameter of the aperture stop.Type: GrantFiled: October 25, 2006Date of Patent: October 23, 2007Assignee: Canon Kabushiki KaishaInventor: Takahisa Shiozawa
-
Publication number: 20070053033Abstract: An exposure apparatus includes an illumination optical system that includes an optical integrator for forming a secondary light source from the light, and a variable stop arranged at or near a position where the secondary light source is formed, the diameter variable stop that defines a NA of the illumination optical system, a projection optical system that includes an aperture stop arranged at a position substantially optically conjugate with the variable stop, the aperture stop defining a numerical aperture of the projection optical system, and a controller for controlling the aperture diameter of the variable stop as the aperture diameter varies so that an image of the secondary light source can fall within the aperture diameter of the aperture stop.Type: ApplicationFiled: October 25, 2006Publication date: March 8, 2007Applicant: Canon Kabushiki KaishaInventor: Takahisa SHIOZAWA
-
Patent number: 7142283Abstract: An exposure apparatus includes an illumination optical system that includes an optical integrator for forming a secondary light source from the light, and a variable stop arranged at or near a position where the secondary light source is formed, the diameter variable stop that defines a NA of the illumination optical system, a projection optical system that includes an aperture stop arranged at a position substantially optically conjugate with the variable stop, the aperture stop defining a numerical aperture of the projection optical system, and a controller for controlling the aperture diameter of the variable stop as the aperture diameter varies so that an image of the secondary light source can fall within the aperture diameter of the aperture stop.Type: GrantFiled: June 3, 2004Date of Patent: November 28, 2006Assignee: Canon Kabushiki KaishaInventor: Takahisa Shiozawa
-
Publication number: 20060238736Abstract: A measuring apparatus used for an exposure apparatus that includes an illumination optical system that illuminates a reticle using light from a light source, a reticle stage that supports and drives the reticle, and a projection optical system that projects a pattern of the reticle onto a plate measures an effective light source distribution as an incident angular distribution of the light on a reticle plane of the reticle includes a relaying optical system configured to guide the light that has passed the illumination optical system, and a housing that contains the relaying optical system and is mounted on the reticle stage in place of the reticle.Type: ApplicationFiled: April 18, 2006Publication date: October 26, 2006Applicant: CANON KABUSHIKI KAISHAInventors: Takafumi Miyaharu, Takahisa Shiozawa
-
Publication number: 20050270608Abstract: An illumination optical system that is used for an exposure apparatus that includes a mirror and exposes an object, illuminates a surface to be illuminated using light from a light source, and includes a filter member arranged at a position that substantially has a Fourier transform relationship with the surface to be illuminated, the filter member including a transmittance distribution preset to correct a non-uniformity of a transmittance distribution of the illumination optical system caused by the mirror.Type: ApplicationFiled: June 2, 2005Publication date: December 8, 2005Inventors: Takahisa Shiozawa, Yoshio Goto
-
Patent number: 6897944Abstract: An illumination optical system for illuminating a mask that arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern using light from a light source includes an illumination-light generating mechanism for dividing the light and for forming a quadrupole light intensity distribution around an optical axis on a predetermined surface that has substantially a Fourier conversion relationship with the mask, so as to resolve the predetermined pattern and restrain the auxiliary pattern from resolving, wherein at least one of a size of each pole of the quadrupole light intensity distribution or a distance between the optical axis and each pole of the quadrupole light intensity distribution are variable.Type: GrantFiled: July 30, 2003Date of Patent: May 24, 2005Assignee: Canon Kabushiki KaishaInventor: Takahisa Shiozawa
-
Publication number: 20040246456Abstract: An exposure apparatus includes an illumination optical system that includes an optical integrator for forming a secondary light source from the light, and a variable stop arranged at or near a position where the secondary light source is formed, the diameter variable stop that defines a NA of the illumination optical system, a projection optical system that includes an aperture stop arranged at a position substantially optically conjugate with the variable stop, the aperture stop defining a numerical aperture of the projection optical system, and a controller for controlling the aperture diameter of the variable stop as the aperture diameter varies so that an image of the secondary light source can fall within the aperture diameter of the aperture stop.Type: ApplicationFiled: June 3, 2004Publication date: December 9, 2004Inventor: Takahisa Shiozawa
