Patents by Inventor Takanao Touya
Takanao Touya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11908659Abstract: In one embodiment, a multi charged particle beam writing apparatus includes a blanking aperture array substrate provided with a plurality of blankers configured to respectively perform blanking deflection on a plurality of charged particle beams included in a multi-beam, and a first shield member which is disposed downstream of the blanking aperture array substrate with respect to a travel direction of the multi-beam, has a cylindrical part in which the multi-beam passes through, and is composed of a high magnetic permeability material.Type: GrantFiled: June 8, 2022Date of Patent: February 20, 2024Assignee: NuFlare Technology, Inc.Inventors: Toshiki Kimura, Hirofumi Morita, Takanao Touya, Mitsuhiro Okazawa
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Publication number: 20240013999Abstract: According to one embodiment of the present invention, a mounting substrate is installed on a multi charged particle beam irradiation apparatus, and a blanking aperture array chip provided with blanking electrodes to perform blanking deflection on beams in a multi charged particle beam is mounted on the mounting substrate. The mounting substrate includes an opening through which the multi charged particle beam passes, a plurality of control circuits that supply a control signal to the blanking electrodes for each of a plurality of areas into which the blanking aperture array chip is divided, and grounds, each of which is provided for a corresponding one of the plurality of control circuits and configured to supply a ground electrical potential to the corresponding control circuit. The grounds corresponding to the control circuits are electrically separated from each other.Type: ApplicationFiled: June 8, 2023Publication date: January 11, 2024Applicant: NuFlare Technology, Inc.Inventors: Toshiki KIMURA, Hirofumi MORITA, Takanao TOUYA, Hayato KIMURA, Kazuhiro CHIBA
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Patent number: 11804360Abstract: The present invention quickly calculates values of optimal excitation parameters which are set in lenses in multiple stages. A multi charged particle beam adjustment method includes forming a multi charged particle beam, calculating, for each of lenses in two or more stages disposed corresponding to object lenses in two or more stages, a first rate of change and a second rate of change in response to change in at least an excitation parameter, the first rate of change being a rate of change in a demagnification level of a beam image of the multi charged particle beam, the second rate of change being a rate of change in a rotation level of the beam image, and calculating a first amount of correction to the excitation parameter of each of the lenses based on an amount of correction to the demagnification level and the rotation level of the beam image, the first rate of change, and the second rate of change.Type: GrantFiled: November 4, 2020Date of Patent: October 31, 2023Assignee: NuFlare Technology, Inc.Inventors: Tsubasa Nanao, Hirofumi Morita, Takanao Touya
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Publication number: 20230055778Abstract: In one embodiment, a multi charged particle beam writing method includes forming a multi charged particle beam with which a substrate serving as a writing target is irradiated, deflecting the multi charged particle beam to a position with a predetermined deflection offset added so that deflection voltages respectively applied to a plurality of electrodes of an electrostatic positioning deflector does not include a state where all the deflection voltages are zero, and irradiating the substrate with the multi charged particle beam. A positive common voltage is added to the deflection voltages which are applied to the respective electrodes of the electrostatic positioning deflector.Type: ApplicationFiled: August 11, 2022Publication date: February 23, 2023Applicant: NuFlare Technology, Inc.Inventors: Hirofumi MORITA, Takanao TOUYA
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Publication number: 20220399181Abstract: In one embodiment, a multi charged particle beam writing apparatus includes a blanking aperture array substrate provided with a plurality of blankers configured to respectively perform blanking deflection on a plurality of charged particle beams included in a multi-beam, and a first shield member which is disposed downstream of the blanking aperture array substrate with respect to a travel direction of the multi-beam, has a cylindrical part in which the multi-beam passes through, and is composed of a high magnetic permeability material.Type: ApplicationFiled: June 8, 2022Publication date: December 15, 2022Applicant: NuFlare Technology, Inc.Inventors: Toshiki KIMURA, Hirofumi MORITA, Takanao TOUYA, Mitsuhiro OKAZAWA
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Publication number: 20220328278Abstract: In one embodiment, a charged particle beam writing apparatus includes a positioning deflector adjusting an irradiation position of a charged particle beam radiated to a substrate which is a writing target, a fixed deflector which is disposed downstream of the positioning deflector in a traveling direction of the charged particle beam, and in which an amount of deflection is fixed, a focus correction lens performing focus correction on the charged particle beam according to a surface height of the substrate, and an object lens focusing the charged particle beam.Type: ApplicationFiled: March 22, 2022Publication date: October 13, 2022Applicant: NuFlare Technology, Inc.Inventors: Hirofumi MORITA, Takanao TOUYA
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Patent number: 11145483Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.Type: GrantFiled: December 10, 2018Date of Patent: October 12, 2021Assignee: NuFlare Technology, Inc.Inventors: Takahito Nakayama, Takanao Touya
