Patents by Inventor Takahito Mita
Takahito Mita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10087265Abstract: A method for producing poly(dimethyl vinylphosphonate) from a monomer component mainly containing dimethyl vinylphosphonate by anionic polymerization in the presence of an anionic polymerization initiator, the method being characterized in that an aliphatic ether is used as a polymerization solvent, and a method for producing poly(vinylphosphonic acid) characterized in that the poly(dimethyl vinylphosphonate) obtained by the former method is hydrolyzed in the presence of an acid are provided. The methods make it possible to easily produce a poly(dimethyl vinylphosphonate) which has a high molecular weight and in which the molecular weight is controlled, and make it possible to produce a poly(vinylphosphonic acid) which has a high molecular weight and in which the molecular weight is controlled corresponding to the poly(dimethyl vinylphosphonate).Type: GrantFiled: June 1, 2015Date of Patent: October 2, 2018Assignee: Maruzen Petrochemical Co., Ltd.Inventors: Takashi Takahashi, Keisuke Matsushita, Masaki Sugiyama, Norihiro Yoshida, Eiichi Ikawa, Takahito Mita, Masahiro Endo
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Publication number: 20170198073Abstract: A method for producing poly(dimethyl vinylphosphonate) from a monomer component mainly containing dimethyl vinylphosphonate by anionic polymerization in the presence of an anionic polymerization initiator, the method being characterized in that an aliphatic ether is used as a polymerization solvent, and a method for producing poly(vinylphosphonic acid) characterized in that the poly(dimethyl vinylphosphonate) obtained by the former method is hydrolyzed in the presence of an acid are provided. The methods make it possible to easily produce a poly(dimethyl vinylphosphonate) which has a high molecular weight and in which the molecular weight is controlled, and make it possible to produce a poly(vinylphosphonic acid) which has a high molecular weight and in which the molecular weight is controlled corresponding to the poly(dimethyl vinylphosphonate).Type: ApplicationFiled: June 1, 2015Publication date: July 13, 2017Applicant: MARUZEN PETROCHEMICAL CO., LTD.Inventors: Takashi TAKAHASHI, Keisuke MATSUSHITA, Masaki SUGIYAMA, Norihiro YOSHIDA, Eiichi IKAWA, Takahito MITA, Masahiro ENDO
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Patent number: 9242407Abstract: A cyclic-olefin-based thermoplastic resin for thermal imprint to be used in the production of a sheet or a film which contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]<30. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved.Type: GrantFiled: August 1, 2014Date of Patent: January 26, 2016Assignees: SCIVAX CORPORATION, MARUZEN PETROCHEMICAL CO., LTD.Inventors: Toshifumi Takemori, Yoshiaki Takaya, Takahito Mita, Tetsuya Iizuka, Yuji Hashima, Takahisa Kusuura, Mitsuru Fujii, Takuji Taguchi, Anupam Mitra
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Publication number: 20140339735Abstract: A cyclic-olefin-based thermoplastic resin for thermal imprint to be used in the production of a sheet or a film which contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]<30. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved.Type: ApplicationFiled: August 1, 2014Publication date: November 20, 2014Inventors: Takemori Toshifumi, Yoshiaki Takaya, Takahito Mita, Tetsuya Iizuka, Yuji Hashima, Takahisa Kusuura, Mitsuru Fujii, Takuji Taguchi, Anupam Mitra
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Patent number: 8721950Abstract: A resin for thermal imprint include a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg(° C.Type: GrantFiled: November 1, 2012Date of Patent: May 13, 2014Assignees: Scivax Corporation, Maruzen Petrochemical Co., Ltd.Inventors: Takemori Toshifumi, Yoshiaki Takaya, Takahito Mita, Tetsuya Iizuka, Yuji Hashima, Takahisa Kusuura, Mitsuru Fujii, Takuji Taguchi, Anupam Mitra
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Patent number: 8492483Abstract: To provide a novel ABA-type triblock copolymer of vinyl ether series, comprising polyvinyl ether and an oxystyrene-series unit, and a process of producing the ABA-type copolymer at a series of steps. The invention relates to a novel ABA-type triblock copolymer comprising Segment A comprising an oxystyrene-series repeat unit (a) and Segment B comprising a vinyl ether-series repeat unit (b), in which the Segment A and the Segment B are bonded together with a single bond, and to a simple process of producing the same. The triblock copolymer can be produced at a series of steps in a simple manner, comprising living cationic polymerization of a vinyl ether-series monomer such as ethyl vinyl ether in the presence of a bifunctional initiator and a Lewis acid, and subsequently adding an oxystyrene-series monomer such as p-hydroxystyrene for living cationic polymerization.Type: GrantFiled: June 19, 2008Date of Patent: July 23, 2013Assignee: Maruzen Petrochemical Co., Ltd.Inventors: Norihiro Yoshida, Hijiri Aoki, Takahito Mita, Ami Yamaguchi, Kazuhiko Haba, Goro Sawada
