Patents by Inventor Takakazu Kimoto

Takakazu Kimoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170038679
    Abstract: The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO3?, wherein a hydrogen atom or an electron-donating group bonds to an ? carbon atom with respect to SO3?, and an electron-withdrawing group bonds to a ? carbon atom with respect to SO3?; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R1 and R2 each independently represent a hydrogen atom or a monovalent electron-donating group. R3 represent a monovalent electron-withdrawing group. R4 represents a hydrogen atom or a monovalent hydrocarbon group.
    Type: Application
    Filed: October 24, 2016
    Publication date: February 9, 2017
    Applicant: JSR CORPORATION
    Inventors: Hiroshi TOMIOKA, Takakazu KIMOTO, Yusuke ASANO
  • Patent number: 9523911
    Abstract: The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO3?, wherein a hydrogen atom or an electron-donating group bonds to an ? carbon atom with respect to SO3?, and an electron-withdrawing group bonds to a ? carbon atom with respect to SO3?; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R1 and R2 each independently represent a hydrogen atom or a monovalent electron-donating group. R3 represent a monovalent electron-withdrawing group. R4 represents a hydrogen atom or a monovalent hydrocarbon group.
    Type: Grant
    Filed: May 20, 2014
    Date of Patent: December 20, 2016
    Assignee: JSR CORPORATION
    Inventors: Hiroshi Tomioka, Takakazu Kimoto, Yusuke Asano
  • Patent number: 8980529
    Abstract: A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). R1 represents a hydrogen atom or a methyl group. Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R2. R2 represents a carbon atom. R3 represents a methyl group or an ethyl group. R4 represents a hydrogen atom or a methyl group. X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R5. R5 represents a carbon atom. R6 represents a branched alkyl group having 3 or 4 carbon atoms.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: March 17, 2015
    Assignee: JSR Corporation
    Inventors: Yasuhiko Matsuda, Norihiko Sugie, Tomohiro Kakizawa, Takakazu Kimoto
  • Publication number: 20140342288
    Abstract: The present invention provides a radiation-sensitive resin composition that contains a polymer having a structural unit that includes an acid-labile group; and an acid generator, wherein the acid generator includes a compound including a sulfonate anion having SO3?, wherein a hydrogen atom or an electron-donating group bonds to an ? carbon atom with respect to SO3?, and an electron-withdrawing group bonds to a ? carbon atom with respect to SO3?; and a radiation-degradable onium cation. The compound preferably has a group represented by the following formula (1-1) or (1-2). In the following formulae (1-1) and (1-2), R1 and R2 each independently represent a hydrogen atom or a monovalent electron-donating group. R3 represent a monovalent electron-withdrawing group. R4 represents a hydrogen atom or a monovalent hydrocarbon group.
    Type: Application
    Filed: May 20, 2014
    Publication date: November 20, 2014
    Applicant: JSR CORPORATION
    Inventors: Hiroshi TOMIOKA, Takakazu KIMOTO, Yusuke ASANO
  • Patent number: 8765355
    Abstract: A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group.
    Type: Grant
    Filed: April 27, 2012
    Date of Patent: July 1, 2014
    Assignee: JSR Corporation
    Inventors: Takakazu Kimoto, Mitsuo Sato, Yusuke Asano, Tomohiro Kakizawa
  • Publication number: 20120276482
    Abstract: A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group.
    Type: Application
    Filed: April 27, 2012
    Publication date: November 1, 2012
    Applicant: JSR Corporation
    Inventors: Takakazu Kimoto, Mitsuo Sato, Yusuke Asano, Tomohiro Kakizawa