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Patent number: 10998164Abstract: In one embodiment, a charged particle beam writing apparatus includes an emitter emitting a charged particle beam, a first aperture shaping the charged particle beam, a second aperture shaping the charged particle beam transmitted through the first aperture, a projection lens projecting the charged particle beam transmitted through the first aperture on the second aperture, an object lens focusing the charged particle beam transmitted through the second aperture, the object lens being a magnetic field-type lens, and an electrostatic lens performing focus correction of the charged particle beam in accordance with a surface height of a substrate that is a writing target. The electrostatic lens is disposed inside the object lens, a positive voltage is applied to an electrode of the electrostatic lens. A strength of a magnetic field of the object lens at an upper end of the electrode has a predetermined value or less.Type: GrantFiled: June 4, 2019Date of Patent: May 4, 2021Assignee: NuFlare Technology, Inc.Inventors: Takanao Touya, Hirofumi Morita, Munehiro Ogasawara
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Patent number: 10504686Abstract: A charged particle beam writing method includes forming an aperture image by making a charged particle beam pass through an aperture substrate, changing, in the state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with the first magnification, magnification of the aperture image from the first magnification to the second magnification by using a plurality of lenses while maintaining the last crossover position of the charged particle beam and the position of the last intermediate image of the aperture image to be fixed, and forming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on the surface of the target object, and writing the aperture image.Type: GrantFiled: April 3, 2018Date of Patent: December 10, 2019Assignee: NuFlare Technology, Inc.Inventors: Munehiro Ogasawara, Takanao Touya
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Publication number: 20190371565Abstract: In one embodiment, a charged particle beam writing apparatus includes an emitter emitting a charged particle beam, a first aperture shaping the charged particle beam, a second aperture shaping the charged particle beam transmitted through the first aperture, a projection lens projecting the charged particle beam transmitted through the first aperture on the second aperture, an object lens focusing the charged particle beam transmitted through the second aperture, the object lens being a magnetic field-type lens, and an electrostatic lens performing focus correction of the charged particle beam in accordance with a surface height of a substrate that is a writing target. The electrostatic lens is disposed inside the object lens, a positive voltage is applied to an electrode of the electrostatic lens. A strength of a magnetic field of the object lens at an upper end of the electrode has a predetermined value or less.Type: ApplicationFiled: June 4, 2019Publication date: December 5, 2019Applicant: NuFlare Technology, Inc.Inventors: Takanao TOUYA, Hirofumi Morita, Munehiro Ogasawara
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Publication number: 20190115185Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.Type: ApplicationFiled: December 10, 2018Publication date: April 18, 2019Applicant: NuFlare Technology, Inc.Inventors: Takahito NAKAYAMA, Takanao TOUYA
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Patent number: 10224171Abstract: A blanking device for multi charged particle beams includes a first substrate, in which plural first openings are formed in an array, to form multi-beams, a second substrate in which plural second openings are formed in an array, where a corresponding beam of the multi-beams passes through each of the plural second openings, plural control electrodes, which are on the second substrate and each of which is close to a corresponding one of the plural second openings and arranged not to be directly exposed to other second opening adjacent to the corresponding one of the plural second openings, to be switchably applied with first and second potentials, plural counter electrodes, each of which is facing a corresponding one of the plural control electrodes, to be applied with the second potential, and a shield film provided between the first substrate and the plural control electrodes.Type: GrantFiled: May 10, 2017Date of Patent: March 5, 2019Assignee: NuFlare Technology, Inc.Inventors: Takanao Touya, Hiroshi Matsumoto, Munehiro Ogasawara, Hirofumi Morita
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Patent number: 10192712Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.Type: GrantFiled: September 29, 2017Date of Patent: January 29, 2019Assignee: NuFlare Technology, Inc.Inventors: Takahito Nakayama, Takanao Touya
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Publication number: 20180342366Abstract: A charged particle beam writing method includes forming an aperture image by making a charged particle beam pass through an aperture substrate, changing, in the state where a plurality of crossover positions of the charged particle beam and positions of all of one or more intermediate images of the aperture image are adjusted to matching positions with respect to the aperture image with the first magnification, magnification of the aperture image from the first magnification to the second magnification by using a plurality of lenses while maintaining the last crossover position of the charged particle beam and the position of the last intermediate image of the aperture image to be fixed, and forming, using an objective lens, the aperture image whose magnification has been changed to the second magnification on the surface of the target object, and writing the aperture image.Type: ApplicationFiled: April 3, 2018Publication date: November 29, 2018Applicant: NuFlare Technology, Inc.Inventors: Munehiro OGASAWARA, Takanao TOUYA