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Patent number: 8324332Abstract: A resin for thermal imprint including a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg (° C.Type: GrantFiled: August 25, 2006Date of Patent: December 4, 2012Assignees: Scivax Corporation, Maruzen Petrochemical Co., Ltd.Inventors: Takemori Toshifumi, Yoshiaki Takaya, Takahito Mita, Tetsuya Iizuka, Yuji Hashima, Takahisa Kusuura, Mitsuru Fujii, Takuji Taguchi, Anupam Mitra
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Publication number: 20100286351Abstract: To provide a novel ABA-type triblock copolymer of vinyl ether series, comprising polyvinyl ether and an oxystyrene-series unit, and a process of producing the ABA-type copolymer at a series of steps. The invention relates to a novel ABA-type triblock copolymer comprising Segment A comprising an oxystyrene-series repeat unit (a) and Segment B comprising a vinyl ether-series repeat unit (b), in which the Segment A and the Segment B are bonded together with a single bond, and to a simple process of producing the same. The triblock copolymer can be produced at a series of steps in a simple manner, comprising living cationic polymerization of a vinyl ether-series monomer such as ethyl vinyl ether in the presence of a bifunctional initiator and a Lewis acid, and subsequently adding an oxystyrene-series monomer such as p-hydroxystyrene for living cationic polymerization.Type: ApplicationFiled: June 19, 2008Publication date: November 11, 2010Applicant: MARUZEN PETROCHEMICAL CO., LTD.Inventors: Norihiro Yoshida, Hijiri Aoki, Takahito Mita, Ami Yamaguchi, Kazuhiko Haba, Goro Sawada
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Publication number: 20100019410Abstract: A cyclic-olefin-based thermoplastic resin for thermal imprint to be used in the production of a sheet or a film which contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]<30. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg(° C.Type: ApplicationFiled: July 12, 2006Publication date: January 28, 2010Applicants: SCIVAX CORPORATION, MARUZEN PETROCHEMICAL CO., LTD.Inventors: Takemori Toshifumi, Yoshiaki Takaya, Takahito Mita, Tetsuya Lizuka, Yuji Hashima, Takahisa Kusuura, Mitsuru Fujii, Takuji Taguchi, Anupam Mitra
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Publication number: 20100013122Abstract: A resin for thermal imprint comprises a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260 ° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg (° C.Type: ApplicationFiled: August 25, 2006Publication date: January 21, 2010Applicants: SCIVAX CORPORATON, MARUZEN PETROCHEMICAL CO., LTD.Inventors: Takemori Toshifumi, Yoshiaki Takaya, Takahito Mita, Tetsuya Iizuka, Yuji Hashima, Takahisa Kusuura, Mitsuru Fujii, Takuji Taguchi, Anupam Mitra
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Patent number: 7521171Abstract: The positive photosensitive resin of the present invention has an acid-labile protecting group and the structure represented by the following general formula (1): (wherein X1 and X2 may be the sake or different and each independently a straight or branched chain hydrocarbon group, having 1 to 30 carbon atoms, an alicyclic hydrocarbon group or a heterocyclic group, which may substituted with straight or branched chain hydrocarbon of 1 to 6 carbon atoms or —O— hydrocarbon; Y1 and Y2 may be the same or different and are each independently a hydrogen atom, a straight or branched chain hydrocarbon group having 1 to 6 carbon atoms, a sulfur-containing hydrocarbon group, or an aromatic hydrocarbon group which may have a substituent; and two Zs may be the same or different and each independently an oxygen atom or a sulfur atom).Type: GrantFiled: March 7, 2006Date of Patent: April 21, 2009Assignee: Maruzen Petrochemical Co., Ltd.Inventors: Hijiri Aoki, Takahito Mita
