Patents by Inventor Takamitsu IWAMOTO

Takamitsu IWAMOTO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9069266
    Abstract: In the present invention, the number of brightness changes detected at the same position while a substrate moves by a certain distance is added up, a plurality of edge count data arranged corresponding to the detected positions of the brightness changes is obtained, a plurality of correlation value data by performing a correlation operation for the plurality of calculated edge count data while moving a template is obtained, positions of the plurality of patterns based on a plurality of correlation value data exceeding a predetermined threshold value are identified, a position of a pattern close to a target position of an imaging device is selected, and a photomask is moved in the direction substantially orthogonal to the conveying direction of the substrate so that the amount of the position displacement between the selected position of the pattern and the target position of the imaging device is a predetermined value.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: June 30, 2015
    Assignee: V TECHNOLOGY CO., LTD.
    Inventor: Takamitsu Iwamoto
  • Patent number: 8717544
    Abstract: In the present invention, a number of times the brightness changes detected at the same position while a substrate conveys are added up in the conveying direction, thereby obtaining a plurality of edge count data, and then, a plurality of positions of long sides of patterns parallel to the conveying direction is identified based on the plurality of edge count data exceeding a predetermined threshold value, middle point positions of a plurality of proximity pairs are calculated, and a middle point position close to the target position preset in the imaging device is selected from the plurality of middle point positions of the proximity pairs, an amount of position displacement between the selected middle point position and the target position of imaging device is calculated, and the photomask in the direction substantially perpendicular to the conveying direction so that the amount of position displacement is a predetermined value.
    Type: Grant
    Filed: December 15, 2011
    Date of Patent: May 6, 2014
    Assignee: V Technology Co., Ltd.
    Inventor: Takamitsu Iwamoto
  • Publication number: 20120170011
    Abstract: In the present invention, the number of brightness changes detected at the same position while a substrate moves by a certain distance is added up, a plurality of edge count data arranged corresponding to the detected positions of the brightness changes is obtained, a plurality of correlation value data by performing a correlation operation for the plurality of calculated edge count data while moving a template is obtained, positions of the plurality of patterns based on a plurality of correlation value data exceeding a predetermined threshold value are identified, a position of a pattern close to a target position of an imaging device is selected, and a photomask is moved in the direction substantially orthogonal to the conveying direction of the substrate so that the amount of the position displacement between the selected position of the pattern and the target position of the imaging device is a predetermined value.
    Type: Application
    Filed: December 28, 2011
    Publication date: July 5, 2012
    Inventor: Takamitsu IWAMOTO
  • Publication number: 20120147343
    Abstract: In the present invention, a number of times the brightness changes detected at the same position while a substrate conveys are added up in the conveying direction, thereby obtaining a plurality of edge count data, and then, a plurality of positions of long sides of patterns parallel to the conveying direction is identified based on the plurality of edge count data exceeding a predetermined threshold value, middle point positions of a plurality of proximity pairs are calculated, and a middle point position close to the target position preset in the imaging device is selected from the plurality of middle point positions of the proximity pairs, an amount of position displacement between the selected middle point position and the target position of imaging device is calculated, and the photomask in the direction substantially perpendicular to the conveying direction so that the amount of position displacement is a predetermined value.
    Type: Application
    Filed: December 15, 2011
    Publication date: June 14, 2012
    Inventor: Takamitsu IWAMOTO