Abstract: When an accelerating voltage and operating distance are changed, an excitation current and a pole voltage of an aberration corrector must also be changed. Moreover, different multipole voltages or currents must be added individually for each pole in order to superpose multipoles.

Abstract: The present invention provides a charged particle beam column that does not cause displacement of an image or degradation of a resolution of images when a charged particle beam is tilted at a large angle. In the charged particle beam column including an aberration corrector, a deflector is used to control the direction of incidence of the charged particle beam on a second condenser lens but the object point of a condenser lens is not shifted. Consequently, the converging charged particle beam is tilted at a large angle with respect to the surface of a specimen without the necessity of shifting the object point of an objective lens lying on the optical axis of the charged particle beam column. At this time, the aberration corrector prevents a shift of an image or degradation of a resolution derived from the tilt of the charged particle beam.

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

Abstract: The present invention provides an aberration corrector functioning under a condition outside the setting optical condition of an incorporated charged particle beam apparatus. An intermediate potential region different from the ground potential of an aberration corrector is provided in the space between the stages of multipole lenses constructing the aberration corrector to adjust a potential. Using this, when selecting an incident (outgoing) condition, an outgoing (incident) condition can be adjusted.

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

Abstract: A transmission electron microscope has a means for inputting a spatial size or distance d desired to be observed by the operator, calculates high contrast of an image based on this value and an observing condition which can reduce the influence of a false image superimposed, and desirably modulates an accelerating voltage of the electron microscope based thereon.

Abstract: The present invention provides a charged particle beam column that does not cause displacement of an image or degradation of a resolution of images when a charged particle beam is tilted at a large angle. In the charged particle beam column including an aberration corrector, a deflector is used to control the direction of incidence of the charged particle beam on a second condenser lens but the object point of a condenser lens is not shifted. Consequently, the converging charged particle beam is tilted at a large angle with respect to the surface of a specimen without the necessity of shifting the object point of an objective lens lying on the optical axis of the charged particle beam column. At this time, the aberration corrector prevents a shift of an image or degradation of a resolution derived from the tilt of the charged particle beam.

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

Abstract: The present invention provides an aberration corrector functioning under a condition outside the setting optical condition of an incorporated charged particle beam apparatus. An intermediate potential region different from the ground potential of an aberration corrector is provided in the space between the stages of multipole lenses constructing the aberration corrector to adjust a potential. Using this, when selecting an incident (outgoing) condition, an outgoing (incident) condition can be adjusted.

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.