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Patent number: 7411097Abstract: By resolving objections in the prior art, provided are a novel copolymer suitable as a coating polymers which is excellent in adhesion to a substrate and can be used suitably as the polymer for the coating film having durability against pattern collapse in the finer pattern formation for progressed lithography technology and a method for producing the copolymer, as well as a novel thiol compound useful as a chain transfer agent in the production of the copolymer. The novel thiol compound of the present invention has the structure represented by the formula (1); wherein R1 is a bivalent substituent selected from linear, branched or cyclic saturated hydrocarbon having 1 to 15 carbon atoms.Type: GrantFiled: March 1, 2007Date of Patent: August 12, 2008Assignee: Maruzen Petrochemical Co. Ltd.Inventors: Takanori Yamagishi, Takahito Mita
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Publication number: 20070161764Abstract: By resolving objections in the prior art, provided are a novel copolymer suitable as a coating polymers which is excellent in adhesion to a substrate and can be used suitably as the polymer for the coating film having durability against pattern collapse in the finer pattern formation for progressed lithography technology and a method for producing the copolymer, as well as a novel thiol compound useful as a chain transfer agent in the production of the copolymer. The novel thiol compound of the present invention has the structure represented by the formula (1); wherein R1 is a bivalent substituent selected from linear, branched or cyclic saturated hydrocarbon having 1 to 15 carbon atoms.Type: ApplicationFiled: March 1, 2007Publication date: July 12, 2007Inventors: Takanori Yamagishi, Takahito Mita
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Patent number: 7220808Abstract: By resolving objections in the prior art, provided are a novel copolymer suitable as a coating polymers which is excellent in adhesion to a substrate and can be used suitably as the polymer for the coating film having durability against pattern collapse in the finer pattern formation for progressed lithography technology and a method for producing the copolymer, as well as a novel thiol compound useful as a chain transfer agent in the production of the copolymer. The novel thiol compound of the present invention has the structure represented by the formula (1); wherein R1 is a bivalent substituent selected from linear, branched or cyclic saturated hydrocarbon having 1 to 15 carbon atoms.Type: GrantFiled: February 23, 2004Date of Patent: May 22, 2007Assignee: Maruzen Petrochemical Co. Ltd.Inventors: Takanori Yamagishi, Takahito Mita
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Publication number: 20060204888Abstract: The present invention provides a positive photosensitive resin and a resist composition containing the positive photosensitive resin, both of which are used for fine pattern formation in semiconductor production and are preferably used in a semiconductor lithography of higher-than-before sensitivity.Type: ApplicationFiled: March 7, 2006Publication date: September 14, 2006Inventors: Hijiri Aoki, Takahito Mita
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Publication number: 20060068324Abstract: A positive photosensitive resin having, in the high-molecular main chain, a structure represented by the following general formula (1): and a dithiol compound represented by the following general formula (2): The positive photosensitive resin can alleviate the problems of conventional technique and, when used for formation of a fine patter in semiconductor production, can show a higher resist sensitivity than conventional products and can bring about effects such as reduction in impurities after development. The dithiol compound is novel and extremely suitable for use in production of the positive photosensitive resin.Type: ApplicationFiled: September 26, 2005Publication date: March 30, 2006Inventor: Takahito Mita
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Publication number: 20040181023Abstract: By resolving objections in the prior art, provided are a novel copolymer suitable as a coating polymers which is excellent in adhesion to a substrate and can be used suitably as the polymer for the coating film having durability against pattern collapse in the finer pattern formation for progressed lithography technology and a method for producing the copolymer, as well as a novel thiol compound useful as a chain transfer agent in the production of the copolymer.Type: ApplicationFiled: February 23, 2004Publication date: September 16, 2004Inventors: Takanori Yamagishi, Takahito Mita