-
Patent number: 6757050Abstract: An exposure method and apparatus wherein exposures are made repeatedly and wherein an amount of exposure is controlled on the basis of detection of an integrated light quantity of a portion of exposure light used for an exposure. In response to completion of each exposure or exposures of a determined number, a ratio between intensity of the exposure light upon a substrate being exposed and the portion of the exposure light is detected, which ratio is used for the exposure amount control.Type: GrantFiled: January 26, 1998Date of Patent: June 29, 2004Assignee: Canon Kabushiki KaishaInventor: Takahisa Shiozawa
-
Publication number: 20040022068Abstract: An illumination optical system for illuminating a mask that arranges a predetermined pattern and an auxiliary pattern smaller than the predetermined pattern using light from a light source includes an illumination-light generating mechanism for dividing the light and for forming a quadrupole light intensity distribution around an optical axis on a predetermined surface that has substantially a Fourier conversion relationship with the mask, so as to resolve the predetermined pattern and restrain the auxiliary pattern from resolving, wherein at least one of a size of each pole of the quadrupole light intensity distribution or a distance between the optical axis and each pole of the quadrupole light intensity distribution are variable.Type: ApplicationFiled: July 30, 2003Publication date: February 5, 2004Inventor: Takahisa Shiozawa
-
Patent number: 6636295Abstract: An illumination system for lithography includes an optical system for projecting light from a laser onto a mask. The optical system includes a birefringent element being effective to dissolve polarization of light from the laser. The birefringent element is made of CaF2.Type: GrantFiled: March 30, 2001Date of Patent: October 21, 2003Assignee: Canon Kabushiki KaishaInventor: Takahisa Shiozawa
-
Publication number: 20010052968Abstract: Disclosed is an exposure apparatus for exposing a substrate with a pattern of a mask, wherein polarized light from a light source is transformed into light having its polarization state, in a section perpendicular to an optical axis, changed, wherein the light is divided with respect to a wavefront into plural light beams which are then superposed one upon another on a light entrance surface of an optical integrator, and wherein the mask is illuminated with light beams from the optical integrator.Type: ApplicationFiled: March 30, 2001Publication date: December 20, 2001Inventor: Takahisa Shiozawa
-
Patent number: 5892573Abstract: An exposure apparatus including an illumination optical system, a first light receiving system for receiving a portion of exposure light from the illumination optical system, a movable reticle stage having a transmitting portion for transmitting exposure light, and a second light receiving system for receiving the exposure light transmitted through the transmitting portion. Accordingly, the exposure apparatus is able to correct the sensitivity of the first light receiving system without unloading a reticle.Type: GrantFiled: September 30, 1996Date of Patent: April 6, 1999Assignee: Canon Kabushiki KaishaInventors: Kazuhiro Takahashi, Takahisa Shiozawa
-
Patent number: 5726740Abstract: An illumination device, includes a secondary light source forming system having a deflecting member with a conical light deflecting surface for transforming received light into substantially ring-like light, the secondary light source forming system forming a ring-like secondary light source by using the ring-like light; and an optical system for projecting divergent lights from portions of the secondary light source obliquely onto a surface to be illuminated so that the projected lights are superposed one upon another on the surface.Type: GrantFiled: June 5, 1995Date of Patent: March 10, 1998Assignee: Canon Kabushiki KaishaInventors: Takahisa Shiozawa, Masato Muraki, Hiroyuki Ishii, Shigeru Hayata
-
Patent number: 5719617Abstract: An illumination device for illuminating a surface to be illuminated, includes a light source and an irradiation optical system for mixedly projecting light beams from the light source to the surface, wherein the irradiation optical system has a first focal point with respect to a first plane, which is disposed at a position out of the surface.Type: GrantFiled: February 16, 1995Date of Patent: February 17, 1998Assignee: Canon Kabushiki KaishaInventors: Kazuhiro Takahashi, Takahisa Shiozawa