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Publication number: 20180076002Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.Type: ApplicationFiled: September 29, 2017Publication date: March 15, 2018Applicant: NuFlare Technology, Inc.Inventors: Takahito NAKAYAMA, Takanao Touya
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Patent number: 9916962Abstract: A multi charged particle beam irradiation apparatus includes a shaping aperture array substrate, where plural openings are formed as an aperture array, to shape multi-beams by making a region including entire plural openings irradiated by a charged particle beam, and making portions of a charged particle beam individually pass through a corresponding one of the plural openings; and a plurality of stages of lenses, arranged such that a reduction ratio of multi-beams by at least one lens of a stage before the last stage lens is larger than that of the multi-beams by the last stage lens, to correct distortion of a formed image obtained by forming an image of the aperture array by the multi-beams, and to form the image of the aperture array by the multi-beams at a height position between the last stage lens and a last-but-one stage lens, and at the surface of a target object.Type: GrantFiled: March 22, 2017Date of Patent: March 13, 2018Assignee: NuFlare Technology, Inc.Inventors: Shinsuke Nishimura, Munehiro Ogasawara, Takanao Touya, Hirofumi Morita
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Publication number: 20170345612Abstract: A blanking device for multi charged particle beams includes a first substrate, in which plural first openings are formed in an array, to form multi-beams, a second substrate in which plural second openings are formed in an array, where a corresponding beam of the multi-beams passes through each of the plural second openings, plural control electrodes, which are on the second substrate and each of which is close to a corresponding one of the plural second openings and arranged not to be directly exposed to other second opening adjacent to the corresponding one of the plural second openings, to be switchably applied with first and second potentials, plural counter electrodes, each of which is facing a corresponding one of the plural control electrodes, to be applied with the second potential, and a shield film provided between the first substrate and the plural control electrodes.Type: ApplicationFiled: May 10, 2017Publication date: November 30, 2017Applicant: NuFlare Technology, Inc.Inventors: Takanao TOUYA, Hiroshi Matsumoto, Munehiro Ogasawara, Hirofumi Morita
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Patent number: 9824849Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes an emission unit to emit a charged particle beam, an electron lens to converge the charged particle beam, a blanking deflector, arranged backward of the electron lens with respect to a direction of an optical axis, to deflect the charged particle beam in the case of performing a blanking control of switching between beam-on and beam-off, a blanking aperture member, arranged backward of the blanking deflector with respect to the direction of the optical axis, to block the charged particle beam having been deflected to be in a beam-off state, and a magnet coil, arranged in a center height position of the blanking deflector, to deflect the charged particle beam.Type: GrantFiled: November 17, 2015Date of Patent: November 21, 2017Assignee: NuFlare Technology, Inc.Inventors: Takahito Nakayama, Takanao Touya
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Publication number: 20170309440Abstract: A multi charged particle beam irradiation apparatus includes a shaping aperture array substrate, where plural openings are formed as an aperture array, to shape multi-beams by making a region including entire plural openings irradiated by a charged particle beam, and making portions of a charged particle beam individually pass through a corresponding one of the plural openings; and a plurality of stages of lenses, arranged such that a reduction ratio of multi-beams by at least one lens of a stage before the last stage lens is larger than that of the multi-beams by the last stage lens, to correct distortion of a formed image obtained by forming an image of the aperture array by the multi-beams, and to form the image of the aperture array by the multi-beams at a height position between the last stage lens and a last-but-one stage lens, and at the surface of a target object.Type: ApplicationFiled: March 22, 2017Publication date: October 26, 2017Applicant: NuFlare Technology, Inc.Inventors: Shinsuke NISHIMURA, Munehiro Ogasawara, Takanao Touya, Hirofumi Morita
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Patent number: 9406117Abstract: A method and system for imaging an object to be inspected and obtaining an optical image; creating a reference image from design pattern data; preparing an inspection recipe including one or more templates and parameter settings necessary for the inspection; checking the pattern and the template against each other, and selecting the reference image which corresponds to the template; detecting first and second edges in the selected reference image in accordance with the parameter setting using determined coordinates as a reference; detecting first and second edges in the optical image, this optical image corresponds to the selected reference image; and determining an inspection value by acquiring the difference between the line width of the optical image and the reference image using the first edge and second edge of the reference image and the first edge and second edges of the optical image.Type: GrantFiled: March 23, 2015Date of Patent: August 2, 2016Assignee: NuFlare Technology, Inc.Inventors: Takanao Touya, Shuichi Tamamushi, Hidenori Sato, Hiroyuki Tanizaki, Takeshi Fujiwara, Eiji Sawa, Kentaro Okuda, Hiroyuki Ikeda, Hiromu Inoue, Hiroshi Tsukada