Abstract: A method and an apparatus includes using a planar plotting mask which can continuously change a mask image; continuously moving the planar plotting mask with reference to the surface of the photocurable resin composition and exposing the surface of a photocurable resin composition to light by way of the planar plotting mask while continuously changing a mask image of the planar plotting mask in accordance with a cross-sectional profile pattern of an optically-cured resin layer to be formed and in synchronism with movement of the planar plotting mask, to thus form an optically-cured resin layer having a predetermined cross-sectional profile pattern; and performing building operation such that boundary areas among adjacent plotted areas in the optically-cured resin layer become unnoticeable in a finally-obtained stereolithographic three-dimensional object.

Abstract: An optical stereolithographic apparatus performs optical stereolithography by preparing a mask on a light-transmissible member (31) on the basis of data for one layer with respect to optical stereolithography, exposing an unhardened resin layer (96) of photohardenable resin to light through the mask, and repeating an exposure operation. The optical stereolithographic apparatus has an optical system in which the light-transmissible member (31) and the unhardened resin layer (96) are spaced from each other at a predetermined distance, and the unhardened resin layer (96) of the photohardenable resin is subjected to a projection exposure through the mask.

Abstract: A method and an apparatus includes using a planar plotting mask which can continuously change a mask image; continuously moving the planar plotting mask with reference to the surface of the photocurable resin composition and exposing the surface of a photocurable resin composition to light by way of the planar plotting mask while continuously changing a mask image of the planar plotting mask in accordance with a cross-sectional profile pattern of an optically-cured resin layer to be formed and in synchronism with movement of the planar plotting mask, to thus form an optically-cured resin layer having a predetermined cross-sectional profile pattern; and performing building operation such that boundary areas among adjacent plotted areas in the optically-cured resin layer become unnoticeable in a finally-obtained stereolithographic three-dimensional object.

Abstract: A stereolithographic method which comprises irradiating the surface of a photohardenable resin composition with light through an image drawing mask capable of changing its mask image with the image drawing mask being moved in parallel to the surface of the photohardenable resin composition and the mask image of the image drawing mask being changed in synchronism with the movement of the image drawing mask according to the sectional shape pattern on the photohardened resin layer to be formed to form a photohardened resin layer having a predetermined sectional shape pattern and a stereolithographic apparatus therefor.

Abstract: In stereolithographic apparatus and method, a mask is formed on a light-transmissible member (glass plate) on the basis of stereolithographic data for one layer of photohardenable resin; photohardenable resin of one layer is successively supplied to form an unhardened resin layer of photohardenable resin; if necessary, a film having light transmission is attached onto the unhardened resin layer so as to cover the unhardened resin layer in close contact with the unhardened resin layer; the light-transmissible member having the mask on or above the film; the unhardened resin layer is plane-exposed to light through the mask to harden the photohardenable resin of the unhardened resin layer; and the light-transmissible member and the film are evacuated from the hardened photohardenable resin layer after the exposure by the exposure means, thereby obtaining a desired three-dimensional object through stereolithography. As the photohardenable resin may be used having a melting temperature ranging from 5 to 90° C.

Abstract: In stereolithographic apparatus and method, a mask is formed on a light-transmissible member (glass plate) on the basis of stereolithographic data for one layer of photohardenable resin; photohardenable resin of one layer is successively supplied to form an unhardened resin layer of photohardenable resin; if necessary, a film having light transmission is attached onto the unhardened resin layer so as to cover the unhardened resin layer in close contact with the unhardened resin layer; the light-transmissible member having the mask on or above the film; the unhardened resin layer is plane-exposed to light through the mask to harden the photohardenable resin of the unhardened resin layer; and the light-transmissible member and the film are evacuated from the hardened photohardenable resin layer after the exposure by the exposure means, thereby obtaining a desired three-dimensional object through stereolithography. As the photohardenable resin may be used having a melting temperature ranging from 5 to 90° C.

Abstract: In stereolithographic apparatus and method, a mask is formed on a light-transmissible member (glass plate) on the basis of stereolithographic data for one layer of photohardenable resin; photohardenable resin of one layer is successively supplied to form an unhardened resin layer of photohardenable resin; if necessary, a film having light transmission is attached onto the unhardened resin layer so as to cover the unhardened resin layer in close contact with the unhardened resin layer; the light-transmissible member having the mask on or above the film; the unhardened resin layer is plane-exposed to light through the mask to harden the photohardenable resin of the unhardened resin layer; and the light-transmissible member and the film are evacuated from the hardened photohardenable resin layer after the exposure by the exposure means, thereby obtaining a desired three-dimensional object through stereolithography. As the photohardenable resin may be used having a melting temperature ranging from 5 to 90° C.

Abstract: A stereolithographic method which comprises irradiating the surface of a photohardenable resin composition with light through an image drawing mask capable of changing its mask image with the image drawing mask being moved in parallel to the surface of the photohardenable resin composition and the mask image of the image drawing mask being changed in synchronism with the movement of the image drawing mask according to the sectional shape pattern on the photohardened resin layer to be formed to form a photohardened resin layer having a predetermined sectional shape pattern and a stereolithographic apparatus therefor.

Abstract: An optical stereolithographic apparatus performs optical stereolithography by preparing a mask on a light-transmissible member (31) on the basis of data for one layer with respect to optical stereolithography, exposing an unhardened resin layer (96) of photohardenable resin to light through the mask, and repeating an exposure operation. The optical stereolithographic apparatus has an optical system in which the light-transmissible member (31) and the unhardened resin layer (96) are spaced from each other at a predetermined distance, and the unhardened resin layer (96) of the photohardenable resin is subjected to a projection exposure through the mask.

Abstract: A photocurable resin composition comprising (A) at least one urethane di- or triacrylate, which is a novel compound, (B) a radical polymeriable compound, and (C) a photopolymerization initiator, the weight ratio of the urethane acrylate (A) to the radical polymerizable compound (B) being 65/35 to 25/75; a method of producing a photo-cured object by photo-curing the above composition; a vacuum casting mold obtained by the above method; and a vacuum casting method using the above mold.

Abstract: A mold having a cavity for shaping a three-dimensional object, which comprises a photocured resin of a photocurable resin composition comprising(A) a liquid photocurable resin, and(B) at least one reinforcing agent selected from the group consisting of inorganic solid particles having an average particle diameter of 3 to 70 .mu.m and a whisker having an average diameter of 0.3 to 1.0 .mu.m, a length of 10 to 70 .mu.m and an aspect ratio of 10 to 100 and optionally, in which the inner surface of the cavity is covered by a solid film having a thickness of 5 to 1000 .mu.m.